Apparatus for fabricating blank mask and method of fabricating the same
US-2024248390-A1 · Jul 25, 2024 · US
US9268242B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9268242-B2 |
| Application number | US-86956010-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 26, 2010 |
| Priority date | Aug 13, 2004 |
| Publication date | Feb 23, 2016 |
| Grant date | Feb 23, 2016 |
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A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
Opening claim text (preview).
The invention claimed is: 1. A lithographic apparatus, comprising: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid; a substrate temperature conditioning system configured to provide heat transfer to or from at least a portion of the substrat…
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