Particle beam device comprising an electrode unit

Patent metadata

Field	Value
Publication number	US-9312093-B1
Application number	US-201414321921-A
Country	US
Kind code	B1
Filing date	Jul 2, 2014
Priority date	Jun 27, 2014
Publication date	Apr 12, 2016
Grant date	Apr 12, 2016

Abstract

A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.

First claim

The invention claimed is:

1. A particle beam device, comprising:
at least one beam generator for generating a particle beam having charged particles;
at least one electrode unit comprising a first electrode and a second electrode, wherein the first electrode interacts with the second electrode for influencing the particle beam;
at least one low-pass filter being connected with at least one of the first electrode and the second electrode, using an electrical connection; and
a mounting unit comprising an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit.

2. The particle beam device according to claim 1 , further comprising:
a vacuum chamber, wherein the mounting unit, the first electrode, the second electrode and the at least one low-pass filter are arranged in the vacuum chamber.

3. The particle beam device according to claim 1 , further comprising at least one of the following features:
(i) the first electrode adjoins the opening of the mounting unit; or
(ii) the second electrode adjoins the opening of the mounting unit.

4. The particle beam device according to claim 1 , further comprising:
an optical axis, wherein the optical axis passes the opening of the mounting unit.

5. The particle beam device according to claim 1 , further comprising at least one of the following features:
(i) the at least one low-pass filter and the first electrode are arranged at a first distance to each other, wherein the first distance is one of: between 0.1 cm and 5 cm, between 0.5 cm and 4 cm and between 1 cm and 3 cm; or
(ii) the at least one low-pass filter and the second electrode are arranged at a second distance to each other, wherein the second distance is one of: between 0.1 cm and 5 cm, between 0.5 cm and 4 cm and between 1 cm and 3 cm.

6. The particle beam device according to claim 1 , wherein the electrical connection has a length being one of: between 0.1 cm and 5 cm, between 0.5 cm and 4 cm, or between 1 cm and 3 cm.

7. The particle beam device according to claim 1 , wherein the at least one low-pass filter is a first low-pass filter, and wherein the particle beam device further comprises:
a second low-pass filter being arranged at the mounting unit, wherein the first low-pass filter is connected with the first electrode and wherein the second low-pass filter is connected with the second electrode.

8. The particle beam device according to claim 1 ,
wherein the electrode unit comprises a third electrode and a fourth electrode, wherein the third electrode interacts with the fourth electrode for influencing the particle beam,
wherein the particle beam device further comprises a further low-pass filter being connected with at least one of: the third electrode and the fourth electrode, using a further electrical connection, and
wherein the further low-pass filter, the third electrode and the fourth electrode are arranged at the mounting unit.

9. The particle beam device according to claim 1 , wherein the mounting unit is a circuit board.

10. The particle beam device according to claim 1 , wherein the mounting unit is arranged in an encapsulated housing.

11. The particle beam device according to claim 1 , wherein the mounting unit is an encapsulated housing.

12. The particle beam device according to claim 1 , further comprising:
an objective lens for focusing the particle beam on an object; and
a detector for detecting at least one of: interaction particles and interaction radiation generated by interaction of the particle beam with the object.

13. The particle beam device according to claim 1 , wherein the particle beam device is one of: an electron beam device or an ion beam device.

14. The particle beam device according to claim 1 , wherein the electrode unit is a deflection unit, the particle beam device further comprising at least one of the following features:
(i) the first electrode is a first deflecting electrode; or
(ii) the second electrode is a second deflecting electrode.

15. The particle beam device according to claim 8 , wherein the electrode unit is a deflection unit, and wherein the particle beam device further comprises at least one of the following features:
(i) the third electrode is a third deflecting electrode; or
(ii) the fourth electrode is a fourth deflecting electrode.

16. The particle beam device according to claim 1 , wherein the electrode unit comprises at least one of:
(i) at least one correction unit;
(ii) at least one deflection unit; or
(iii) at least one multipole unit.

17. The particle beam device according to claim 1 , further comprising:
an aberration corrector unit to correct for at least one of: chromatic aberration or spherical aberration of the particle beam.

18. A particle beam device, comprising:
at least one beam generator for generating a particle beam having charged particles;
at least one electrode unit comprising a first electrode and a second electrode, wherein the first electrode interacts with the second electrode for influencing the particle beam;
at least one low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection; and
a vacuum chamber, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged in the vacuum chamber.

19. The particle beam device according to claim 18 , wherein the electrode unit is a deflection unit, and wherein the particle beam device further comprises at least one of the following features:
(i) the first electrode is a first deflecting electrode; or
(ii) the second electrode is a second deflecting electrode.

20. The particle beam device according to claim 18 , wherein the electrode unit comprises at least one of:
(i) at least one correction unit;
(ii) at least one deflection unit; or
(iii) at least one multipole unit.

21. The particle beam device according to claim 18 , further comprising:
an aberration corrector unit to correct for at least one of: chromatic aberration or spherical aberration of the particle beam.

Assignees

• Zeiss Carl Microscopy Gmbh

Inventors

• Fober Joerg
• Fichter Edgar
• Schubert Kai
• Preikszas Dirk
• Hendrich Christian
• Mommsen Momme
• Schnell Michael
• Lechner Lorenz

Classifications

• H01J37/24 Primary

  Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for · CPC title

• H01J37/1471 Primary

  for centering, aligning or positioning of ray or beam · CPC title

• H01J37/26

  Electron or ion microscopes; Electron or ion diffraction tubes · CPC title

• H01J2237/153

  Correcting image defects, e.g. stigmators · CPC title

• H01J2237/1504

  Associated circuits · CPC title