Metal Grating Structure For X-Ray

Patent metadata

Field	Value
Publication number	US-2016293284-A1
Application number	US-201615184890-A
Country	US
Kind code	A1
Filing date	Jun 16, 2016
Priority date	Jul 27, 2011
Publication date	Oct 6, 2016
Grant date	—

Abstract

A metal grating structure for X-ray includes a first silicon part having a plate form or a layer form, and a grating portion, wherein the grating portion includes a plurality of second silicon parts formed on the first silicon part, and a plurality of metal parts interposed between the respective adjacent second silicon parts, each of the plurality of metal parts having a deposition start tip part extending toward an inside of the first silicon part.

First claim

1 . A metal grating structure for X-ray, comprising:
a first silicon part having a plate form or a layer form; and a grating portion, wherein the grating portion includes a plurality of second silicon parts formed on the first silicon part, and a plurality of metal parts interposed between the respective adjacent second silicon parts, each of the plurality of metal parts having a deposition start tip part extending toward an inside of the first silicon part.

2 . The metal grating structure for X-ray according to claim 1 , wherein the deposition start tip part includes a concave part having side surfaces, one of the side surfaces having a tapered shape.

3 . The metal grating structure for X-ray according to claim 2 , wherein both of the side surfaces of the concave part have a tapered shape, and intersect with each other.

4 . The metal grating structure for X-ray according to claim 1 , wherein a ratio between a first depth of each of the second silicon parts and a second depth of the deposition start tip part is set to be from 99:1 to 80:20.

5 . The metal grating structure for X-ray according to claim 1 , wherein the deposition start tip part includes a concave part having side surfaces, one of the side surfaces having a curved shape.

6 . The metal grating structure for X-ray according to claim 1 , wherein the deposition start tip part includes a concave part which has side surfaces both having an outwardly convex spherical shape.

7 . The metal grating structure for X-ray according to claim 1 , wherein each of the metal parts has an aspect ratio of 5 or more.

8 . The metal grating structure for X-ray according to claim 1 , wherein the metal parts are made of metal selected from anyone of gold, platinum, rhodium, ruthenium, iridium, indium, and nickel.

9 . The metal grating structure for X-ray according to claim 1 , wherein the first silicon part and the second silicon parts are made of n-type silicon.

10 . The metal grating structure for X-ray according to claim 1 , further comprising:
a first insulating layer between e surfaces of the second silicon parts and the metal parts.

11 . The metal grating structure for X-ray according to claim 1 , further comprising:
a second insulating layer formed on an upper surface of each of the second silicon parts.

12 . The metal grating structure for X-ray according to claim 1 , wherein the first silicon part has a mirror-finished side surface being opposite to other side surface coming into contact with the second silicon parts.

Assignees

• Konica Minolta Inc

Inventors

• Yokoyama Mitsuru

Classifications

• C25D5/34

  Pretreatment of metallic surfaces to be electroplated · CPC title

• C25D5/022

  using masking means · CPC title

• C25D7/12

  Semiconductors · CPC title

• G01N23/20075

  by measuring interferences of X-rays, e.g. Borrmann effect · CPC title

• G21K1/06 Primary

  using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence) · CPC title