Imprinting apparatus, imprinting method, and article manufacturing method

Patent metadata

Field	Value
Publication number	US-2016291485-A1
Application number	US-201615082968-A
Country	US
Kind code	A1
Filing date	Mar 28, 2016
Priority date	Mar 31, 2015
Publication date	Oct 6, 2016
Grant date	—

Abstract

Provided is an imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material. The apparatus includes a moving unit configured to move along a horizontal plane while carrying the substrate, and an adjusting unit configured to adjust an inclination of the mold with respect to the substrate. The adjusting unit adjusts the inclination of the mold with respect to the substrate based on information related to a state of the imprint material provided on the substrate and information related to an order of pattern formation. The information related to the state of the imprint material on the substrate is variable with the movement of the moving unit.

First claim

What is claimed is:

1 . An imprinting apparatus that forms patterns sequentially on a plurality of areas of a substrate by using a mold and imprint material, the apparatus comprising:
a moving unit configured to move along a horizontal plane while carrying the substrate; and an adjusting unit configured to adjust an inclination of the mold with respect to the substrate, wherein the adjusting unit adjusts the inclination of the mold with respect to the substrate based on information related to a state of the imprint material provided on the substrate and information related to an order of pattern formation, the information related to the state of the imprint material on the substrate being variable with the movement of the moving unit.

2 . The apparatus according to claim 1 , wherein the information related to the order of pattern formation indicates an order of pattern formation to be performed on the plurality of areas.

3 . The apparatus according to claim 1 , wherein the adjusting unit adjusts the inclination of the mold with respect to the substrate based further on a direction of movement of the moving unit from a position facing an applying unit that is configured to apply the imprint material onto the substrate to a position facing the mold.

4 . The apparatus according to claim 3 ,
wherein, among the plurality of areas, a first area on which the pattern is yet to be formed is on a leading side of the moving unit with respect to a second area on which the pattern has been formed, and wherein the adjusting unit adjusts the inclination of the mold with respect to the substrate such that a gap between a leading-side portion of a pattern surface of the mold and the moving unit becomes smaller than a gap between a trailing-side portion of the pattern surface of the mold and the moving unit.

5 . The apparatus according to claim 1 , wherein the adjusting unit adjusts the inclination of the mold with respect to the substrate such that one of a leading-side portion and a trailing-side portion of a pattern surface of the mold that is farther from the moving unit is brought closer to the moving unit.

6 . An imprinting apparatus that forms a pattern on a substrate by using a mold and imprint material, the apparatus comprising:
a moving unit configured to move along a horizontal plane while carrying the substrate; and an adjusting unit configured to adjust an inclination of the mold, wherein the adjusting unit adjusts the inclination of the mold based on information related to a state of the imprint material provided on the substrate and information related to a direction of movement of the moving unit, the information related to the state of the imprint material on the substrate being variable with the movement of the moving unit.

7 . The apparatus according to claim 6 , wherein the direction of movement of the moving unit is a direction from a position facing an applying unit that is configured to apply the imprint material onto the substrate to a position facing the mold.

8 . The apparatus according to claim 6 , wherein the adjusting unit adjusts the inclination of the mold such that an angle formed between a surface of the substrate onto which the imprint material is applied and a pattern surface of the mold is reduced.

9 . The apparatus according to claim 6 , wherein the adjusting unit adjusts the inclination of the mold based on the information related to the direction of movement of the moving unit and information related to surface irregularities of the substrate.

10 . The apparatus according to claim 1 , wherein the adjusting unit adjusts the inclination of the mold based on information related to a speed of the moving unit.

11 . The apparatus according to claim 6 , wherein the adjusting unit adjusts the inclination of the mold based on information related to a speed of the moving unit.

12 . An imprinting method in which a pattern is formed on a substrate by using a mold and imprint material, the method comprising:
determining an angle of inclination of the mold with respect to the substrate based on information related to a state of the imprint material provided on the substrate, the angle of inclination being formed when the mold and the imprint material on the substrate are brought into contact with each other, the information related to the state of the imprint material on the substrate being variable with a movement of the substrate.

13 . An imprinting method in which a pattern is formed on a substrate by using a mold and imprint material, the method comprising:
acquiring information related to a state of the imprint material provided on the substrate and information related to an order of pattern formation, the information related to the state of the imprint material on the substrate being variable with a movement of a moving unit that moves the substrate; adjusting an inclination of the mold with respect to the substrate based on the information acquired; and bringing the mold and the imprint material on the substrate into contact with each other with the mold being at the adjusted inclination.

14 . An imprinting method in which a pattern is formed on a substrate by using a mold and imprint material, the method comprising:
acquiring information related to a state of the imprint material provided on the substrate and information related to a direction of movement of a moving unit that moves the substrate, the information related to the state of the imprint material on the substrate being variable with the movement of the moving unit; adjusting an inclination of the mold based on the information acquired; and bringing the mold and the imprint material on the substrate into contact with each other with the mold being at the adjusted inclination.

15 . An article manufacturing method comprising:
forming a pattern on a substrate; and performing one of etching and ion implantation on the substrate having the pattern, wherein the forming the pattern includes
determining an angle of inclination of the mold with respect to the substrate based on information related to a state of the imprint material provided on the substrate, the angle of inclination being formed when the mold and the imprint material on the substrate are brought into contact with each other, the information related to the state of the imprint material on the substrate being variable with a movement of the substrate.

Assignees

• Canon Kk

Inventors

• Funayoshi Tomomi
• Yamazaki Takuro
• Fujimoto Masayoshi
• Yamaguchi Hiromitsu

Classifications

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F7/201

  characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask · CPC title

• G03F9/7042 Primary

  Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting (non-exposure lithographic processes per se G03F7/0002) · CPC title

• G03F7/70775

  Position control, e.g. interferometers or encoders for determining the stage position · CPC title

• G03F9/7034 Primary

  Leveling · CPC title