Method of forming a nano-structure

Patent metadata

Field	Value
Publication number	US-9410260-B2
Application number	US-201013822062-A
Country	US
Kind code	B2
Filing date	Oct 21, 2010
Priority date	Oct 21, 2010
Publication date	Aug 9, 2016
Grant date	Aug 9, 2016

Abstract

A method of forming a nano-structure involves forming a multi-layered structure including an oxidizable material layer established on a substrate, and another oxidizable material layer established on the oxidizable material layer. The oxidizable material layer is an oxidizable material having an expansion coefficient, during oxidation, that is more than 1. Anodizing the other oxidizable material layer forms a porous anodic structure, and anodizing the oxidizable material layer forms a dense oxidized layer and nano-pillars which grow through the porous anodic structure into pores thereof. The porous structure is selectively removed to expose the nano-pillars. A surface (I) between the dense oxidized layer and a remaining portion of the oxidizable material layer is anodized to consume a substantially cone-shaped portion of the nano-pillars to form cylindrical nano-pillars.

First claim

What is claimed is:

1. A method of forming a nano-structure, comprising:
forming a multi-layered structure including i) an oxidizable material layer established on a substrate, and ii) an other oxidizable material layer established on the oxidizable material layer, the oxidizable material layer being formed of an oxidizable material having an expansion coefficient, during oxidation, that is more than 1;
forming a template having pores therein by anodizing the other oxidizable material layer to form a porous anodic structure;
anodizing the oxidizable material layer to form a dense oxidized layer, and nano-pillars which grow through the template into the template pores;
selectively removing the entire template to expose the nano-pillars; and
then anodizing a surface between the dense oxidized layer and a remaining portion of the oxidizable material layer to consume a substantially cone-shaped portion of the nano-pillars, thereby forming cylindrical nano-pillars.

2. The method as defined in claim 1 wherein the anodizing of the surface between the dense oxide layer and the remaining portion of the oxidizable material layer planarizes the dense oxide layer.

3. The method as defined in claim 2 wherein the anodizing of the surface between the dense oxide layer and the remaining portion of the oxidizable material layer is accomplished using 0.1% citric acid and a voltage ranging from about 20 V to about 200 V.

4. The method as defined in claim 1 wherein the anodization of the other oxidizable material layer is accomplished using an electrolyte chosen from H 2 SO 4 , H 3 PO 4 , H 2 C 2 O 4 , H 2 CrO 4 and mixtures thereof.

5. The method as defined in claim 1 wherein the anodization of the oxidizable material layer is accomplished using an electrolyte chosen from C 6 H 8 O 7 , H 3 BO 3 , (NH 4 ) 2 B 10 O 16 ×8H 2 O, H 4 NO 2 CCH(OH)CH(OH)CO 2 NH 4 , and mixtures thereof.

6. The method as defined in claim 1 wherein the anodization of the other oxidizable material layer and the anodization of the oxidizable material layer are accomplished using any of H 2 SO 4 , H 3 PO 4 , H 2 C 2 O 4 , H 2 CrO 4 and mixtures thereof as an electrolyte.

7. The method as defined in claim 1 wherein selectively removing the entire template is accomplished via a selective etching process.

8. The method as defined in claim 1 , further comprising coating the cylindrical nano-pillars with a material chosen from aluminum oxide, zirconium oxide, titanium dioxide, silicon dioxide, tungsten oxide, zinc oxide, hafnium oxide, and combinations thereof.

9. The method as defined in claim 1 , further comprising selecting aluminum as the other oxidizable material layer and tantalum as the oxidizable material layer.

10. The method as defined in claim 1 wherein each of the anodization processes is accomplished via electrochemical oxidation.

11. The method as defined in claim 1 wherein the template does not extend into the oxidizable material layer.

12. The method as defined in claim 1 wherein the substrate is glass, quartz, alumina, stainless steel, plastic, or a combination thereof.

Assignees

• Mardilovich Peter
• Wei Qingqiao
• Fuller Anthony M
• Hewlett Packard Development Co Lp

Inventors

• Mardilovich Peter
• Wei Qingqiao
• Fuller Anthony M

Classifications

• C25D11/34

  of metals or alloys not provided for in groups C25D11/04 - C25D11/32 · CPC title

• B81B2203/0361

  Tips, pillars · CPC title

• B81C1/00031 Primary

  Regular or irregular arrays of nanoscale structures, e.g. etch mask layer (photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002) · CPC title

• B81C2201/0114

  Electrochemical etching, anodic oxidation · CPC title

• C25D11/12

  Anodising more than once, e.g. in different baths · CPC title