Coating apparatus

Patent metadata

Field	Value
Publication number	US-9401291-B2
Application number	US-201414525502-A
Country	US
Kind code	B2
Filing date	Oct 28, 2014
Priority date	Nov 13, 2013
Publication date	Jul 26, 2016
Grant date	Jul 26, 2016

Abstract

A coating apparatus includes: a slit nozzle including a retention chamber that retains the coating material; a moving mechanism that moves the slit nozzle; a pressure regulation unit that regulates a pressure inside the retention chamber; and a control unit that controls the moving mechanism and the pressure regulation unit to relatively move the slit nozzle with respect to the substrate while changing the pressure inside the retention chamber toward an atmospheric pressure from a negative pressure, wherein the control unit is configured to control the pressure regulation unit so that a change in the pressure inside the retention chamber in a start zone including a coating start position and an end zone including a coating end position becomes slower than a change in the pressure inside the retention chamber in a middle zone except the start zone and the end zone.

First claim

What is claimed is:

1. A coating apparatus for applying a coating material to a substrate, comprising:
a slit nozzle comprising a retention chamber that retains the coating material;
a moving mechanism that relatively moves the slit nozzle with respect to the substrate, the retention chamber is adapted to contain a volume of the coating material that decreases throughout application of the coating material;
a pressure regulation unit that regulates a pressure inside the retention chamber; and
a control unit that is configured to control the moving mechanism and the pressure regulation unit to relatively move the slit nozzle evenly in a moving direction to scan with respect to the substrate in the moving direction from a coating start position on the substrate through a middle zone to a coating end position on the substrate while constantly increasing the pressure inside the retention chamber toward an atmospheric pressure from a negative pressure,
wherein an entire coating length of the substrate consists of three zones which are a start zone, the middle zone, and an end zone;
wherein the control unit is further configured to control the pressure regulation unit so that a change in the pressure inside the retention chamber while the slit nozzle is relatively moved in the moving direction throughout the start zone which includes the coating start position and throughout the end zone which includes the coating end position becomes slower than a change in the pressure inside the retention chamber while the slit nozzle is relatively moved in the moving direction throughout the middle zone, and to control the pressure regulation unit so that the pressure inside the retention chamber at the coating start position starts with a fixed pressure and the pressure inside the retention chamber is constantly increased while the slit nozzle is moved from the coating start position to the coating end position,
a slope is defined as pressure inside the retention chamber vs distance moved in the moving direction, the slope correspondingly to the middle zone is different than the slope corresponding to the start zone and the end zone; and the slope corresponding to the start zone and the slope corresponding to the end zone are less than the slope corresponding to the middle zone,
the start zone has a first predetermined length in the moving direction from the coating start position to an end point of the start zone, the end point of the start zone is closer than the coating start position to the end zone, the end zone has a second predetermined length in the moving direction from a start point of the end zone to the coating end position, the start point of the end zone is closer than the coating end position to the start zone, the middle zone is from the end point of the start zone to the start point of the end zone,
the coating start position of the start zone is a first end of the circular substrate,
the coating end position of the end zone is a second end of the circular substrate opposite to the first end,
the start zone, the middle zone, and the end zone cover the entire diameter of the circular substrate.

2. The coating apparatus according to claim 1 ,
wherein the control unit comprises a setting unit that sets a start-time pressure being a pressure inside the retention chamber at the coating start position and an end-time pressure being a pressure inside the retention chamber at the coating end position, and is configured to control the pressure regulation unit so that the change in the pressure inside the retention chamber at least in the start zone and the end zone becomes a change along an S-shaped curve linking the start-time pressure and the end-time pressure set by the setting unit.

3. The coating apparatus according to claim 2 ,
wherein the control unit is configured to control the pressure regulation unit so that the change in the pressure inside the retention chamber in an entire zone from the coating start position to the coating end position becomes a change along the S-shaped curve linking the start-time pressure and the end-time pressure set by the setting unit.

4. The coating apparatus according to claim 2 ,
wherein the control unit is configured to decide the S-shaped curve linking the start-time pressure and the end-time pressure on a basis of an S-shaped curve function indicating a relationship between a position on the substrate and a proportion of a coated area in a surface area of the substrate.

5. The coating apparatus according to claim 3 ,
wherein the control unit is configured to decide the S-shaped curve linking the start-time pressure and the end-time pressure on a basis of an S-shaped curve function indicating a relationship between a position on the substrate and a proportion of a coated area in a surface area of the substrate.

6. The coating apparatus according to claim 1 ,
wherein the start zone has the end point at a position closer to the coating start position than is a position away from the coating start position toward the coating end position by a distance of ⅕ of a diameter of the substrate, and
wherein the end zone has the start point at a position closer to the coating end position than is a position away from the coating end position toward the coating start position by a distance of ⅕ of the diameter of the substrate.

7. The coating apparatus according to claim 2 ,
wherein the start zone has the end point at a position closer to the coating start position than is a position away from the coating start position toward the coating end position by a distance of ⅕ of a diameter of the substrate, and
wherein the end zone has the start point at a position closer to the coating end position than is a position away from the coating end position toward the coating start position by a distance of ⅕ of the diameter of the substrate.

8. The coating apparatus according to claim 3 ,
wherein the start zone has the end point at a position closer to the coating start position than is a position away from the coating start position toward the coating end position by a distance of ⅕ of a diameter of the substrate, and
wherein the end zone has the start point at a position closer to the coating end position than is a position away from the coating end position toward the coating start position by a distance of ⅕ of the diameter of the substrate.

9. The coating apparatus according to claim 4 ,
wherein the start zone has the end point at a position closer to the coating start position than is a position away from the coating start position toward the coating end position by a distance of ⅕ of a diameter of the substrate, and
wherein the end zone has the start point at a position closer to the coating end position than is a position away from the coating end position toward the coating start position by a distance of ⅕ of the diameter of the substrate.

10. The coating apparatus according to claim 5 ,
wherein the start zone has the end point at a position closer to the coating start position than is a position away from the coating start position toward the coating end position by a distance of ⅕ of a diameter of the substrate, and
wherein the end zone has the start point at a position closer to the coating end position than is a position away from the coating end position toward the coating start position by a distance of ⅕ of the diameter of the substrate.

Assignees

• Tokyo Electron Ltd

Inventors

• Mimura Yuji
• Maki Tetsuya
• Tsuruta Shigeto
• Oonishi Tatsumi
• Ikemoto Daisuke
• Masunaga Takahiro

Classifications

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0448 Primary

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• B05C5/0254

  Coating heads with slot-shaped outlet (B05C5/0283 takes precedence) · CPC title

• B05C11/1047

  Apparatus or installations for supplying liquid or other fluent material comprising a buffer container or an accumulator between the supply source and the applicator · CPC title

• B05C11/1013

  responsive to flow or pressure of liquid or other fluent material (B05C11/101 takes precedence; control of flow in general G05D7/00; control of fluid pressure in general G05D16/00) · CPC title