Method of controlling laser apparatus and laser apparatus

Patent metadata

Field	Value
Publication number	US-9350133-B2
Application number	US-201414579698-A
Country	US
Kind code	B2
Filing date	Dec 22, 2014
Priority date	Jun 26, 2012
Publication date	May 24, 2016
Grant date	May 24, 2016

Abstract

A method of controlling a laser apparatus may include: exchanging a gain medium in a chamber configured to output a laser beam by exciting the gain medium; first measuring, after the exchanging, pulse energy of a laser beam which is oscillated in the chamber under a specific gas pressure and a specific charge voltage; calculating an approximate expression indicating a relationship between the pulse energy of the laser beam and the gas pressure in the chamber and the charge voltage, or a table representing a correlationship between the pulse energy, the gas pressure and the charge voltage, based on the specific pressure, the specific charge voltage and the pulse energy in the first measuring; storing the approximate expression or the table; second measuring, after the first measuring, pulse energy Er of a laser beam oscillated in the chamber; calculating pulse energy Eec which is supposed to be obtained directly after the exchanging under the gas pressure and the charge voltage in the second measuring based on the approximate expression or the table; calculating a reduction amount ΔEd of pulse energy based on the pulse energy Eec and the pulse energy Er using ΔEd=Eec−Er; and calculating a partial gas exchange amount Q for partial gas exchange in the chamber based on the reduction amount ΔEd of pulse energy.

First claim

What is claimed is:

1. A method of controlling a laser apparatus comprising:
exchanging a laser gain medium in a laser chamber configured to output a laser beam by exciting the laser gain medium;
first measuring, after the exchanging, pulse energy of a laser beam which is oscillated in the laser chamber under a specific gas pressure and a specific charge voltage;
calculating an approximate expression indicating a relationship between the pulse energy of the laser beam and the gas pressure in the laser chamber and the charge voltage, or a table representing a correlationship between the pulse energy, the gas pressure and the charge voltage, based on the specific pressure, the specific charge voltage and the pulse energy in the first measuring;
storing the approximate expression or the table;
setting a lifetime of the laser chamber;
calculating a reference ΔEpt of an energy reduction amount based on the lifetime of the laser chamber such that the reference ΔEpt is smaller at longer lifetime of the laser chamber;
second measuring, after the first measuring, pulse energy Er of a laser beam oscillated in the laser chamber;
calculating pulse energy Eec which is supposed to be obtained directly after the exchanging under the gas pressure and the charge voltage in the second measuring based on the approximate expression or the table;
calculating a reduction amount ΔEd of pulse energy based on the pulse energy Eec and the pulse energy Er using ΔEd=Eec−Er; and
conducting, when the reduction amount ΔEd of pulse energy is equal to or greater than the reference ΔEpt, partial gas exchange of the laser gas in the laser chamber, wherein the reference ΔEpt of an energy reduction amount is calculated by ΔEpt=Em−ΔEnt,
where Em is calculated by Em=Emax−Eex, Emax is a value of maximum pulse energy in the data collected by the first measuring, and Eex is a value of maximum pulse energy instructed based on a request from an exposure apparatus, and
where ΔEnt is calculated by ΔEnt=Δd×Bt, Ad is an energy reduction amount per unit of the number of discharges, and Bt is the number of discharges representing the lifetime of the laser chamber.

2. The method according to claim 1 , wherein the number of values of gas pressures to be set in the laser chamber for measuring the pulse energy of the laser beam in the first measuring is plural.

3. The method according to claim 1 , wherein in the calculating the reduction amount ΔEd of pulse energy, the reduction amount ΔEd is calculated as a decrement ΔEn due to degradation of an electrode in the laser chamber being subtracted.

4. The method according to claim 1 , wherein in the calculating the pulse energy Eec, the pulse energy Eec is calculated as a decrement ΔEn due to degradation of an electrode in the laser chamber being subtracted.

5. The method according to claim 1 , wherein the number of values of charge voltages to be set for measuring the pulse energy of the laser beam in the first measuring is plural.

6. The method according to claim 1 , wherein the number of values of gas pressures to be set in the laser chamber for measuring the pulse energy of the laser beam in the first measuring is plural and the number of values of charge voltages to be set for measuring the pulse energy of the laser beam in the first measuring is plural.

Assignees

• Gigaphoton Inc

Inventors

• Wakabayashi Osamu
• Tsushima Hiroaki
• Kakizaki Kouji

Classifications

• H01S3/225

  comprising an excimer or exciplex · CPC title

• H01S3/2256

  KrF, i.e. krypton fluoride is comprised for lasing around 248 nm · CPC title

• H01S3/2258

  F2, i.e. molecular fluoride is comprised for lasing around 157 nm · CPC title

• H01S3/2251

  ArF, i.e. argon fluoride is comprised for lasing around 193 nm · CPC title

• H01S3/10069

  Memorized or pre-programmed characteristics, e.g. look-up table [LUT] · CPC title