Substrate correction device, substrate lamination device, substrate processing system, substrate correction method, substrate processing method, and semiconductor device manufacturing method
US-2024404859-A1 · Dec 5, 2024 · US
US9463542B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9463542-B2 |
| Application number | US-201313887501-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 6, 2013 |
| Priority date | May 10, 2012 |
| Publication date | Oct 11, 2016 |
| Grant date | Oct 11, 2016 |
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Official abstract text for this publication.
A holding table for holding a platelike workpiece which includes a base and an annular holding member attached to the base. The annular holding member has an annular holding surface for holding the outer circumferential portion of the platelike workpiece thereon. Accordingly, a central recess is defined by the base and the annular holding member so as to be surrounded by the annular holding member. The annular holding member is formed with a suction opening exposed to the annular holding surface, a vacuum line having one end communicating with the suction opening and the other end connected to a vacuum source, a discharge opening exposed to the annular holding surface at a position radially outside of the suction opening, and a fluid line having one end communicating with the discharge opening and the other end connected to a fluid source.
Opening claim text (preview).
What is claimed is: 1. A holding table for holding a platelike workpiece, comprising: a base; and an annular holding member attached to the base, the annular holding member having an annular holding surface for holding an outer circumferential portion of the platelike workpiece thereon, whereby a central recess is defined by the base and the annular holding member so as to be surrounded by the annular holding member; the annular holding member being formed with a suction openi…
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