Source vessel for euv

Patent metadata

Field	Value
Publication number	US-2024215140-A1
Application number	US-202318520472-A
Country	US
Kind code	A1
Filing date	Nov 27, 2023
Priority date	Dec 27, 2022
Publication date	Jun 27, 2024
Grant date	—

Abstract

A source vessel for extreme ultraviolet (EUV) includes a body that includes an outlet for discharging tin debris disposed in a central portion and an intermediate focus (IF) disposed in an upper end portion, and a reflector disposed in a lower end of the body and that includes a through-hole through which laser light passes. The body includes an IF cap portion disposed on a lower portion of the intermediate focus and that includes a heater disposed on an outer surface thereof, and an IF scanner portion disposed on an upper portion of the intermediate focus and that includes a cooling pipe disposed on an external surface thereof. An inner surface of the IF cap portion includes a flow groove through which tin residue flows, and the source vessel further includes a collection container connected to the flow groove.

First claim

What is claimed is:

1 . A source vessel for extreme ultraviolet (EUV), comprising:
a body that includes an outlet for discharging tin debris disposed in a central portion and an intermediate focus (IF) disposed in an upper end portion; a reflector disposed in a lower end of the body and that includes a through-hole through which laser light passes, wherein the body includes an IF cap portion disposed on a lower portion of the intermediate focus that includes a heater disposed on an outer surface thereof, and an IF scanner portion disposed on an upper portion of the intermediate focus that includes a cooling pipe disposed on an external surface thereof, an inner surface of the IF cap portion includes a flow groove through which tin residue flows; and a collection container connected to the flow groove.

2 . The source vessel for EUV of claim 1 , wherein the flow groove has a spiral shape.

3 . The source vessel for EUV of claim 1 , wherein the flow groove includes a plurality of flow grooves spaced apart from each other in a circumferential direction.

4 . The source vessel for EUV of claim 3 , wherein the flow grooves are disposed in a straight line from a top to a bottom of the IF cap portion.

5 . The source vessel for EUV of claim 3 , wherein the flow grooves are disposed in an oblique direction from a top to a bottom of the IF cap portion.

6 . The source vessel for EUV of claim 1 , wherein the outlet is connected to a scrubber in which tin residues are introduced and treated.

7 . The source vessel for EUV of claim 1 , wherein an internal temperature of the IF cap portion is 232° C. or more.

8 . The source vessel for EUV of claim 1 , wherein an internal temperature of the IF scanner portion is 22° C. or less.

9 . The source vessel for EUV of claim 1 , wherein the heater includes a plurality of heaters spaced apart from each other from a lower end toward an upper end of the IF cap portion.

10 . The source vessel for EUV of claim 1 , wherein the cooling pipe has a spiral shape that circles around an inner surface of the IF scanner portion.

11 . A source vessel for EUV, comprising:
a body that includes an intermediate focus at an upper end; and a reflector disposed in a lower end portion of the body and that includes a through-hole through which laser light passes, wherein the body includes a funnel shaped IF cap portion disposed on a lower portion of the intermediate focus that has a width that decreases toward an upper side, and a funnel shaped IF scanner portion that extends from the IF cap portion that has a width that increases toward the upper side, the IF cap portion includes a heater disposed on an outer surface and a flow groove disposed in an inner surface through which tin residue flows, and the IF scanner portion includes a cooling pipe disposed on an outer surface.

12 . The source vessel for EUV of claim 11 , further comprising a collection container connected to the flow groove and that collects tin residues, wherein the collection container is disposed outside of the body.

13 . The source vessel for EUV of claim 11 , wherein an internal temperature of the IF cap portion is 232° C. or more.

14 . The source vessel for EUV of claim 11 , wherein an internal temperature of the IF scanner portion is 22° C. or less.

15 . The source vessel for EUV of claim 11 , wherein the cooling pipe has a spiral shape that circles around an inner surface of the IF scanner portion.

16 . The source vessel for EUV of claim 11 , wherein the flow groove has a spiral shape.

17 . The source vessel for EUV of claim 11 , wherein the flow groove includes a plurality of flow grooves spaced apart from each other in a circumferential direction.

18 . The source vessel for EUV of claim 17 , wherein the flow grooves are disposed in a straight line from a top to a bottom of the IF cap portion.

19 . The source vessel for EUV of claim 17 , wherein the flow grooves are disposed in an oblique direction from a top to a bottom of the IF cap portion.

20 . The source vessel for EUV of claim 11 , wherein the heater includes a plurality of heaters spaced apart from each other from a lower end toward an upper end of the IF cap portion.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Yoon Daegeun
• KIM SungHyup
• Hong Seungpyo
• Lee Injae

Classifications

• H05G2/0094 Primary

  Reduction, prevention or protection from contamination; Cleaning · CPC title

• H05G2/0082

  the energy-carrying beam being a laser beam · CPC title

• G03F7/70033 Primary

  by plasma extreme ultraviolet [EUV] sources · CPC title

• G03F7/2004 Primary

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title

• G03F7/70916

  Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps · CPC title