Purged viewport for quartz dome in epitaxy reactor

Patent metadata

Field	Value
Publication number	US-2020105554-A1
Application number	US-201916581029-A
Country	US
Kind code	A1
Filing date	Sep 24, 2019
Priority date	Oct 1, 2018
Publication date	Apr 2, 2020
Grant date	—

Abstract

Embodiments described herein generally relate to an in-situ metrology system that can constantly provide an uninterrupted optical access to a substrate disposed within a process chamber. In one embodiment, a metrology system for a substrate processing chamber is provided. The metrology system includes a sensor view pipe coupling to a quartz dome of a substrate processing chamber, a flange extending radially from an outer surface of the sensor view pipe, and a viewport window disposed on the flange, the viewport window having spectral ranges chosen for an optical sensor that is disposed on or adjacent to the viewport window.

First claim

1 . An metrology system, comprising:
a sensor view pipe coupling to a quartz dome of a substrate processing chamber; a flange extending radially from an outer surface of the sensor view pipe; and a viewport window disposed on the flange, the viewport window having spectral ranges chosen for an optical sensor that is disposed on or adjacent to the viewport window.

2 . The metrology system of claim 1 , wherein the sensor view pipe has a first end coupling to an opening formed through the quartz dome.

3 . The metrology system of claim 1 , wherein the flange and the viewport window are secured by a clamp, and the clamp comprises two semicircular rings that can be hinged together.

4 . The metrology system of claim 1 , wherein a longitudinal axis of the flange is at an angle of about 91° to about 100° with respect to a longitudinal axis of the sensor view pipe.

5 . The metrology system of claim 1 , wherein the sensor view pipe has a first inner diameter and a second inner diameter larger than the first inner diameter, and the second inner diameter is disposed further away from the flange than the first inner diameter.

6 . An apparatus, comprising:
a quartz chamber defining a process volume therein; a substrate support disposed within the process volume; and a sensor view pipe extending between the quartz chamber and an optical sensor.

7 . The apparatus of claim 6 , wherein the quartz chamber has one or more openings.

8 . The apparatus of claim 7 , wherein a first end of the sensor view pipe is coupled to the opening and a second end of the sensor view pipe is coupled to a flange.

9 . The apparatus of claim 8 , wherein the flange has a top surface positioned at an angle with respect to an upper surface of the substrate support.

10 . The apparatus of claim 8 , further comprising:
a viewport window disposed on the flange, the viewport window having spectral ranges chosen for the optical sensor that is disposed on or adjacent to the viewport window.

11 . The apparatus of claim 6 , further comprising:
a purge gas tube coupled to the sensor view pipe, wherein the purge gas tube is in fluid communication with an inert gas source.

12 . The apparatus of claim 6 , wherein the sensor view pipe is comprised of an upper section and a lower section, the upper section having a first inner diameter and the lower section having a second inner diameter larger than the first inner diameter.

13 . The apparatus of claim 12 , wherein the upper section and the lower section are two individual components welded together.

14 . A substrate processing chamber, comprising:
an upper dome; a lower dome opposing the upper dome; a sidewall disposed between the upper dome and the lower dome, wherein the upper dome, the lower dome and the sidewall defines a process volume therein; a substrate support disposed in the process volume; a sensor view pipe extending between an optical sensor and the upper dome; a viewport window disposed over the sensor view pipe, the viewport window having spectral ranges chosen for the optical sensor that is disposed on or adjacent to the viewport window; and a radiation source disposed below the lower dome.

15 . The processing chamber of claim 14 , wherein the upper dome has one or more openings, and a first end of the sensor view pipe is coupled to the opening and a second end of the sensor view pipe is coupled to a flange

16 . The processing chamber of claim 15 , wherein a longitudinal axis of the flange is at an angle of about 91° to about 100° with respect to a longitudinal axis of the sensor view pipe.

17 . The processing chamber of claim 15 , wherein the sensor view pipe is comprised of an upper section and a lower section, the upper section having a first inner diameter and the lower section having a second inner diameter larger than the first inner diameter.

18 . The processing chamber of claim 14 , further comprising:
a purge gas tube coupled to the sensor view pipe, wherein the purge gas tube is in fluid communication with an inert gas source.

19 . The processing chamber of claim 14 , further comprising:
a reflector plate disposed over the upper dome, the reflector plate having a plurality of perforations; and a cover plate disposed over the reflector plate, wherein the sensor view pipe is extended upwardly through the perforation of the reflector plate and over the cover plate.

20 . The processing chamber of claim 14 , wherein the reflector plate is a split design that can be separated into two halves along a split line.

Assignees

• Applied Materials Inc

Inventors

• Hu Ji-Dih
• Burrows Brian H
• Devrajan Janardhan
• Chu Schubert

Classifications

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0602 Primary

  Temperature monitoring · CPC title

• C23C16/4408

  by purging residual gases from the reaction chamber or gas lines · CPC title

• C30B25/08

  Reaction chambers; Selection of materials therefor · CPC title

• H01L21/67248 Primary

  Electricity · mapped topic