Surface Treated Metal Material For Burn-In Test Socket, Connector For Burn-In Test Socket And Burn-In Test Socket Using The Same
US-2019234994-A1 · Aug 1, 2019 · US
US2021172082A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2021172082-A1 |
| Application number | US-201916708783-A |
| Country | US |
| Kind code | A1 |
| Filing date | Dec 10, 2019 |
| Priority date | Dec 10, 2019 |
| Publication date | Jun 10, 2021 |
| Grant date | — |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Aqueous acid binary silver-bismuth alloy electroplating compositions and methods enable electroplating silver rich binary silver-bismuth deposits. The aqueous acid binary silver-bismuth alloy electroplating compositions include 5-membered heterocyclic nitrogen compounds with a thiol functionality which enable deposition of the silver rich binary silver-bismuth alloys. The silver rich silver-bismuth deposits are matte to semi-bright, uniform and have a low coefficient of friction.
Opening claim text (preview).
What is claimed is: 1 . A binary silver-bismuth alloy electroplating composition comprising a source of silver ions, a source of bismuth ions, and a 5-membered aromatic heterocyclic nitrogen compound having a general formula: wherein Q 1 -Q 4 can be a substituted or unsubstituted nitrogen or a substituted or unsubstituted carbon with the proviso that at least two of Q 1 -Q 4 are nitrogen, wherein substituent groups include, but are not limited to, (C 1 -C 4 )alkyl, amino group, aminoalkyl group, carboxyl, carboxy(C 1 -C 4 )alkyl or alkylsulfonate, and a pH of less than 7. 2 . The binary silver-bismuth alloy electroplating composition of claim 1 , wherein the 5-membered aromatic heterocyclic nitrogen compound is selected from the group consisting of 3-mercapto-1,2,4-triazole, 3-amino-1,2,4-triazole-5-thiol, 3-amino-5-mercapto-1,2,4-triazole, 3-mercapto-4-methyl-4H-1,2,4-triazole, 1H-imidazole-2-thiol, salts of the 5-membered aromatic heterocyclic nitrogen compounds, and mixtures thereof. 3 . The binary silver-bismuth alloy electroplating composition of claim 1 , further, comprising a thioether or mixtures thereof. 4 . The binary silver-bismuth alloy electroplating composition of claim 3 , wherein the thioether is a hydroxy bis-sulfide compound. 5 . The binary silver-bismuth alloy electroplating composition of claim 1 , further comprising an aliphatic thiol terminal compound or mixtures thereof. 6 . The binary silver-bismuth alloy electroplating composition of claim 5 , wherein the aliphatic thiol terminal compound is selected from the group consisting of thioglycolic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, cysteine, mercaptosuccinic acid, 3-mercapto-1-propanesulfonic acid, 2-mercaptoethanesulfonic acid, salts of the thiol terminal compounds, and mixtures thereof. 7 . A method of electroplating a binary silver-bismuth alloy on a substrate comprising: a) providing the substrate; b) contacting the substrate with a binary silver-bismuth alloy electroplating composition comprising a source of silver ions, a source of bismuth ions, and a 5-membered aromatic heterocyclic nitrogen compounds having general formula: wherein Q 1 -Q 4 can be a substituted or unsubstituted nitrogen or a substituted or unsubstituted carbon with the proviso that at least two of Q 1 -Q 4 are nitrogen, wherein substituent groups include, but are not limited to, (C 1 -C 4 )alkyl, amino group, aminoalkyl group, carboxyl, carboxy(C 1 -C 4 )alkyl or alkysulfonate, and a pH of less than 7; and c) applying an electric current to the binary silver-bismuth alloy electroplating composition and substrate to electroplate a binary silver-bismuth deposit on the substrate. 8 . The method of claim 7 , wherein the 5-membered aromatic heterocyclic nitrogen compound is selected from the group consisting of 3-mercapto-1,2,4-triazole, 3-amino-1,2,4-triazole-5-thiol, 3-amino-5-mercapto-1,2,4-triazole, 3-mercapto-4-methyl-4H-1,2,4-triazole, 1H-imidazole-2-thiol, salts of the 5-membered aromatic heterocyclic nitrogen compounds, and mixtures thereof. 9 . The method of claim 7 , wherein the binary silver-bismuth alloy electroplating composition further comprises a thioether or mixtures thereof. 10 . The method of claim 7 , wherein the binary silver-bismuth electroplating composition further comprises an aliphatic thiol terminal compound or mixtures thereof. 11 . An article comprising a binary silver-bismuth alloy layer adjacent a surface of a substrate, wherein the binary silver-bismuth alloy layer comprises 90% to 99.8% silver and 0.2% to 10% bismuth, and has a coefficient of friction of 1 or less.
Related publications grouped by family.
Answers are generated from the same data shown on this page.