Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9513561-B2
Application number	US-201214006934-A
Country	US
Kind code	B2
Filing date	Mar 16, 2012
Priority date	Apr 21, 2011
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.

First claim

The invention claimed is:

1. A lithographic apparatus, configured to project a patterned beam of radiation onto a substrate comprising:
a plurality of radiation source units, each comprising a radiation source configured to provide a portion of the patterned beam of radiation and configured such that at least one radiation source unit of the plurality of radiation source units installed in the lithographic apparatus is separately removable from another radiation source unit of the plurality of radiation source units installed in the lithographic apparatus;
a control system, configured to monitor a parameter of the performance of the radiation source units; and
a mechanical replacement mechanism having an actuating structure, configured to be operated in response to an instruction from the control system to replace the at least one radiation source unit with a replacement unit;
wherein the control system is configured to control the replacement mechanism to replace at least one radiation source unit if a criterion is met based on the monitored parameter of performance of one of the radiation source units.

2. The lithographic apparatus according to claim 1 , wherein the control system is configured to control the replacement mechanism to replace a plurality of radiation source units including the radiation source unit for which the criterion is met based on the monitored parameter of performance.

3. The lithographic apparatus according to claim 1 , wherein a threshold value is set for a monitored parameter of performance; and responsive to the monitored parameter of performance of a radiation source unit passing the threshold value, the control system determines that the radiation source unit should be replaced.

4. The lithographic apparatus according to claim 3 , wherein a threshold value for the parameter of performance is set for each radiation source unit.

5. The lithographic apparatus according to claim 4 , wherein the threshold value for the parameter of performance for each radiation source unit is set as a certain proportion of an initial value of the parameter of performance determined when the radiation source unit is first installed.

6. The lithographic apparatus according to claim 1 , configured such that, in operation, there is a first time period when radiation is projected onto a substrate and a second time period when radiation is not projected onto a substrate; and
the control system is configured such that, responsive to the control system determining based on monitoring during the first time period that at least one of the radiation source units should be replaced, it controls the replacement mechanism to replace the at least one radiation source unit in a subsequent second time period.

7. The lithographic apparatus according to claim 1 , wherein the parameter monitored by the control system comprises a ratio of electrical current supplied to the radiation source of each radiation source unit to intensity of the radiation output by the radiation source.

8. The lithographic apparatus according to claim 7 , wherein each of the radiation source units comprises:
a sensor to measure the electrical current provided to the radiation source and to measure the intensity of radiation output by the radiation source; and
a control unit, configured to determine from the measurement of the sensor if the criterion has been met for the replacement of the radiation source unit,
wherein the control system of the lithographic apparatus comprises each of the control units of the radiation source units and a central controller,
the control units of the radiation source units are configured to send a control signal to the central controller responsive to the respective control unit determining that the criterion has been met for the replacement of the radiation source unit, and
the central controller is configured to control the replacement mechanism to replace a radiation source unit based on the control signal from the control unit of the radiation source unit.

9. The lithographic apparatus according to claim 1 , wherein each of the radiation source units is an individually controllable radiation source unit.

10. The lithographic apparatus according to claim 1 , wherein the replacement mechanism is configured such that it can replace any of the radiation source units.

11. The lithographic apparatus according to claim 1 , comprising a plurality of replacement mechanisms, each configured to be operated under control of the control system to replace one of a respective plurality of the radiation source units with a replacement unit,
wherein the lithographic apparatus is configured such that each of the radiation source units can be replaced by at least one of the replacement mechanisms.

12. The lithographic apparatus according to claim 1 , further comprising a magazine, configured to store a plurality of replacement radiation source units,
wherein the replacement mechanism is configured to remove a radiation source unit from the magazine and use it to replace a radiation source unit that has been in use in the lithographic apparatus.

13. The lithographic apparatus according to claim 1 , further comprising a disposal unit, configured to receive a radiation source unit that has been replaced,
wherein the replacement mechanism is configured to place a radiation source unit that has been replaced in the disposal unit.

14. The lithographic apparatus according to claim 1 , wherein each of the radiation source units comprises an external reference surface;
the lithographic apparatus comprises a plurality of receiving locations configured to receive a respective one of the radiation source units; and
each of the receiving locations comprises an reference surface, complementary to the reference surface of the radiation source unit, and configured such that, when a radiation source unit is fixed in a receiving location, the reference surfaces meet such that the position and/or orientation of the radiation source unit relative to the receiving location corresponds to a certain desired position and/or orientation.

15. The lithographic apparatus according to claim 14 , wherein each of the radiation source units is formed such that the position and/or orientation of a radiation source within the unit is predetermined relative to the external reference surface of the radiation source unit to within an accuracy range such that any position error is less than 1 μm and/or any radiation beam pointing error is less than 1 mrad.

16. The lithographic apparatus according to claim 14 , wherein the replacement mechanism is configured to locate a replacement radiation source unit in a receiving location such that the reference surfaces of the receiving location and the radiation source unit meet.

17. A lithographic apparatus, configured to project a patterned beam of radiation onto a substrate comprising:
a plurality of radiation source units, each comprising a radiation source configured to provide a portion of the patterned beam of radiation;
a control system, configured to monitor a parameter of the performance of the radiation source units; and
a replacement mechanism, configured to be operated in response to an instruction from the control system to replace at least one of the radiation source units with a replacement unit;
wherein the control system is configured to control the replacement mechanism to replace at least one radiation source unit if a criterion is met based on the monitored parameter of performance of one of the radiation source units, and
wherein the replacement mechanis

Assignees

• Bleeker Arno Jan
• Hoeks Martinus Hendricus Henricus
• Cadee Theodorus Petrus Maria
• Asml Netherlands Bv

Inventors

• Bleeker Arno Jan
• Hoeks Martinus Hendricus Henricus
• Cadee Theodorus Petrus Maria

Classifications

• H10P76/00

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• G03F7/70391 Primary

  Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays · CPC title

• G03F7/70975

  Assembly, maintenance, transport or storage of apparatus · CPC title

• G03F7/70133 Primary

  Measurement of illumination distribution, in pupil plane or field plane · CPC title

• G03F7/20 Primary

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title