Dopants to Increase BiSbX Bandgap for Optimal CPP Conductivity

Patent metadata

Field	Value
Publication number	US-2025248317-A1
Application number	US-202519011149-A
Country	US
Kind code	A1
Filing date	Jan 6, 2025
Priority date	Jan 26, 2024
Publication date	Jul 31, 2025
Grant date	—

Abstract

Current-perpendicular-to-plane (CPP) spin orbit torque (SOT) devices generally require a lower bulk conductivity to minimize shunting while maintaining a high spin Hall angle and strong thermal stability. A CPP SOT device comprises a ferromagnetic layer and a topological insulating (TI) layer comprising one of: BiSb doped with Ge and MgTiO; C; Z; ZTiO; or ZO, where Z is one of Mg, Be, Ca, Sr, or Ba. Doping the TI layer comprising BiSb decreases the bulk conductivity of the TI layer while increasing the melting temperature of the TI layer. The TI layer has a thickness between about 50 Å to about 600 Å, a conductivity between about 0.2×10 5 ohm −1 m −1 to about 1.1×10 5 ohm −1 m −1 , and a melting point between about 293° C. to about 302° C. The CPP SOT device may further comprise a buffer layer, a first interlayer, a second interlayer, and a cap layer.

First claim

What is claimed is:

1 . A spin orbit torque (SOT) device, comprising:
a ferromagnetic layer; and a topological insulating (TI) layer comprising one of:
BiSb doped with Ge and MgTiO;
BiSb doped with TiO, Z, ZTiO, or ZO, where Z is one of Mg, Be, Ca, Sr, or Ba;
BiSb doped with FeCrC;
BiSb doped with C; or
BiSb doped with X—C or an X-O, where X is one or more elements selected from the group consisting of: Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Rh, Ag, Ta, Hf, W, Re, Ir, Pt, B, Al, Ga, In, Si, Ge, Sn, P, As, Se, and Te.

2 . The SOT device of claim 1 , wherein the SOT device is a current-perpendicular-to-plane (CPP) SOT device.

3 . The SOT device of claim 1 , wherein the TI layer comprises Ge in an amount of about 8 at. % or less and MgTiO in an amount of about 8 at. % or less, BiSb with about 16 at. % of Sb doped with about 5 at. % Mg or about 8 at. % TiO, or the C or X—C dopant in an amount of about 8 at. % or less.

4 . The SOT device of claim 1 , wherein the TI layer has a thickness between about 50 Å to about 600 Å.

5 . The SOT device of claim 1 , further comprising:
a buffer layer disposed adjacent to the TI layer; a first interlayer disposed on the TI layer, the first interlayer being disposed between the TI layer and the ferromagnetic layer; and a second interlayer disposed on the ferromagnetic layer.

6 . The SOT device of claim 1 , further comprising:
a buffer layer; a second interlayer disposed on the buffer layer, the second interlayer being disposed adjacent to the ferromagnetic layer; and a first interlayer disposed on the ferromagnetic layer, the first interlayer being disposed adjacent to the TI layer.

7 . The SOT device of claim 1 , wherein the TI layer comprises one of:
BiSb doped with Ge and MgTiO; BiSb doped with TiO, Z, ZTiO, or ZO, where Z is one of Mg, Be, Ca, Sr, or Ba; BiSb doped with FeCrC; or BiSb doped with C.

8 . The SOT device of claim 1 , wherein the TI layer comprises BiSb doped with X-C, where X is one or more elements selected from the group consisting of: Sc, Ti, V, Zn, Ta, Hf, W, Re, Ir, Si, and Ge.

9 . A magnetic recording device comprising the SOT device of claim 1 .

10 . A current-perpendicular-to-plane (CPP) spin orbit torque (SOT) device, comprising:
a ferromagnetic layer; and a topological insulating (TI) layer comprising one of:
BiSb doped with Ge and MgTiO;
BiSb doped with TiO, Z, ZTiO, or ZO, where Z is one of Mg, Be, Ca, Sr, or Ba;
BiSb doped with C; or
BiSb doped with an X—C dopant or an X—O dopant, where X is one or more elements selected from the group consisting of: Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Rh, Ag, Ta, Hf, W, Re, Ir, Pt, B, Al, Ga, In, Si, Ge, Sn, P, As, Se, and Te, wherein the TI layer has a thickness between about 50 Å to about 600 Å.

11 . The CPP SOT device of claim 10 , wherein the TI layer has a melting point between about 293° C. to about 302° C.

12 . The CPP SOT device of claim 10 , wherein the TI layer has a conductivity between about 0.2×10 5 ohm −1 m −1 to about 1.1×10 5 ohm −1 m −1 .

13 . The CPP SOT device of claim 10 , further comprising:
a buffer layer; a first interlayer; a second interlayer; and a cap layer.

14 . The CPP SOT device of claim 13 , wherein the TI layer is disposed on the buffer layer, the first interlayer is disposed on the TI layer, the ferromagnetic layer is disposed on the first interlayer, the second interlayer is disposed on the ferromagnetic layer, and the cap layer is disposed on the second interlayer.

15 . The CPP SOT device of claim 13 , wherein the second interlayer is disposed on the buffer layer, the ferromagnetic layer is disposed on the second interlayer, the first interlayer is disposed on the ferromagnetic layer, the TI layer is disposed on the first interlayer, and the cap layer is disposed on the TI layer.

16 . The CPP SOT device of claim 10 , wherein the TI layer comprises one of:
BiSb doped with Ge and MgTiO; BiSb doped with TiO, Z, ZTiO, or ZO, where Z is one of Mg, Be, Ca, Sr, or Ba; BiSb doped with FeCrC; or BiSb doped with C.

17 . The CPP SOT device of claim 10 , wherein the TI layer comprises BiSb doped with X-C, where X is one or more elements selected from the group consisting of: Sc, Ti, V, Zn, Ta, Hf, W, Re, Ir, Si, and Ge.

18 . A magnetic recording device comprising the CPP SOT device of claim 10 .

19 . A current-perpendicular-to-plane (CPP) spin orbit torque (SOT) device, comprising:
a buffer layer; a ferromagnetic layer; a first interlayer; a second interlayer; and a topological insulating (TI) layer comprising one of:
BiSb doped with Ge and MgTiO;
BiSb doped with TiO, Z, ZTiO, or ZO, where Z is one of Mg, Be, Ca, Sr, or Ba;
BiSb doped with C; or
BiSb doped with an X—C dopant or an X—O dopant, where X is one or more elements selected from the group consisting of: Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Rh, Ag, Ta, Hf, W, Re, Ir, Pt, B, Al, Ga, In, Si, Ge, Sn, P, As, Se, and Te.

20 . The CPP SOT device of claim 19 , wherein the TI layer comprises Ge and MgTiO in an amount of about 8 at. % or less, the X—O dopant in an amount of about 8 at. % or less, or the C or X—C dopant in an amount of about 8 at. % or less.

21 . The CPP SOT device of claim 19 , wherein the TI layer has a thickness between about 150 Å to about 600 Å, and wherein the TI layer has a conductivity between about 0.2×10 5 ohm −1 m −1 to about 1.1×10 5 ohm −1 m −1 .

22 . The CPP SOT device of claim 19 , wherein the TI layer is disposed on the buffer layer, the second interlayer is disposed on the TI layer, the ferromagnetic layer is disposed on the second interlayer, and the first interlayer is disposed on the ferromagnetic layer.

23 . The CPP SOT device of claim 19 , wherein the first interlayer is disposed on the buffer layer, the ferromagnetic layer is disposed on the first interlayer, the second interlayer is disposed on the ferromagnetic layer, and the TI layer is disposed on the second interlayer.

24 . The CPP SOT device of claim 19 , wherein the TI layer comprises one of:
BiSb doped with Ge and MgTiO; BiSb doped with TiO, Z, ZTiO, or ZO, where Z is one of Mg, Be, Ca, Sr, or Ba; BiSb doped with FeCrC; or BiSb doped with C.

25 . The CPP SOT device of claim 19 , wherein the TI layer comprises BiSb doped with X-C, where X is one or more elements selected from the group consisting of: Sc, TI, V, Zn, Ta, Hf, W, Re, Ir, Si, and Ge.

26 . A magnetic recording device comprising the CPP SOT device of claim 19 .

Assignees

• Western Digital Tech Inc

Inventors

• Le Quang
• York Brian R
• Gribelyuk Michael A
• James Jason S
• Takano Hisashi
• Liu Xiaoyong
• Le Son T
• Osman Hassan
• Maeda Maki

Classifications

• H10N50/85 Primary

  Materials of the active region · CPC title

• H10N52/80

  Constructional details · CPC title

• H10N50/10

  Magnetoresistive devices · CPC title

• G11B5/3909 Primary

  Arrangements using a magnetic tunnel junction · CPC title