Superalloy target
US-11866805-B2 · Jan 9, 2024 · US
US9449632B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9449632-B2 |
| Application number | US-201213432931-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 28, 2012 |
| Priority date | Mar 30, 2011 |
| Publication date | Sep 20, 2016 |
| Grant date | Sep 20, 2016 |
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A method for manufacturing a magnetic recording medium including at least a non-magnetic substrate, a soft magnetic underlayer, an orientation control layer that controls an orientation of an immediate upper layer, and a perpendicular magnetic layer in which a magnetization easy axis is mainly perpendicularly oriented with respect to the non-magnetic substrate so as to be laminated one another on the non-magnetic substrate. The perpendicular magnetic layer includes two or more magnetic layers, and each layer is subjected to a crystal growth such that each crystal grain composing each magnetic layer forms a columnar crystal continuous in a thickness direction together with the crystal grains composing the orientation control layer. The orientation control layer, formed of a Co—Cr alloy, is formed by the reactive sputtering using a mixture of a sputtering gas and nitrogen.
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What is claimed is: 1. A method for manufacturing a magnetic recording medium comprising at least a non-magnetic substrate, a soft magnetic underlayer, an orientation control layer that controls an orientation of an immediate upper layer, and a perpendicular magnetic layer in which a magnetization easy axis is mainly perpendicularly oriented with respect to the non-magnetic substrate so as to be laminated one another on the non-magnetic substrate, characterized in that: the perpendicular magnetic layer includes two or more magnetic layers, and each layer is subjected to a crystal growth such that each crystal grain composing each magnetic layer forms a columnar crystal continuous in a thickness direction together with the crystal grains composing the orientation control layer, wherein the orientation control layer, formed of a Co—Cr alloy, is formed by reactive sputtering using a mixture of a sputtering gas and nitrogen, thereby causing the nitrogen to be doped in the crystal grains of the Co—Cr alloy within a range from 3 atomic % to 15 atomic %, and wherein, in a corrugated surface in which a top part of each columnar crystal composing the orientation control layer is formed into a convex, a height from the topmost part of each columnar crystal to a boundary with the next columnar crystal is set to a value of an outer diameter or less of the columnar crystal. 2. The method for manufacturing the magnetic recording medium according to claim 1 , wherein the Co—Cr alloy contains Co within a range from 50 atomic % to 80 atomic % and Cr within a range from 20 atomic % to 50 atomic %. 3. The method for manufacturing the magnetic recording medium according to claim 1 , wherein the Co—Cr alloy contains at least one or more elements selected from Pt, B, Ta, Mo, Cu, Nd, W, Nb, Sm, Tb, Ru, and Re within a range from 1 atomic % to 10 atomic %. 4. The method for manufacturing the magnetic recording medium according to claim 1 , wherein the crystal grains composing the orientation control layer are set to have a grain diameter of 5 nm or less. 5. The method for manufacturing the magnetic recording medium according to claim 1 , wherein a Ru layer or a second orientation control layer containing Ru as a main component is formed on the orientation control layer. 6. The method for manufacturing the magnetic recording medium according to claim 1 , wherein the magnetic layer or the non-magnetic layer has a granular structure. 7. A magnetic recording/reproducing apparatus, comprising: a magnetic recording medium manufactured by the manufacturing method according to claim 1 , and a magnetic head for performing recording and reproducing of information with respect to the magnetic recording medium.
by cathodic sputtering · CPC title
containing Co (containing inorganic, non-oxide compounds of Si, N, P, B, H or C G11B5/657; containing oxygen G11B5/658) · CPC title
Reactive sputtering · CPC title
Physics · mapped topic
Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements · CPC title
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