Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective
US-10859815-B2 · Dec 8, 2020 · US
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Walter Holger patents
Walter Holger is listed as an inventor on 22 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Walter Holger |
| Total patents | 22 |
| First publication | Jun 9, 2015 |
| Latest publication | Dec 8, 2020 |
Notable patents
Publications ranked by popularity score, then publication date.
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
US-10684551-B2 · Jun 16, 2020 · US
Euv exposure apparatus with reflective elements having reduced influence of temperature variation
US-2019310555-A1 · Oct 10, 2019 · US
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
US-10317802-B2 · Jun 11, 2019 · US
Euv exposure apparatus with reflective elements having reduced influence of temperature variation
US-2018299784-A1 · Oct 18, 2018 · US
Projection exposure apparatus with optimized adjustment possibility
US-10054860-B2 · Aug 21, 2018 · US
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
US-10031423-B2 · Jul 24, 2018 · US
Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective
US-2018196256-A1 · Jul 12, 2018 · US
Euv exposure apparatus with reflective elements having reduced influence of temperature variation
US-2017315449-A1 · Nov 2, 2017 · US
Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus
US-9760019-B2 · Sep 12, 2017 · US
Recent patents
Latest publications not already listed above.
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
US-9746778-B2 · Aug 29, 2017 · US
Microlithographic apparatus and method of varying a light irradiance distribution
US-9720336-B2 · Aug 1, 2017 · US
Projection exposure apparatus with optimized adjustment possibility
US-2016252824-A1 · Sep 1, 2016 · US
Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus
US-2016216616-A1 · Jul 28, 2016 · US
Euv exposure apparatus with reflective elements having reduced influence of temperature variation
US-2016195818-A1 · Jul 7, 2016 · US
Projection exposure apparatus with optimized adjustment possibility
US-9354524-B2 · May 31, 2016 · US
EUV exposure apparatus with reflective elements having reduced influence of temperature variation
US-9316929-B2 · Apr 19, 2016 · US
Microlithographic apparatus and method of varying a light irradiance distribution
US-2016004174-A1 · Jan 7, 2016 · US
Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
US-9207541-B2 · Dec 8, 2015 · US
Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus
US-9164402-B2 · Oct 20, 2015 · US
Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same
US-9081310-B2 · Jul 14, 2015 · US
Projection exposure apparatus with optimized adjustment possibility
US-9052609-B2 · Jun 9, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 22 |
| Asml Netherlands Bv | 9 |
| Walter Holger | 2 |
| Bittner Boris | 1 |
| Roesch Matthias | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70891 | 16 |
| G03F7/7015 | 11 |
| G03F7/70308 | 11 |
| G03F7/70266 | 11 |
| G02B7/1815 | 10 |