Electrodeposition system and method incorporating an anode having a back side capacitive element

US10156019B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10156019-B2
Application numberUS-201715802619-A
CountryUS
Kind codeB2
Filing dateNov 3, 2017
Priority dateJun 26, 2014
Publication dateDec 18, 2018
Grant dateDec 18, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed are an electrodeposition system and method with an anode assembly comprising a capacitor comprising a first conductive plate (i.e., an anode) with a frontside having a surface exposed to a plating solution, a second conductive plate on a backside of the first conductive plate, and a dielectric layer between the two conductive plates. During a non-plating mode, a power source, having positive and negative terminals connected to the first and second conductive plates, respectively, is turned on, thereby polarizing the first conductive plate (i.e., the anode) relative to the second conductive plate to prevent degradation of the anode and/or plating solution. During an active plating mode, another power source, having positive and negative terminals connected to the first conductive plate (i.e., the anode) and a cathode, respectively, is turned on, thereby polarizing the anode relative to the cathode in order to deposit a plated layer on a workpiece.

First claim

Opening claim text (preview).

What is claimed is: 1. An electrodeposition system comprising: a container containing a methyl sulfonic acid (MSA) plating solution; a first holder submerged in said MSA plating solution, said first holder holding a capacitor comprising: a first conductive plate; a second conductive plate parallel to said first conductive plate; and a dielectric layer between said first conductive plate and said second conductive plate; wherein said first holder includes a seal allowing only said first conductive plate to be exposed to said MSA plating solution; and, a first power source connected to said first conductive plate and said second conductive plate so as to form a first electric circuit, said first power source supplying a first operating current to said capacitor during a non-plating mode when a surface of said first conductive plate is exposed to said MSA plating solution in said container. 2. The electrodeposition system of claim 1 , said first holder comprising: an opening exposing said surface of said first conductive plate to said MSA plating solution; and, said seal is around said opening so as to prevent exposure of said dielectric layer and said second conductive plate to said MSA plating solution. 3. The electrodeposition system of claim 1 , wherein said first conductive plate comprises an anode, said electrodeposition system further comprising: a second holder submerged in said MSA plating solution, said second holder holding a cathode; and a second power source connected to said anode and said cathode so as to form a second electric circuit, said second power source supplying a second operating current to said second electric circuit during an active plating mode so as to form a plated layer on a workpiece exposed to said MSA plating solution as said cathode. 4. The electrodeposition system of claim 3 , said first operating current being less than said second operating current. 5. The electrodeposition system of claim 3 , further comprising a controller operably connected to said first power source and said second power source, said controller selectively causing said first power source to turn on and said second power source to turn off in order to operate said electrodeposition system in said non-plating mode, and said controller further selectively causing said second power source to turn on and said first power source to turn off in order to operate said electrodeposition system in said active plating mode. 6. The electrodeposition system of claim 3 , said first conductive plate comprising a platinum catalyst-coated titanium plate, said MSA plating solution further comprising tin ions and silver ions dissolved in water, said MSA plating solution corroding platinum and exposing titanium of said platinum catalyst-coated titanium plate, said first operating current preventing said titanium from said platinum catalyst-coated titanium plate from dissolving in said MSA plating solution and further preventing tin from said MSA plating solution from depositing on said surface, and said second operating current causing a tin-silver plated layer to form on said workpiece. 7. The electrodeposition system of claim 1 , said first conductive plate comprising any one of a soluble metal plate and an insoluble metal plate. 8. An electrodeposition system comprising: a container containing a plating solution; a first holder submerged in said plating solution, said first holder holding a capacitor comprising: a first conductive plate comprising a tin plate; a second conductive plate; and a dielectric layer between said first conductive plate and said second conductive plate; wherein said first holder includes a seal allowing only said first conductive plate to be exposed to said plating solution; and, a first power source connected to said first conductive plate and said second conductive plate so as to form a first electric circuit, said first power source supplying a first operating current to said capacitor during a non-plating mode when a surface of said first conductive plate is exposed to said plating solution in said container, said plating solution comprising water and, dissolved in said water, methyl sulfonic acid (MSA), tin ions and silver ions and said first operating current preventing deposition of silver on said surface. 9. The electrodeposition system of claim 8 , said first holder comprising: an opening exposing said surface of said first conductive plate to said plating solution; and, said seal is around said opening so as to prevent exposure of said dielectric layer and said second conductive plate to said plating solution. 10. The electrodeposition system of claim 8 , wherein said first conductive plate comprises an anode, said electrodeposition system further comprising: a second holder submerged in said plating solution, said second holder holding a cathode; and, a second power source connected to said anode and said cathode so as to form a second electric circuit, said second power source supplying a second operating current to said second electric circuit during an active plating mode so as to form a tin-silver plated layer on a workpiece exposed to said plating solution as said cathode. 11. The electrodeposition system of claim 10 , said first operating current being less than said second operating current. 12. The electrodeposition system of claim 10 , further comprising a controller operably connected to said first power source and said second power source, said controller selectively causing said first power source to turn on and said second power source to turn off in order to operate said electrodeposition system in said non-plating mode, and said controller further selectively causing said second power source to turn on and said first power source to turn off in order to operate said electrodeposition system in said active plating mode. 13. The electrodeposition system of claim 8 , said first operating current causing tin from said tin plate to dissolve in said plating solution. 14. A system comprising: a container comprising a methyl sulfonic acid (MSA) plating solution; a first assembly submerged in said MSA plating solution, said first assembly comprising: a capacitor, comprising: a first conductive plate; a second conductive plate; and a dielectric layer between said first conductive plate and said second conductive plate, and, a first holder holding said capacitor in said MSA plating solution, said first holder having an opening exposing a surface of said first conductive plate to said MSA plating solution and a seal around said opening preventing exposure of said dielectric layer and said second conductive plate to said MSA plating solution; and a first power source connected to said first conductive plate and said second conductive plate of said first assembly so as to form a first electric circuit, said first power source supplying a first operating current to said first electric circuit during a non-plating mode when said surface is exposed to said MSA plating solution. 15. The system of claim 14 , wherein said first conductive plate comprises an anode, said system further comprising: a second holder submerged in said MSA plating solution, said second holder holding a second assembly comprising a cathode; and a second power source connected to said first assembly and said second assembly so as to form a second electric circuit wherein said second power source is connected to said first conductive plate of said first assembly; and, said second power source is connected to said cathode of said second assembly, said

Assignees

Inventors

Classifications

  • Electrodes {, e.g. composition, counter electrode} · CPC title

  • of tin · CPC title

  • Process control or regulation (controlling or regulating in general G05) · CPC title

  • containing more than 50% by weight of tin · CPC title

  • C25D3/56Primary

    of alloys · CPC title

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What does patent US10156019B2 cover?
Disclosed are an electrodeposition system and method with an anode assembly comprising a capacitor comprising a first conductive plate (i.e., an anode) with a frontside having a surface exposed to a plating solution, a second conductive plate on a backside of the first conductive plate, and a dielectric layer between the two conductive plates. During a non-plating mode, a power source, having p…
Who is the assignee on this patent?
IBM, Ancosys Gmbh
What technology area does this patent fall under?
Primary CPC classification C25D3/56. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 18 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).