Method and assembly for treating a planar material to be treated and device for removing or holding off treatment liquid

US9016230B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9016230-B2
Application numberUS-201013320504-A
CountryUS
Kind codeB2
Filing dateMay 12, 2010
Priority dateMay 13, 2009
Publication dateApr 28, 2015
Grant dateApr 28, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In order to remove treatment liquid ( 21 ) from a planar material to be treated ( 10 ), which is transported in an assembly for wet-chemical treatment of the material to be treated ( 10 ), a retaining surface ( 4, 14 ) is provided for holding back the treatment liquid ( 21 ). The retaining surface ( 4, 14 ) is arranged relative to a transport path of the material to be treated ( 10 ) so that a gap ( 8, 18 ) remains between the retaining surface ( 4, 14 ) and a surface of the material to be treated ( 10 ) opposing the retaining surface ( 4, 14 ), when the material to be treated ( 10 ) is moved past the retaining surface ( 4, 14 ). The retaining surface ( 4, 14 ) may, for example, be provided as an offset portion of a peripheral surface of a roll ( 2, 3 ).

First claim

Opening claim text (preview).

The invention claimed is: 1. An assembly for treating a planar material to be treated, the assembly being designed to apply on at least one surface of the material to be treated a treatment liquid or to immerse the material to be treated in a treatment liquid, and the assembly being designed to transport the material to be treated along a transport path, the assembly comprising: a treatment station, which is configured to accumulate the treatment liquid; an application device, which is configured to apply the treatment fluid to the planar material to be treated; a device for removing or holding off treatment liquid from the planar material to be treated, the device being provided in an inflow region of the treatment station, the device comprising a retaining surface for holding back the treatment liquid and being arranged relative to the transport path of the material to be treated so that the device forms a gap between the retaining surface and a surface of the material to be treated transported along the transport path; and a further device for removing or holding off treatment liquid from the planar material to be treated, the further device being provided in an outflow region of the treatment station, the further device comprising a retaining surface for holding back the treatment liquid and being arranged relative to the transport path of the material to be treated so that the further device forms a gap between the retaining surface and the surface of the material to be treated transported along the transport path; the assembly being designed to rotate in opposite directions the retaining surface of the device provided in the inflow region of the treatment station and the retaining surface of the further device provided in the outflow region of the treatment station, wherein the retaining surface of the device provided in the inflow region and the retaining surface of the further device provided in the outflow region which are rotated in opposite directions are both located above a transport plane of the material to be treated, or both located below the transport plane of the material to be treated. 2. An assembly according to claim 1 , wherein the retaining surface of the device provided in the inflow region of the treatment station and/or the retaining surface of the further device provided in the outflow region of the treatment station is formed on a roll, the treatment liquid being accumulated on both sides of the roll, and a difference in levels of the treatment liquid being set on opposing sides of the gap. 3. An assembly according to claim 1 , wherein the device provided in the inflow region of the treatment station and/or the further device provided in the outflow region of the treatment station comprises: a flow device spaced apart from the retaining surface which is designed to remove, by means of a fluid flow, the treatment liquid from the material to be treated. 4. An assembly according to claim 3 , the flow device being designed and arranged such that the fluid flow does not pass through the gap. 5. An assembly according to claim 1 , wherein the retaining surface of the further device provided in the outflow region is formed on a roll which is set in rotation so that a part of a surface of the roll which is closest to the material to be treated moves in a direction which opposes a transport direction of the material to be treated. 6. An assembly according to claim 1 , wherein the retaining surface of the device provided in the inflow region of the treatment station is formed on a central portion of a roll, wherein the roll comprises axial end portions which engage retaining rails mounted to edges of the material to be treated. 7. An assembly according to claim 6 , wherein the axial end portions have a diameter which is smaller than a diameter of the central portion of the roll on which the retaining surface is formed. 8. An assembly according to claim 6 , wherein the retaining surface of the further device provided in the outflow region of the treatment station is formed on a central portion of a further roll, wherein the further roll comprises axial end portions which engage the retaining rails mounted to the edges of the material to be treated. 9. An assembly according to claim 1 , wherein the retaining surface of the device provided in the inflow region of the treatment station is formed on a roll which further comprises transport portions configured to transport the material to be treated, wherein the retaining surface has a diameter which is smaller than a diameter of the transport portions, and wherein the retaining surface is rotatable relative to the transport portion. 10. An assembly according to claim 9 , wherein the transport portions and the retaining surface are coaxially arranged. 11. An assembly according to claim 1 , wherein the retaining surface of the further device provided in the outflow region of the treatment station is formed on a roll which further comprises transport portions configured to transport the material to be treated, wherein the retaining surface has a diameter which is smaller than a diameter of the transport portions, and wherein the retaining surface is rotatable relative to the transport portion. 12. An assembly according to claim 11 , wherein the transport portions and the retaining surface are coaxially arranged. 13. An assembly according to claim 1 , wherein the device provided in the inflow region of the treatment station further comprises: a second retaining surface, wherein the retaining surface of the device provided in the inflow region of the treatment station and the second retaining surface of the device provided in the inflow region of the treatment station are arranged on opposing sides of the transport plane; and wherein the device provided in the outflow region of the treatment station further comprises: a second retaining surface, wherein the retaining surface of the device provided in the outflow region of the treatment station and the second retaining surface of the device provided in the outflow region of the treatment station are arranged on opposing sides of the transport plane. 14. An assembly according to claim 13 , wherein the second retaining surface of the device provided in the inflow region of the treatment station and the second retaining surface of the device provided in the outflow region of the treatment station are arranged on a same side relative to the transport plane, and wherein the assembly is configured to rotate in opposite directions the second retaining surface of the device provided in the inflow region of the treatment station and the second retaining surface of the device provided in the outflow region of the treatment station.

Assignees

Inventors

Classifications

  • Processing both sides of a PCB by the same process; Providing a similar arrangement of components on both sides; Making interlayer connections from two sides · CPC title

  • Constructional parts, or assemblies thereof, of cells for electrolytic coating · CPC title

  • H05K3/0085Primary

    Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor (apparatus specially adapted for manufacturing assemblages of electric components, e.g. printed circuit boards, H05K13/00) · CPC title

  • Agitating of electrolytes; Moving of racks · CPC title

  • Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet · CPC title

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What does patent US9016230B2 cover?
In order to remove treatment liquid ( 21 ) from a planar material to be treated ( 10 ), which is transported in an assembly for wet-chemical treatment of the material to be treated ( 10 ), a retaining surface ( 4, 14 ) is provided for holding back the treatment liquid ( 21 ). The retaining surface ( 4, 14 ) is arranged relative to a transport path of the material to be treated ( 10 ) so that a …
Who is the assignee on this patent?
Kunze Henry, Wiener Ferdinand, Atotech Deutschland Gmbh
What technology area does this patent fall under?
Primary CPC classification H05K3/0085. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).