Mounting table structure, film forming apparatus and raw material recovery method

Patent metadata

Field	Value
Publication number	US-8992686-B2
Application number	US-201113225049-A
Country	US
Kind code	B2
Filing date	Sep 2, 2011
Priority date	Mar 3, 2009
Publication date	Mar 31, 2015
Grant date	Mar 31, 2015

Abstract

Provided is a mounting table structure for use in forming a thin film on a surface of a target object mounted on the mounting table structure by using a raw material gas including an organic metal compound in a processing chamber. The mounting table structure includes: a mounting table main body which mounts thereon the target object and has therein a heater; and a base which supports the mounting table main body while surrounding a side surface and a bottom surface of the mounting table main body, the base having therein a coolant path where a coolant flows therethrough and being maintained at a temperature higher than the solidification temperature or the liquefaction temperature of the raw material gas, but lower than the decomposition temperature of the raw material gas.

First claim

What is claimed is:

1. A mounting table structure for use in forming a thin film on a surface of a target object mounted on the mounting table structure by using a raw material gas including an organic metal compound in a vacuum evacuable processing chamber, the mounting table structure comprising:
a mounting table main body which mounts thereon the target object and has therein a heater;
a plurality of thermal insulators; and
a base which supports the mounting table main body via the thermal insulators while surrounding a side surface and a bottom surface of the mounting table main body, the base having therein a coolant path where a coolant flows therethrough, wherein the base is configured to be maintained at a temperature higher than a solidification temperature or a liquefaction temperature of the raw material gas, but lower than a decomposition temperature of the raw material gas,
wherein the base includes:
a circular plate-shaped base portion, made of a metal, which has therein the coolant path and supports the mounting table main body via the thermal insulators provided between a top surface of the base portion and the bottom surface of the mounting table main body; and
an edge ring, made of a metal, which stands upright on a peripheral edge of the base portion so as to surround the side surface of the mounting table main body and is coupled to the base portion as one unit,
wherein a thermal conduction buffer member is provided between the base portion and the edge ring, the thermal conduction buffer member being made of a metal having a thermal conductivity lower than a thermal conductivity of the metal forming the edge ring,
wherein a space exists between an inner peripheral surface of the edge ring and the side surface of the mounting table main body,
wherein a shield ring is detachably provided between the side surface of the mounting table main body and the inner peripheral surface of the edge ring,
wherein a plurality of spaces exists between the thermal insulators, and
wherein each of the thermal insulators has a support protrusion at an upper portion thereof and leg portions at a lower portion thereof, the support protrusion being in contact with the bottom surface of the mounting table main body and the leg portions being in contact with the top surface of the base portion.

2. The mounting table structure of claim 1 , wherein the base portion and the edge ring are detachably coupled to each other by bolts.

3. The mounting table structure of claim 1 or 2 , wherein a top surface of the edge ring extends by a predetermined distance toward a diametrically outer side of the target object.

4. The mounting table structure of claim 1 , wherein a cover ring for suppressing formation of a thin film on a side surface of the target object is provided on the edge ring.

5. The mounting table structure of claim 4 , wherein a coating film is formed on a surface of the cover ring.

6. The mounting table structure of claim 1 , wherein a coating film is formed on a surface of the edge ring.

7. The mounting table structure of claim 1 , wherein a coating film is formed on a surface of the shield ring.

8. The mounting table structure of any one of claims 5 to 7 , wherein the coating film is one of a thermally sprayed metal film and a plated film.

9. The mounting table structure of claim 1 , wherein the base is supported by a support standing upright on a bottom portion of the processing chamber.

10. A film forming apparatus for performing a film forming process for forming a thin film on a surface of a target object by using a raw material gas including an organic metal compound, the film forming apparatus comprising:
a vacuum evacuable processing chamber;
the mounting table structure of claim 1 , for mounting thereon the target object;
a gas introduction unit for introducing a gas into the processing chamber;
a raw material gas supply system, connected to the gas introduction unit, for supplying the raw material gas;
a gas exhaust system for exhausting the atmosphere in the processing chamber;
a trap mechanism for collecting and recovering an unreacted raw material gas in an exhaust gas flowing in the gas exhaust system, and
a control unit configured to control the coolant to maintain the base at a temperature higher than a solidification temperature or a liquefaction temperature of the raw material gas, but lower than a decomposition temperature of the raw material gas.

11. The film forming apparatus of claim 10 , wherein the trap mechanism solidifies and recovers the raw material gas.

12. The film forming apparatus of claim 10 , wherein a gas outlet forming part forming a gas exhaust outlet is provided in the processing chamber such that a lower end portion thereof is positioned close to an upper peripheral edge portion of the mounting table structure.

13. The film forming apparatus of claim 12 , wherein the gas exhaust outlet is formed in an annular shape along a circumferential direction of the mounting table structure.

14. The film forming apparatus of claim 12 , wherein a gas introduction unit for supplying the raw material gas to be directed toward the gas exhaust outlet is provided at a diametrically outer side of the target object mounted on the mounting table structure in the processing chamber.

15. The film forming apparatus of claim 12 , wherein the gas outlet forming part is positioned above the mounting table structure.

16. The film forming apparatus of claim 15 , wherein the gas exhaust outlet is formed between the upper peripheral edge portion of the mounting table structure and the lower end portion of the gas outlet forming part.

17. The film forming apparatus of claim 15 , wherein a ring-shaped protrusion is formed at the lower end portion of the gas outlet forming part along a circumferential direction thereof.

18. The film forming apparatus of claim 12 , wherein the gas exhaust outlet is formed between the upper peripheral edge portion of the mounting table structure and the lower end portion of the gas outlet forming part.

19. The film forming apparatus of claim 18 , wherein a ring-shaped protrusion is formed at the lower end portion of the gas outlet forming part along a circumferential direction thereof.

20. The film forming apparatus of claim 12 , wherein a ring-shaped protrusion is formed at the lower end portion of the gas outlet forming part along a circumferential direction thereof.

21. A mounting table structure for use in forming a thin film on a surface of a target object mounted on the mounting table structure by using a raw material gas including an organic metal compound in a vacuum evacuable processing chamber, the mounting table structure comprising:
a mounting table main body which mounts thereon the target object and has therein a heater;
a plurality of thermal insulators;
a circular plate-shaped base portion, made of a metal, which supports the mounting table main body via the thermal insulators and has therein a coolant path where a coolant flows therethrough; and
a peripheral component which is detachably provided at an outer peripheral side of the mounting table main body so as to surround the mounting table main body, wherein the peripheral component is configured to be maintained at a temperature equal to or higher than a decomposition temperature of the raw material gas during thin film formation,
wherein the thermal insulators are provided between a top surface of the base portion and a bottom surface of the mounting table main body

Assignees

• Gomi Atsushi
• Mizusawa Yasushi
• Hatano Tatsuo
• Hara Masamichi
• Yamamoto Kaoru
• Taga Satoshi
• Yasumuro Chiaki
• Tokyo Electron Ltd

Inventors

• Gomi Atsushi
• Mizusawa Yasushi
• Hatano Tatsuo
• Hara Masamichi
• Yamamoto Kaoru
• Taga Satoshi
• Yasumuro Chiaki

Classifications

• H10P72/0434

  mainly by convection · CPC title

• H10P72/7624 Primary

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• C23C16/4585

  Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds · CPC title

• C23C16/4404 Primary

  Coatings or surface treatment on the inside of the reaction chamber or on parts thereof · CPC title

• H01L21/67109

  Electricity · mapped topic