Laser apparatus and extreme ultraviolet light generation system

US2016156150A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016156150-A1
Application numberUS-201615016961-A
CountryUS
Kind codeA1
Filing dateFeb 5, 2016
Priority dateSep 27, 2013
Publication dateJun 2, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An example of the disclosure is a laser apparatus including a master oscillator capable of outputting a pulse laser beam, a plurality of optical amplifiers disposed on an optical path of the pulse laser beam outputted from the master oscillator and configured to sequentially amplify the pulse laser beam, an optical reflector capable of passing the pulse laser beam therethrough and reflecting a self-oscillation beam generated in one of the plurality of optical amplifiers, and an optical absorber capable of receiving and absorbing the self-oscillation beam reflected by the optical reflector.

First claim

Opening claim text (preview).

What is claimed is: 1 . A laser apparatus comprising: a master oscillator capable of outputting a pulse laser beam; a plurality of optical amplifiers disposed on an optical path of the pulse laser beam outputted from the master oscillator, the plurality of optical amplifiers being configured to sequentially amplify the pulse laser beam; an optical reflector capable of passing the pulse laser beam therethrough and reflecting a self-oscillation beam generated in one of the plurality of optical amplifiers; and an optical absorber capable of receiving and absorbing the self-oscillation beam reflected by the optical reflector. 2 . The laser apparatus according to claim 1 , wherein the optical reflector is a hollow object having a through-hole through which the pulse laser beam passes, and at least one of an inner face and an outer face of the optical reflector is a reflective face capable of reflecting the self-oscillation beam. 3 . The laser apparatus according to claim 2 , wherein the optical absorber is a hollow object having a through-hole through which the pulse laser beam passes and is disposed coaxially with the optical reflector. 4 . The laser apparatus according to claim 1 , wherein the optical reflector has a flat shape and is disposed off an optical path of the pulse laser beam. 5 . The laser apparatus according to claim 4 , wherein the optical absorber has a flat shape and is disposed on the opposite side of the optical reflector with respect to the optical path of the pulse laser beam. 6 . An extreme ultraviolet light generation system comprising: a master oscillator capable of outputting a pulse laser beam; an optical amplifier disposed on an optical path of the pulse laser beam outputted from the master oscillator and capable of amplifying the pulse laser beam; a droplet supply device capable of supplying a droplet which turns into plasma by being irradiated with the pulse laser beam amplified by the optical amplifier to generate extreme ultraviolet light; and a transmissive optical element disposed between the master oscillator and the optical amplifier and capable of transmitting the pulse laser beam, the transmissive optical element being positioned such that reflection of spontaneous emission from the optical amplifier reflected off the droplet is directed to avoid the droplet.

Assignees

Inventors

Classifications

  • the energy-carrying beam being a laser beam · CPC title

  • by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control · CPC title

  • ASE (amplified spontaneous emission), noise; Reduction thereof · CPC title

  • Optical devices within, or forming part of, the tube, e.g. windows, mirrors (reflectors having variable properties or positions for initial adjustment of the resonator H01S3/086) · CPC title

  • Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping (shaping laser beam for working metal or other materials B23K26/06; optical elements, systems or apparatus in general G02B) · CPC title

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What does patent US2016156150A1 cover?
An example of the disclosure is a laser apparatus including a master oscillator capable of outputting a pulse laser beam, a plurality of optical amplifiers disposed on an optical path of the pulse laser beam outputted from the master oscillator and configured to sequentially amplify the pulse laser beam, an optical reflector capable of passing the pulse laser beam therethrough and reflecting a …
Who is the assignee on this patent?
Gigaphoton Inc
What technology area does this patent fall under?
Primary CPC classification H01S3/2316. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jun 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).