Electroplating device and method for manufacturing plated product

US2022411951A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022411951-A1
Application numberUS-201917780006-A
CountryUS
Kind codeA1
Filing dateDec 24, 2019
Priority dateDec 24, 2019
Publication dateDec 29, 2022
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Electroplating apparatus includes an electroplating tank that stores an electrolyte solution in which at least objects to be electroplated and magnetic media sink, and at least one magnetic rotator rotatably arranged under the electroplating tank so as to generate an alternating magnetic field. The magnetic rotator is arranged to section an internal space of the electroplating tank into a first space occupying a space above the magnetic rotator and a second space occupying a remaining space other than the first space. The magnetic rotator is arranged to be movable in a lateral direction intersecting a rotational axis of the magnetic rotator, allowing the objects to be shifted between a condition of being present in the electrolyte solution and in the first space and a condition of being present in the electrolyte solution and in the second space.

First claim

Opening claim text (preview).

1 . An electroplating apparatus comprising: an electroplating tank that stores an electrolyte solution in which at least to-be-electroplated objects and magnetic media sink; and at least one magnetic rotator rotatably arranged under the electroplating tank so as to generate an alternating magnetic field, wherein said at least one magnetic rotator is arranged to section an internal space of the electroplating tank into a first space occupying a space above the magnetic rotator and a second space occupying a remaining space other than the first space, said at least one magnetic rotator is arranged to be movable in a lateral direction intersecting a rotational axis of the magnetic rotator, allowing the objects to be shifted between a condition of being present in the electrolyte solution and in the first space and a condition of being present in the electrolyte solution and in the second space. 2 . The electroplating apparatus of claim 1 , wherein the magnetic rotator is moved along the lateral direction to a position where an outer periphery of the magnetic rotator protrudes from the electroplating tank in the lateral direction. 3 . The electroplating apparatus of claim 2 , wherein the electroplating tank has a bottom first region corresponding to the first space and a bottom second region corresponding to the second space, an area of the bottom second region greater than an area of the bottom first region. 4 . The electroplating apparatus of claim 3 , wherein the electroplating tank is shaped to be elongated so as to have first and second ends, and the magnetic rotator is moved to reciprocate between a first end position directly under the first end and a second end position directly under the second end. 5 . The electroplating apparatus of claim 4 , further comprising: a rotational force generator that supplies rotational force to the magnetic rotator; and a transferring assembly configured to transfer the rotational force generator in the lateral direction. 6 . A method of producing electroplated objects, the method comprising: electroplating to-be-electroplated objects in an electroplating tank that stores an electrolyte solution in which at least the objects and magnetic media have sunken; rotating a magnetic rotator under the electroplating tank so as to move the magnetic media in the electrolyte solution in accordance with magnetic attraction and magnetic repulsion, an internal space of the electroplating tank being sectioned into a first space occupying a space above the magnetic rotator and a second space occupying a remaining space other than the first space; and transferring the magnetic rotator in a lateral direction intersecting a rotational axis of the magnetic rotator such that the objects are shifted between a condition of being present in the electrolyte solution and in the first space and a condition of being present in the electrolyte solution and in the second space. 7 . The electroplating apparatus of claim 1 , wherein the electroplating tank has a bottom first region corresponding to the first space and a bottom second region corresponding to the second space, an area of the bottom second region greater than an area of the bottom first region. 8 . The electroplating apparatus of claim 1 , wherein the electroplating tank is shaped to be elongated so as to have first and second ends, and the magnetic rotator is moved to reciprocate between a first end position directly under the first end and a second end position directly under the second end. 9 . The electroplating apparatus of claim 1 , further comprising: a rotational force generator that supplies rotational force to the magnetic rotator; and a transferring assembly configured to transfer the rotational force generator in the lateral direction.

Assignees

Inventors

Classifications

  • Agitating of electrolytes; Moving of racks · CPC title

  • Electroplating combined with mechanical treatment during the deposition · CPC title

  • C25D17/02Primary

    Tanks; Installations therefor · CPC title

  • using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure · CPC title

  • C25D5/007Primary

    Electroplating using magnetic fields, e.g. magnets · CPC title

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What does patent US2022411951A1 cover?
Electroplating apparatus includes an electroplating tank that stores an electrolyte solution in which at least objects to be electroplated and magnetic media sink, and at least one magnetic rotator rotatably arranged under the electroplating tank so as to generate an alternating magnetic field. The magnetic rotator is arranged to section an internal space of the electroplating tank into a first…
Who is the assignee on this patent?
Ykk Corp
What technology area does this patent fall under?
Primary CPC classification C25D17/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Dec 29 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).