Method for etching etching target layer

Patent metadata

Field	Value
Publication number	US-9418863-B2
Application number	US-201514709534-A
Country	US
Kind code	B2
Filing date	May 12, 2015
Priority date	May 14, 2014
Publication date	Aug 16, 2016
Grant date	Aug 16, 2016

Abstract

Disclosed is an etching method for etching an etching target layer. The etching method includes: a first step of depositing a plasma reaction product on a mask layer made of an organic film formed on the etching target layer; and after the first step, a second step of etching the etching target layer. The mask layer includes a coarse region in which a plurality of openings are formed, and a dense region surrounding the coarse region. The mask layer exists more densely in the dense region than in the coarse region. The coarse region includes a first region and a second region positioned close to the dense region compared to the first region. In the second step of the etching method, a width of the openings in the first region becomes narrower than a width of the openings in the second region.

First claim

What is claimed is:

1. An etching method for etching an etching target layer, the etching method comprising:
depositing a plasma reaction product on a mask layer made of an organic film formed on the etching target layer; and
etching the etching target layer after the depositing the plasma reaction product,
wherein the mask layer includes a coarse region in which a plurality of openings are formed, and a dense region surrounding the coarse region, the mask layer existing more densely in the dense region than in the coarse region,
the coarse region includes a first region and a second region positioned close to the dense region compared to the first region, and
in the depositing the plasma reaction product, a width of the openings in the first region becomes narrower than a width of the openings in the second region.

2. The etching method of claim 1 , wherein, in the depositing the plasma reaction product, plasma of a mixed gas including a silicon containing gas, an oxygen containing gas, and/or a hydrogen containing gas is generated.

3. The etching method of claim 2 , wherein the silicon containing gas includes SiCl 4 or SiF 4 .

4. The etching method of claim 2 , wherein the oxygen containing gas is O 2 gas.

5. The etching method of claim 2 , wherein the hydrogen containing gas is hydrocarbon gas.

6. The etching method of claim 5 , wherein the hydrogen containing gas is CH 4 .

7. The etching method of claim 1 , wherein the etching target layer is a multilayer film formed by alternately laminating a first dielectric film made of silicon oxide and a second dielectric film made of silicon nitride.

8. The etching method of claim 7 , wherein, in the etching the etching target layer, plasma of a processing gas including hydrogen gas, hydrogen bromide gas, and nitrogen trifluoride gas and further including at least one of hydrocarbon gas, fluorohydrocarbon gas, and fluorocarbon gas, is generated.

9. The etching method of claim 8 , wherein the fluorohydrocarbon gas is CH 2 F 2 gas, CH 3 F gas, or CHF 3 gas.

10. The etching method of claim 1 , wherein the organic film is an amorphous carbon film.

Assignees

• Tokyo Electron Ltd

Inventors

• Hirotsu Shin
• Igarashi Yoshiki
• Miwa Tomonori
• Okada Hiroshi

Classifications

• H10P50/283 Primary

  by chemical means · CPC title

• H10P50/73

  using masks for insulating materials · CPC title

• H10P50/28 Primary

  of insulating materials · CPC title

• H10P50/286 Primary

  of organic materials · CPC title

• H01J37/32091

  the radio frequency energy being capacitively coupled to the plasma · CPC title