Pattern measurement device and computer program for evaluating patterns based on centroids of the patterns

US9804107B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9804107-B2
Application numberUS-201415103894-A
CountryUS
Kind codeB2
Filing dateNov 17, 2014
Priority dateDec 27, 2013
Publication dateOct 31, 2017
Grant dateOct 31, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

The purpose of the present invention is to provide a pattern measurement device for quantitatively evaluating a pattern formed using a directed self-assembly (DSA) method with high accuracy. The present invention is a pattern measurement device for measuring distances between patterns formed in a sample, wherein the centroids of a plurality of patterns included in an image are determined; the inter-centroid distances, and the like, of the plurality of centroids are determined; and on the basis of the inter-centroid distances, and the like, of the plurality of centroids, a pattern meeting a specific condition is distinguished from patterns different from the pattern meeting the specific condition or information is calculated about the number of the patterns meeting the specific condition, the size of an area including the patterns meeting the specific condition, and the number of imaginary lines between the patterns meeting the specific condition.

First claim

Opening claim text (preview).

The invention claimed is: 1. A pattern measurement device comprising: a calculation device that measures a dimension between patterns formed in a sample, by using data which is obtained by irradiating the sample with a beam, wherein the calculation device obtains centroids of a plurality of patterns contained in the data; obtains at least one of an inter-centroid distance of the plurality of patterns, angle information of imaginary lines which link the plurality of centroids to each other, and area information of a closed shape formed by the imaginary lines; and distinguishes at least one of a pattern which meets a specific condition, an area including the pattern which meets the specific condition, and an imaginary line between patterns meeting the specific condition, from at least one of a pattern different from the pattern which meets the specific condition, an area other than the area including the pattern which meets the specific condition, and an imaginary line between patterns other than the patterns meeting the specific condition, on the basis of at least one of the inter-centroid distance, the angle information, and the area information which have been obtained, or calculates information regarding at least one of the number of patterns meeting the specific condition, a size of the area including the patterns which meet the specific condition, and the number of imaginary lines between the patterns meeting specific condition. 2. The pattern measurement device according to claim 1 , wherein the pattern is formed by self-assembly of molecules. 3. The pattern measurement device according to claim 1 , wherein the calculation device obtains the centroid on the basis of an edge or contour line information of the pattern. 4. The pattern measurement device according to claim 1 , wherein the calculation device obtains at least one of a relative angle between the imaginary lines and a reference line functioning as a reference, and a relative angle between the imaginary lines, as the angle information. 5. The pattern measurement device according to claim 1 , wherein the calculation device obtains an area difference between a reference figure and the closed shape formed by the imaginary lines. 6. The pattern measurement device according to claim 1 , further comprising: a display device that distinguishes and displays at least one of the pattern meeting the specific condition, the area including the pattern which meet the specific condition, and the imaginary line between the patterns meeting the specific condition, from at least one of the pattern other than the pattern meeting the specific condition, the area different from the area including the pattern which meet the specific condition, and the imaginary line between the patterns other than the patterns meeting the specific condition. 7. The pattern measurement device according to claim 1 , further comprising: a display device that displays at least one of the inter-centroid distance of the plurality of patterns, the angle information of imaginary lines which link the plurality of centroids, and the area information of the closed shape formed by the imaginary lines. 8. The pattern measurement device according to claim 1 , further comprising: a display device that displays distribution of at least one of the inter-centroid distance of the plurality of patterns, the angle information of imaginary lines which link the plurality of centroids, and the area information of the closed shape formed by the imaginary lines, in accordance with a value of the at least one. 9. The pattern measurement device according to claim 1 , further comprising: a display device that distinguishes and displays at least one of the pattern meeting the specific condition, the area including the pattern meeting the specific condition, and the imaginary line between the patterns meeting specific condition, from at least one of the pattern different from the pattern meeting the specific condition, the area other than the area including the pattern meeting the specific condition, and the imaginary line between the patterns other than the patterns meeting the specific condition. 10. The pattern measurement device according to claim 1 , wherein the calculation device performs grouping of at least one of the patterns meeting specific condition, and the imaginary lines between the patterns meeting specific condition. 11. A non-transitory computer-readable medium storing a program causing a computer to measure dimensions between patterns formed in a sample, by using data which is obtained by irradiating the sample with a beam, wherein the program causes the computer to: obtain centroids of a plurality of patterns contained in the data; obtain at least one of an inter-centroid distance of the plurality of patterns, angle information of imaginary lines which link the plurality of centroids to each other, and area information of a closed shape formed by the imaginary lines; and distinguish at least one of a pattern which meets a specific condition, an area including the pattern which meets the specific condition, and an imaginary line between patterns meeting the specific condition, from at least one of a pattern different from the pattern which meets the specific condition, an area other than the area including the pattern which meets the specific condition, and an imaginary line between patterns other than the patterns meeting the specific condition, on the basis of at least one of the inter-centroid distance, the angle information, and the area information which have been obtained, or calculate information regarding at least one of the number of patterns meeting the specific condition, a size of the area including the pattern which meet the specific condition, and the number of imaginary lines between the patterns meeting the specific condition.

Assignees

Inventors

Classifications

  • Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

  • Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth · CPC title

  • Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement · CPC title

  • using incident electron beams, e.g. scanning electron microscopy [SEM] · CPC title

  • G01B15/00Primary

    Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons (characterised by the use of optical techniques G01B9/00, G01B11/00) · CPC title

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What does patent US9804107B2 cover?
The purpose of the present invention is to provide a pattern measurement device for quantitatively evaluating a pattern formed using a directed self-assembly (DSA) method with high accuracy. The present invention is a pattern measurement device for measuring distances between patterns formed in a sample, wherein the centroids of a plurality of patterns included in an image are determined; the i…
Who is the assignee on this patent?
Hitachi High Tech Corp
What technology area does this patent fall under?
Primary CPC classification G01N23/2206. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 31 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).