Apparatus for fabricating blank mask and method of fabricating the same
US-2024248390-A1 · Jul 25, 2024 · US
Lithographic apparatus and device manufacturing method
US8976334B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8976334-B2 |
| Application number | US-201113240908-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 22, 2011 |
| Priority date | Apr 5, 2005 |
| Publication date | Mar 10, 2015 |
| Grant date | Mar 10, 2015 |
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Abstract
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A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
First claim
Opening claim text (preview).
The invention claimed is: 1. A lithographic apparatus, comprising: a movable table; a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate; and a barrier member configured to at least partly contain a liquid in a space between the projection system and the table, the barrier member comprising an outlet to remove liquid from the space, the outlet having a two-dimensional array of holes in an external surface of the ba…
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Classifications
- G03F7/70808Primary
Physics · mapped topic
- G03F7/70341Primary
Physics · mapped topic
Physics · mapped topic
- G03F7/70716Primary
Physics · mapped topic
Physics · mapped topic
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- What does patent US8976334B2 cover?
- A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
- Who is the assignee on this patent?
- Beckers Marcel, Donders Sjoerd Nicolaas Lambertus, Hoogendam Christiaan Alexander, and 6 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70808. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).