Lithographic apparatus and a method of operating the apparatus
US-12072635-B2 · Aug 27, 2024 · US
Exposure method, exposure apparatus, and device manufacturing method
US8941812B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8941812-B2 |
| Application number | US-201213541570-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 3, 2012 |
| Priority date | Apr 28, 2005 |
| Publication date | Jan 27, 2015 |
| Grant date | Jan 27, 2015 |
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Abstract
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An exposure apparatus comprises a movable member that moves under a projection optical system while holding a substrate; and an immersion nozzle that has a supply port and forms a immersion region under the projection optical system by supplying a liquid to an image plane side of the projection optical system via the supply port. The supply port is provided to a lower surface of the immersion nozzle and the liquid is supplied downwardly from the supply port. A contact area of the immersion region with a surface of the substrate has a rhomboid shape.
First claim
Opening claim text (preview).
What is claimed is: 1. An exposure apparatus that exposes a substrate via a projection optical system and a liquid immersion region formed under the projection optical system, comprising: a movable member that is configured to move under the projection optical system while holding the substrate; and an immersion nozzle that has a supply port and forms the immersion region under the projection optical system by supplying a liquid to an image plane side of the projection optical s…
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Physics · mapped topic
Physics · mapped topic
- G03F7/70341Primary
Physics · mapped topic
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Frequently asked questions
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- What does patent US8941812B2 cover?
- An exposure apparatus comprises a movable member that moves under a projection optical system while holding a substrate; and an immersion nozzle that has a supply port and forms a immersion region under the projection optical system by supplying a liquid to an image plane side of the projection optical system via the supply port. The supply port is provided to a lower surface of the immersion n…
- Who is the assignee on this patent?
- Shiraishi Kenichi, Fujiwara Tomoharu, Nikon Corp
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70341. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 27 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).