Laser irradiation method and laser irradiation apparatus

US9296068B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9296068-B2
Application numberUS-89998310-A
CountryUS
Kind codeB2
Filing dateOct 7, 2010
Priority dateMar 26, 2004
Publication dateMar 29, 2016
Grant dateMar 29, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An object of the present invention is to provide a laser irradiation method and a laser irradiation apparatus for irradiating an irradiation surface with a linear beam having more homogeneous intensity by blocking a low-intensity part of the linear beam without forming the fringes due to the diffraction on the irradiation surface. In the laser irradiation, a laser beam emitted from a laser oscillator 101 passes through a slit 102 so as to block a low-intensity part of the laser beam, the traveling direction of the laser beam is bent by a mirror 103 , and an image formed at the slit is projected to an irradiation surface 106 by a convex cylindrical lens 104.

First claim

Opening claim text (preview).

What is claimed is: 1. A laser irradiation method comprising: blocking a low-intensity part of a first laser beam emitted from a laser oscillator which is either a YAG laser or a YVO 4 laser to form a second laser beam, by making the first laser beam pass through a slit; bending a traveling direction of the second laser beam by a predetermined angle by a mirror; and projecting an image formed at the slit to an irradiation surface by a convex cylindrical lens, wherein the second laser beam is shaped into a linear beam on the irradiation surface, wherein the slit, the convex cylindrical lens, and the irradiation surface are arranged so that a distance (M1) between the slit and the convex cylindrical lens and a distance (M2) between the convex cylindrical lens and the irradiation surface satisfy following equations 1 and 2: M 1= f ( s+D )/ D   [Equation 1] M 2= f ( s+D )/ s   [Equation 2] where s is a width of the slit, D is a length of the linear beam in a long-side direction, and f is a focal length of the convex cylindrical lens, wherein the mirror is provided between the slit and the convex cylindrical lens, wherein the convex cylindrical lens acts in the long-side direction of the linear beam, and wherein the slit acts in the long-side direction of the linear beam. 2. The laser irradiation method according to claim 1 , wherein a second convex cylindrical lens is provided between the convex cylindrical lens and the irradiation surface in such a way that the second convex cylindrical lens is rotated by 90° from the convex cylindrical lens. 3. A laser irradiation apparatus comprising: a laser oscillator which is either a YAG laser or a YVO 4 laser; a slit for blocking a low-intensity part of a first laser beam emitted from the laser oscillator to form a second laser beam; a mirror for bending a traveling direction of the second laser beam by a predetermined angle; and a convex cylindrical lens for projecting to an irradiation surface an image formed at the slit in which the low-intensity part is blocked, wherein the second laser beam is shaped into a linear beam on the irradiation surface, wherein the slit, the convex cylindrical lens, and the irradiation surface are arranged so that a distance (M1) between the slit and the convex cylindrical lens and a distance (M2) between the convex cylindrical lens and the irradiation surface satisfy following equations 1 and 2: M 1= f ( s+D )/ D   [Equation 1] M 2= f ( s+D )/ s   [Equation 2] where s is a width of the slit, D is a length of the linear beam in a long-side direction, and f is a focal length of the convex cylindrical lens, wherein the mirror is provided between the slit and the convex cylindrical lens, wherein the convex cylindrical lens acts in the long-side direction of the linear beam, and wherein the slit acts in the long-side direction of the linear beam. 4. The laser irradiation apparatus according to claim 3 , wherein a second convex cylindrical lens is provided between the convex cylindrical lens and the irradiation surface in such a way that the second convex cylindrical lens is rotated by 90° from the convex cylindrical lens. 5. A laser irradiation method comprising: blocking a low-intensity part of a first laser beam emitted from a laser oscillator which is either a YAG laser or a YVO 4 laser to form a second laser beam, by making the first laser beam pass through a slit; bending a traveling direction of the second laser beam by a predetermined angle by a mirror; and projecting an image formed at the slit to an irradiation surface by a convex spherical lens, wherein the second laser beam is shaped into a linear beam on the irradiation surface, wherein the slit, the convex spherical lens, and the irradiation surface are arranged so that a distance (M1) between the slit and the convex spherical lens and a distance (M2) between the convex spherical lens and the irradiation surface satisfy following equations 1 and 2: M 1= f ( s+D )/ D   [Equation 1] M 2= f ( s+D )/ s   [Equation 2] where s is a width of the slit, D is a length of the linear beam in a long-side direction, and f is a focal length of the convex spherical lens, wherein the mirror is provided between the slit and the convex spherical lens, wherein the convex spherical lens acts in the long-side direction of the linear beam, and wherein the slit acts in the long-side direction of the linear beam.

Assignees

Inventors

Classifications

  • into a linear shape · CPC title

  • B23K26/066Primary

    by using masks · CPC title

  • characterised by control of the annealing or irradiation parameters · CPC title

  • Operations & Transport · mapped topic

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US9296068B2 cover?
An object of the present invention is to provide a laser irradiation method and a laser irradiation apparatus for irradiating an irradiation surface with a linear beam having more homogeneous intensity by blocking a low-intensity part of the linear beam without forming the fringes due to the diffraction on the irradiation surface. In the laser irradiation, a laser beam emitted from a laser osci…
Who is the assignee on this patent?
Tanaka Koichiro, Yamamoto Yoshiaki, Semiconductor Energy Lab
What technology area does this patent fall under?
Primary CPC classification B23K26/066. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).