Apparatus and method to control vacuum at porous material using multiple porous materials

Patent metadata

Field	Value
Publication number	US-9329492-B2
Application number	US-201313929199-A
Country	US
Kind code	B2
Filing date	Jun 27, 2013
Priority date	Oct 22, 2008
Publication date	May 3, 2016
Grant date	May 3, 2016

Abstract

An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes an aperture through which a patterned image is projected, an outlet, a first chamber into which the immersion liquid is recovered through the outlet, and a second chamber into which the immersion liquid is recovered through a porous member from the first chamber. The porous member has a first surface contacting the first chamber and a second surface contacting the second chamber. A vertical position of a first portion of the first surface is different from a vertical position of a second portion of the first surface.

First claim

What is claimed is:

1. An immersion liquid confinement apparatus for confining an immersion liquid in an immersion area that includes a gap between a projection system and an object in an immersion lithography system, the apparatus also recovering the immersion liquid from the immersion area, the apparatus comprising:
an aperture through which a patterned image is projected;
an outlet that faces downwardly so that the outlet faces the object, the outlet located radially outward of an outer circumference of the aperture relative to an optical axis of the projection system;
a first chamber into which the immersion liquid is recovered through the outlet; and
a second chamber into which the immersion liquid is recovered through a porous member from the first chamber,
wherein:
the porous member has a first surface contacting the first chamber and a second surface contacting the second chamber, and
a vertical position of a first portion of the first surface is different from a vertical position of a second portion of the first surface.

2. The apparatus of claim 1 , wherein the first surface of the porous member is convex.

3. The apparatus of claim 1 , wherein the first surface of the porous member is slanted.

4. The apparatus of claim 1 , wherein the porous member is a mesh.

5. The apparatus of claim 1 , wherein the porous member is a sponge.

6. The apparatus of claim 1 , wherein the porous member is a plate having holes extending through the plate.

7. The apparatus of claim 1 , wherein a mixture of the immersion liquid and a gas is removed from the immersion area into the first chamber.

8. The apparatus of claim 1 , wherein a mixture of the immersion liquid and a gas is removed from the first chamber through the porous member.

9. An immersion lithography apparatus comprising:
a projection system having a final optical element;
a movable stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage; and
the immersion liquid confinement apparatus of claim 1 .

10. An immersion liquid confinement apparatus for confining an immersion liquid in an immersion area that includes a gap between a projection system and an object in an immersion lithography system, the apparatus also recovering the immersion liquid from the immersion area, the apparatus comprising:
a body;
an aperture provided on the body and through which a patterned image is projected;
an outlet provided on the body;
a first chamber provided in the body and into which the immersion liquid is recovered through the outlet; and
a second chamber provided in the body and into which substantially only the immersion liquid is recovered from the first chamber,
wherein:
the outlet is covered with a porous member through which the immersion liquid is removed from the immersion area into the first chamber.

11. The apparatus of claim 10 , wherein the porous member is a mesh.

12. The apparatus of claim 10 , wherein the porous member is a sponge.

13. The apparatus of claim 10 , wherein the porous member is a plate having holes extending through the plate.

14. The apparatus of claim 10 , wherein a mixture of the immersion liquid and a gas is removed from the immersion area through the porous member.

15. An immersion lithography apparatus comprising:
a projection system having a final optical element;
a movable stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage; and
the immersion liquid confinement apparatus of claim 10 .

16. An immersion liquid confinement apparatus for confining an immersion liquid in an immersion area that includes a gap between a projection system and an object in an immersion lithography system, the apparatus also recovering the immersion liquid from the immersion area, the apparatus comprising:
an aperture through which a patterned image is projected;
an outlet;
a first chamber into which the immersion liquid is recovered through the outlet; and
a second chamber into which substantially only the immersion liquid is recovered from the first chamber, a part of the second chamber protruding into the first chamber,
wherein:
the outlet is covered with a porous member through which the immersion liquid is removed from the immersion area into the first chamber.

Assignees

• Nikon Corp

Inventors

• Poon Alex Ka Tim
• Kho Leonard Wai Fung
• Coon Derek

Classifications

• G03B27/52

  Details · CPC title

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title