Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and LPP X-ray source comprising a laser light source and such a beam guidance system

Patent metadata

Field	Value
Publication number	US-9444214-B2
Application number	US-201414320045-A
Country	US
Kind code	B2
Filing date	Jun 30, 2014
Priority date	Jan 18, 2012
Publication date	Sep 13, 2016
Grant date	Sep 13, 2016

Abstract

A beam guidance system serves for the focusing guidance of radiation from a high-power laser light source toward a target. The beam guidance system has at least one mirror as reflective beam guidance component and at least one transmission component which is at least partially transmissive to the radiation as refractive beam guidance component. The arrangement of the at least one mirror and of the at least one transmission component is such that beam-induced changes to the beam guidance properties of the at least one mirror are at least partly compensated for by beam-induced changes to the beam guidance properties of the at least one transmission component. This results in a beam guidance system in which beam-induced changes to the beam guidance properties of the beam guidance system do not have a disturbing effect on the focusing guidance of the radiation from the laser light source.

First claim

The invention claimed is:

1. A system, comprising:
a mirror configured to reflect and guide radiation having a wavelength of between 9.5 μm and 11 μm toward a target; and
a transmission component which is at least partially transmissive to the radiation, the transmission component being configured to refract and guide the radiation toward the target,
wherein the mirror and the transmission component are configured so that, during use of the system, beam-induced changes to beam guidance properties of the mirror are at least partly compensated for by beam-induced changes to the beam guidance properties of the transmission component, and the transmission component has a compensation surface profile configured to at least partly compensate beam guidance aberrations produced by a component of the system.

2. The system of claim 1 , wherein the transmission component comprises a plane-parallel plate.

3. The system of claim 1 , wherein the transmission component comprises a wedge plate.

4. The system of claim 1 , wherein the transmission component is tiltable in a path of the radiation through the system.

5. The system of claim 1 , wherein the transmission component has a compensation surface profile configured to at least partly compensate beam guidance aberrations produced by a laser light source configured to provide the radiation.

6. The system of claim 1 , wherein the transmission component comprises ZnSe.

7. The system of claim 1 , wherein the mirror comprises a reflection surface comprising copper.

8. The system of claim 1 , wherein, in a starting state, the mirror has pure deflection properties for the radiation.

9. The system of claim 1 , further comprising:
a housing comprising a window which is transmissive to the radiation; and
a second mirror,
wherein the transmission component and the second mirror are accommodated in the housing.

10. The system of claim 1 , further comprising:
a sensor module configured to detect a focus of the radiation in a region of the target;
a displacement drive configured to displace the transmission component; and
a control/regulating device signal-connected to the sensor module and the displacement drive.

11. The system of claim 1 , wherein the system is configured to provide focus guidance of radiation from a second radiation source, and the second radiation source is a laser light source having a wavelength of the radiation in the range of between 800 nm and 1200 nm.

12. The system of claim 1 , further comprising a laser configured to provide the radiation.

13. The system of claim 12 , wherein the laser is configured so that the radiation has a cw power between 500 W and 100 kW.

14. The system of claim 12 , wherein the laser is a CO 2 laser.

15. The system of claim 1 , wherein the system comprises:
a plurality of mirrors configured to reflect and guide the radiation toward the target; and
a plurality of a transmission components which are at least partially transmissive to the radiation, the transmission components being configured to refract and guide the radiation toward the target,
wherein the mirrors and the transmission components are configured so that beam-induced changes to beam guidance properties of the mirrors are at least partly compensated for by beam-induced changes to the beam guidance properties of the transmission components.

16. The system of claim 1 , wherein the beam-guidance changes comprise at least one member selected from the group consisting of thermally-induced changes and intensity-induced changes.

17. The system of claim 1 , wherein the mirror and the transmission component are configured so that, during use of the system, beam-induced changes to beam guidance properties of the mirror are at least partly compensated for by beam-induced changes to the beam guidance properties of the transmission component so that a compensated beam guidance property corresponds to a predefined value at least 5% more than an uncompensated beam guidance property.

18. A source, comprising:
a laser light source configured to generate radiation having a cw power between 500 W and 100 kW; and
the system of claim 1 ,
wherein the source is a laser produced plasma x-ray source.

19. An optical system, comprising:
the system of claim 1 ,
wherein the optical system is EUV lithography system.

20. A system, comprising:
a laser configured to generate radiation having a wavelength in the range of between 9.5 μm and 11 μm with a cw power between 500 W and 100 kW;
a mirror configured to reflect and guide the radiation toward a target; and
a transmission component which is at least partially transmissive to the radiation, the transmission component comprising ZnSe, and the transmission component being configured to refract and guide the radiation toward the target,
wherein the mirror and the transmission component are configured so that, during use of the system, beam-induced changes to beam guidance properties of the mirror are at least partly compensated for by beam-induced changes to the beam guidance properties of the transmission component so that a compensated beam guidance property corresponds to a predefined value at least 5% more than an uncompensated beam guidance property.

21. A source, comprising:
a laser light source configured to generate radiation having a cw power between 500 W and 100 kW; and
the system of claim 20 ,
wherein the source is a laser produced plasma x-ray source.

22. An optical system, comprising:
the system of claim 20 ,
wherein the optical system is EUV lithography system.

23. A system, comprising:
a mirror configured to reflect and guide radiation having a wavelength of between 9.5 μm and 11 μm toward a target; and
a transmission component which is at least partially transmissive to the radiation, the transmission component being configured to refract and guide the radiation toward the target,
wherein the mirror and the transmission component are configured so that, during use of the system, beam-induced changes to beam guidance properties of the mirror are at least partly compensated for by beam-induced changes to the beam guidance properties of the transmission component so that a compensated beam guidance property corresponds to a predefined value at least 5% more than an uncompensated beam guidance property.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Dinger Udo

Classifications

• H05G2/0086

  Optical arrangements for conveying the laser beam to the plasma generation location · CPC title

• B23K26/032

  using optical means · CPC title

• B23K26/0643

  comprising mirrors · CPC title

• G02B7/1815

  with cooling or heating systems (cooling arrangements for laser mirrors H01S3/0401) · CPC title

• B23K26/0648

  comprising lenses · CPC title