X-ray diffraction apparatus

US2019293575A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2019293575-A1
Application numberUS-201916357613-A
CountryUS
Kind codeA1
Filing dateMar 19, 2019
Priority dateMar 20, 2018
Publication dateSep 26, 2019
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An X-ray diffraction apparatus includes: an X-ray source ( 110 ); a first incident path letting the generated X-ray beam pass therethrough; a second incident path letting the generated X-ray beam be reflected by a multilayer film mirror and letting the reflected X-ray beam pass therethrough in parallel with the X-ray beam having passed through the first incident path. A movement mechanism is provided moving the X-ray source ( 110 ) between the first incident path and the second incident path while preserving respective relative positions thereof. An incident slit ( 160 ) allows an X-ray beam to be incident on a sample S pass therethrough; and a sample support stage ( 165 ) supports the sample S at a position fixed relative to the incident slit ( 160 ).

First claim

Opening claim text (preview).

1 . An X-ray diffraction apparatus comprising: an X-ray source configured to generate an X-ray beam; a first incident path configured to let the X-ray beam pass therethrough with a predetermined divergence angle; a second incident path configured to let the X-ray beam be reflected by a multilayer film mirror and let the X-ray beam after reflection to pass therethrough in parallel with the X-ray beam having passed through the first incident path; a movement mechanism configured to move the X-ray source, the first incident path, and the second incident path in a predetermined direction while preserving respective relative positions thereof; an incident slit configured to let the X-ray beam to be incident on a sample pass therethrough; and a sample support stage configured to support the sample at a position fixed relative to the incident slit, wherein the movement mechanism switches the X-ray beam to be passed through the incident slit between the X-ray beam having passed through the first incident path or alternatively the second incident path. 2 . The X-ray diffraction apparatus according to claim 1 further comprising, the first incident path is formed of a first aperture configured to narrow the generated X-ray beam to a predetermined divergence angle, and a first selection slit configured to select the X-ray beam having passed through the first aperture, and the second incident path is formed of a second aperture configured to narrow the X-ray beam toward the multilayer film mirror, the multilayer film mirror and a second selection slit configured to select the X-ray beam having been reflected by the multilayer film mirror. 3 . The X-ray diffraction apparatus according to claim 1 further comprising, the multilayer film mirror is configured to shape the generated X-ray beam into a parallel beam, a focused beam, or a diverging beam. 4 . The X-ray diffraction apparatus according to claim 1 further comprising, a collimator holder configured to hold a collimator that narrows the X-ray beam having passed through the incident slit at a fixed orientation relative to the incident slit. 5 . The X-ray diffraction apparatus according to claim 1 further comprising, the movement mechanism has a motorized axle configured to move the X-ray source, the first incident path, and the second incident path upon receiving an instruction to switch the X-ray beam to be passed through the incident slit.

Assignees

Inventors

Classifications

  • Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor (monochromators for X- rays using crystals G21K1/06) · CPC title

  • detector fixed; source and body moving · CPC title

  • G01N23/207Primary

    Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions · CPC title

  • Goniometers · CPC title

  • Devices having a multilayer structure · CPC title

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What does patent US2019293575A1 cover?
An X-ray diffraction apparatus includes: an X-ray source ( 110 ); a first incident path letting the generated X-ray beam pass therethrough; a second incident path letting the generated X-ray beam be reflected by a multilayer film mirror and letting the reflected X-ray beam pass therethrough in parallel with the X-ray beam having passed through the first incident path. A movement mechanism is pr…
Who is the assignee on this patent?
Rigaku Denki Co Ltd
What technology area does this patent fall under?
Primary CPC classification G01N23/20008. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Sep 26 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).