Low warpage curing methodology by inducing curvature

US2023061379A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2023061379-A1
Application numberUS-202117410958-A
CountryUS
Kind codeA1
Filing dateAug 24, 2021
Priority dateAug 24, 2021
Publication dateMar 2, 2023
Grant date

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  1. Title

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  5. First independent claim

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Abstract

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Embodiments of methods and apparatus for reducing warpage of a substrate are provided herein. In some embodiments, a method for reducing warpage of a substrate includes: applying an epoxy mold over a plurality of dies on the substrate in a dispenser tool; placing the substrate on a pedestal in a curing chamber, wherein the substrate has an expected post-cure deflection in a first direction; inducing a curvature on the substrate in a direction opposite the first direction; and curing the substrate by heating the substrate in the curing chamber.

First claim

Opening claim text (preview).

1 . A method for reducing warpage of a substrate, comprising: applying an epoxy mold over a plurality of dies on the substrate in a dispenser tool; placing the substrate on a pedestal in a curing chamber, wherein the substrate has an expected post-cure deflection in a first direction; inducing a curvature on the substrate in a direction opposite the first direction; and curing the substrate by heating the substrate in the curing chamber. 2 . The method of claim 1 , wherein curing the substrate comprises: precuring the substrate in a precure chamber by placing the pedestal and the substrate on a heater plate; subsequently moving the pedestal and the substrate to a furnace; and heating the substrate in the furnace. 3 . The method of claim 2 , wherein at least one of: during curing, the furnace is heated to a temperature of about 165 to about 190 degrees Celsius; or during precuring, the substrate is heated to about 105 to about 125 degrees Celsius. 4 . The method of claim 1 , wherein inducing the curvature on the substrate comprises elevating a central region of the substrate about 1 to about 3 mm with respect to an outer edge of the substrate. 5 . The method of claim 1 , further comprising measuring a temperature of the substrate during curing. 6 . The method of claim 1 , wherein inducing the curvature comprises: placing the substrate on the pedestal having a central region raised with respect to a peripheral region of the pedestal; and applying a force against the substrate to conform the substrate to the pedestal. 7 . The method of claim 6 , wherein applying the force comprises placing a ring that is weighted on the peripheral region of the substrate to curve the substrate. 8 . The method of claim 1 , wherein the curing chamber is a microwave chamber and curing the substrate comprises: placing the substrate on the pedestal in the microwave chamber; and directing microwave energy at the substrate to heat the substrate. 9 . The method of claim 8 , wherein the substrate is heated to about 145 to about 165 degrees Celsius in the microwave chamber to cure the substrate. 10 . The method of claim 1 , wherein heating the substrate in the curing chamber is performed for a duration of about 1 to about 2 hours. 11 . A method for reducing warpage of a substrate, comprising: applying an epoxy mold over a plurality of dies on the substrate in a dispenser tool; placing the substrate on a pedestal in a curing chamber, wherein the substrate has an expected post-cure deflection in a first direction; inducing a curvature on the substrate so that a central region of the substrate is elevated about 1 to about 3 mm with respect to an outer edge of the substrate; and curing the substrate by heating the substrate in the curing chamber. 12 . The method of claim 11 , wherein the curing chamber is a microwave chamber, and the pedestal is made of quartz. 13 . The method of claim 11 , wherein inducing the curvature on the substrate comprises: at least one of: placing the substrate on the pedestal that is curved, or placing a center plate on the pedestal, and placing the substrate on the center plate; and placing a ring along the outer edge of the substrate to curve the outer edge towards the pedestal. 14 . The method of claim 13 , further comprising placing one or more weights on the ring to provide additional force on the outer edge of the substrate. 15 . A curing chamber for reducing warpage of a substrate with an epoxy layer, comprising: a chamber body having an interior volume; a pedestal that is transferable and that supports the substrate disposed in the interior volume, wherein the pedestal is configured to induce a curvature on the substrate; a ring disposed along an outer periphery of the substrate and configured to curve an outer edge of the substrate towards the pedestal; and a heat source configured to heat the substrate to a temperature of about 100 to about 200 degrees Celsius. 16 . The curing chamber of claim 15 , further comprising a vacuum source coupled to the pedestal and configured to vacuum chuck the substrate to the pedestal. 17 . The curing chamber of claim 15 , wherein the heat source comprises a microwave source, wherein the pedestal is made of quartz, and wherein the ring is made of quartz. 18 . The curing chamber of claim 17 , further comprising a glass plate disposed between the substrate and the pedestal at a central region of the substrate to elevate the central region with respect to the outer edge of the substrate. 19 . The curing chamber of claim 15 , wherein the curing chamber is a furnace and the heat source is configured to direct hot gas to the interior volume. 20 . The curing chamber of claim 15 , further comprising one or more weights disposed on the ring to provide additional force on the outer edge of the substrate.

Assignees

Inventors

Classifications

  • Package configurations · CPC title

  • using vacuum or suction, e.g. Bernoulli chucks · CPC title

  • mainly by radiation · CPC title

  • mainly by convection · CPC title

  • using a polymer adhesive, e.g. an adhesive based on silicone or epoxy · CPC title

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What does patent US2023061379A1 cover?
Embodiments of methods and apparatus for reducing warpage of a substrate are provided herein. In some embodiments, a method for reducing warpage of a substrate includes: applying an epoxy mold over a plurality of dies on the substrate in a dispenser tool; placing the substrate on a pedestal in a curing chamber, wherein the substrate has an expected post-cure deflection in a first direction; ind…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10W74/01. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Mar 02 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).