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US-2024427548-A1 · Dec 26, 2024 · US
Illumination system of a microlithographic projection exposure apparatus
US9310690B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9310690-B2 |
| Application number | US-201414543110-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 17, 2014 |
| Priority date | Nov 22, 2013 |
| Publication date | Apr 12, 2016 |
| Grant date | Apr 12, 2016 |
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Abstract
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An illumination system includes an optical integrator having a plurality of light entrance facets, whose images at least substantially superimpose in a mask plane. A spatial light modulator transmits or reflects impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light onto the spatial light modulator. An objective images a light exit surface of the spatial light modulator onto the light entrance facets of the optical integrator so that an image of an object area on the light exit surface completely coincides with one of the light entrance facets. A control unit controls the spatial light modulator such that along a scan direction a length of an image, which is formed on a mask from a light pattern in the object area, gradually increases at a beginning of a scan cycle and gradually decreases at the end of the scan cycle.
First claim
Opening claim text (preview).
What is claimed is: 1. An illumination system configured to illuminate an object moving along a scan direction, the illumination system comprising: an optical integrator configured so that, during use of the illumination system, the optical integrator produces a plurality of secondary light sources in a pupil plane of the illumination system, the optical integrator comprising a plurality of light entrance facets, each light entrance facet associated with a secondary light source,…
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Physics · mapped topic
- G02B26/0833Primary
Physics · mapped topic
Physics · mapped topic
- G03F7/70058Primary
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US9310690B2 cover?
- An illumination system includes an optical integrator having a plurality of light entrance facets, whose images at least substantially superimpose in a mask plane. A spatial light modulator transmits or reflects impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light onto the spatial light modulator. An objective images a light exit surface of th…
- Who is the assignee on this patent?
- Zeiss Carl Smt Gmbh
- What technology area does this patent fall under?
- Primary CPC classification G02B26/0833. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).