Wafer processing method
US-2024395620-A1 · Nov 28, 2024 · US
US9028649B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9028649-B2 |
| Application number | US-201313834708-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 15, 2013 |
| Priority date | Sep 28, 2010 |
| Publication date | May 12, 2015 |
| Grant date | May 12, 2015 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Provided is a semiconductor die pick-up apparatus including a stage, a suction opening, a cover that opens and closes a suction opening, and projections and primary holes arranged at a circumferential edge of the suction opening and project from a contact surface. When picking up a semiconductor die, in a state in which at least a portion of a contour of the semiconductor die sticks out from the projections toward the outer circumference of the stage, a retaining sheet at the portion sticking out from the primary holes is suctioned, a tip end of the cover is caused to advance upward, the cover is caused to slide while pushing the retaining sheet and the semiconductor die upward to open the suction opening sequentially, the opened suction opening is caused to suction the retaining sheet sequentially to separate the retaining sheet from the semiconductor die.
Opening claim text (preview).
The invention claimed is: 1. A semiconductor die pick-up apparatus for picking up a semiconductor die applied to a retaining sheet, the apparatus comprising: a stage comprising a contact surface configured to be in close contact with a first surface of the retaining sheet, the first surface being opposite of a second surface to which the semiconductor die is applied; a suction opening provided in the contact surface; a cover provided for the stage so as to allow a tip end of t…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Related publications grouped by family.
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Answers are generated from the same data shown on this page.