Transparent conductive film

Patent metadata

Field	Value
Publication number	US-9301398-B2
Application number	US-201113879891-A
Country	US
Kind code	B2
Filing date	Nov 10, 2011
Priority date	Nov 11, 2010
Publication date	Mar 29, 2016
Grant date	Mar 29, 2016

Abstract

A transparent conductive film 1 includes: a substrate film 11 composed of a transparent resin; a high refractive index coat layer 12 formed on a surface of the substrate film 11 , and having an optical refractive index higher than that of the substrate film 11 ; a low refractive index coat layer 13 formed on a surface of the high refractive index coat layer 12 , and having an optical refractive index lower than that of the high refractive index coat layer 12 ; a moisture-proof underlying layer 14 formed on a surface of the low refractive index coat layer 13 and composed of silicon oxide; and a transparent wiring layer 15 patterned on a surface of the underlying layer 14 and composed of crystalline ITO having an optical refractive index higher than the underlying layer 14 . The crystallite size of ITO in the transparent wiring layer 15 is 9 nm or less.

First claim

The invention claimed is:

1. A transparent conductive film, comprising:
a substrate film comprising a transparent resin;
a high refractive index coat layer formed on a surface of the substrate film, the high refractive index coat layer having an optical refractive index that is higher than that of the substrate film;
a low refractive index coat layer formed on a surface of the high refractive index coat layer, the low refractive index coat layer having an optical refractive index that is lower than that of the high refractive index coat layer;
a moisture-proof underlying layer formed on a surface of the low refractive index coat layer and comprising silicon oxide; and
a transparent wiring layer patterned on a surface of the underlying layer and comprising crystalline ITO having an optical refractive index that is higher than that of the underlying layer, wherein
a crystallite size of ITO in the transparent wiring layer is in the range of 7.8 nm to 9 nm.

2. A method for producing a transparent conductive film, the method comprising:
forming, on a surface of a multilayer film on the side of a low refractive index coat layer, a moisture-proof underlying layer comprising silicon oxide, the multilayer film comprising a high refractive index coat layer formed on a surface of a substrate film comprising a transparent resin and the high refractive index coat layer having an optical refractive index that is higher than that of the substrate film, and the low refractive index coat layer formed on a surface of the high refractive index coat layer and the low refractive index coat layer having an optical refractive index that is lower than that of the high refractive index coat layer;
then forming, on a surface of the underlying layer, a transparent conductive membrane comprising amorphous ITO having an optical refractive index that is higher than that of the underlying layer;
then forming a transparent wiring layer by partially etching the transparent conductive membrane to be patterned; and
then crystallizing the transparent wiring layer by annealing a laminated body comprised of the multilayer film, the underlying layer and the transparent wiring layer, wherein
a crystallite size of ITO in the annealed transparent wiring layer is in the range from 7.8 nm to 9 nm.

3. The transparent conductive film according to claim 1 , wherein a film thickness of the transparent wiring layer is in the range from 18 nm to 30 nm.

4. The method for producing a transparent conductive film according to claim 2 , wherein a film thickness of the transparent wiring layer is in the range from 18 nm to 30 nm.

Assignees

• Kawaguchi Yasuhiro
• Furuta Ken
• Kitagawa Ind Co Ltd

Inventors

• Kawaguchi Yasuhiro
• Furuta Ken

Classifications

• C23C14/0042 Primary

  Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements · CPC title

• Y10T428/24802

  Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] · CPC title

• H05K1/09

  Use of materials for the {conductive, e.g. } metallic pattern · CPC title

• H05K3/067 Primary

  Etchants · CPC title

• C23C14/086

  of zinc, germanium, cadmium, indium, tin, thallium or bismuth · CPC title