Particle-induced x-ray emission (pixe) using hydrogen and multi-species focused ion beams

Patent metadata

Field	Value
Publication number	US-2024418660-A1
Application number	US-202418797255-A
Country	US
Kind code	A1
Filing date	Aug 7, 2024
Priority date	Apr 25, 2022
Publication date	Dec 19, 2024
Grant date	—

Abstract

An apparatus comprises: a focused ion beam (FIB) column within a vacuum chamber configured to direct ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and an X-ray detector configured to detect and measure X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample. The apparatus may further comprise an electron microscope column within the vacuum chamber configured to direct and focus a beam of electrons onto the sample and to detect secondary electrons or backscattered electrons that are emitted from the sample in response to the impingement of the beam of electrons onto the sample. The electron microscope may generate an image of a sample area that is milled by the FIB column.

First claim

What is claimed is:

1 . An apparatus comprising:
a focused ion beam (FIB) column within a vacuum chamber configured to direct ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and an X-ray detector configured to detect and measure X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.

2 . An apparatus as recited in claim 1 , wherein the FIB column is configured to direct the proton and non-hydrogen ion beams onto an area of the sample such that the proton and non-hydrogen ion beams overlap at the area.

3 . An apparatus as recited in claim 2 , wherein the FIB column is configured to focus the proton and non-hydrogen ion beams onto the area.

4 . An apparatus as recited in claim 1 , wherein the FIB column is further configured to mill a surface of the sample.

5 . An apparatus as recited in claim 1 , wherein the non-hydrogen ions comprise either Ar + ions, Xe + ions or Kr + ions.

6 . An apparatus as recited in claim 1 , wherein the kinetic energy of ions of the mixture is not greater than 30 keV.

7 . An apparatus as recited in claim 1 , further comprising:
an electron microscope column within the vacuum chamber configured to direct and focus a beam of electrons onto the sample and to detect secondary electrons or backscattered electrons that are emitted from the sample in response to the impingement of the beam of electrons onto the sample.

8 . An apparatus as recited in claim 7 , wherein
the FIB column is configured to direct the proton and non-hydrogen ion beams onto an area of the sample, and wherein the electron microscope column is configured to generate an image of the area of the sample.

9 . An apparatus as recited in claim 8 , wherein the FIB column is further configured to mill the area of the sample.

Assignees

• Fei Co

Inventors

• Totonjian Daniel
• Botman Aurelien Philippe Jean Maclou
• Toth Milos

Classifications

• G01N23/2257

  Measuring excited X-rays, i.e. particle-induced X-ray emission [PIXE] · CPC title

• G01N23/2252

  Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA] · CPC title

• G01N23/203

  Measuring back scattering · CPC title

• G01N23/2251

  using incident electron beams, e.g. scanning electron microscopy [SEM] · CPC title

• H01J37/3056

  for microworking, e. g. etching of gratings or trimming of electrical components · CPC title