Lithographic apparatus and a method of operating the apparatus
US-12072635-B2 · Aug 27, 2024 · US
Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder
US9268236B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9268236-B2 |
| Application number | US-81424210-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 11, 2010 |
| Priority date | Jun 21, 2005 |
| Publication date | Feb 23, 2016 |
| Grant date | Feb 23, 2016 |
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Abstract
Official abstract text for this publication.
A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.
First claim
Opening claim text (preview).
What is claimed is: 1. A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held in an indent on a substrate table, the apparatus comprising: a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe having, in use, therein vapor and configured to enable…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
- G03F7/70341Primary
Physics · mapped topic
Electricity · mapped topic
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- What does patent US9268236B2 cover?
- A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within th…
- Who is the assignee on this patent?
- Jacobs Johannes Henricus Wilhelmus, Bouchoms Igor Petrus Maria, Kemper Nicolaas Rudolf, and 10 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70341. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 23 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).