Coating compositions for use with an overcoated photoresist

Patent metadata

Field	Value
Publication number	US-2018364575-A1
Application number	US-201715624701-A
Country	US
Kind code	A1
Filing date	Jun 15, 2017
Priority date	Jun 15, 2017
Publication date	Dec 20, 2018
Grant date	—

Abstract

In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more substituted uracil moieties; and 2) one or more reacted dicarboxylic acid groups.

First claim

1 . A coated substrate comprising:
(a) a layer of a coating composition on a substrate, the coating composition comprising a resin that comprises one or more substituted uracil moieties and one or more reacted dicarboxylic acid groups; and (b) a photoresist layer over the coating composition layer.

2 . The substrate of claim 1 wherein the resin further comprises one or more isocyanurate moieties.

3 . The substrate of claim 1 , wherein uracil moieties are substituted with halo or nitro groups.

4 . The substrate of claim 1 , wherein the resin is obtainable by polymerizing 1) a first reagent that comprises one or more substituted uracil moieties and 2) a second reagent that comprises one or more aliphatic dicarboxylic acid groups.

5 . The substrate of claim 1 wherein the resin is obtainable by polymerizing 1) a first reagent that comprises one or more substituted uracil moieties, 2) a second reagent that comprises one or more dicarboxylic acid groups and 3) a third reagent that comprises one or more isocyanurate moieties.

6 . The substrate of claim 1 wherein the resin comprises the uracil and reacted dicarboxylic acid components in an amount of 20 to 70 weight percent based on resin total weight.

7 . The substrate of claim 1 wherein the resin comprises polyester linkages.

8 . A method of forming a photoresist relief image, comprising:
(a) applying a coating composition on a substrate, the coating composition comprising a resin that comprises one or more substituted uracil moieties and one or more reacted dicarboxylic acid groups; (b) applying a photoresist composition above the coating composition layer; and (c) exposing and developing the photoresist layer to provide a resist relief image.

9 . An antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising a resin that comprises one or more substituted uracil moieties and one or more reacted dicarboxylic acid groups.

10 . The antireflective composition of claim 9 , wherein the resin further comprises one or more isocyanurate moieties.

11 . The antireflective composition of claim 9 wherein the resin comprises polyester linkages.

12 . The antireflective composition of claim 9 wherein the composition comprises a crosslinker component.

13 . The coated substrate of claim 1 wherein the one or more diacid groups do not have aromatic substitution.

14 . The coated substrate of claim 1 wherein the resin has an Ohnishi parameter value of at least 7.

15 . The coated substrate of claim 1 wherein the resin has an Ohnishi parameter value of 8 to 12.

16 . The coated substrate of claim 1 wherein one or more dicarboxylic acid groups correspond to a formula (III)

wherein in Formula (III):
n1 and n2 may independently be an integer from 0 to 100;
Q 1 may be independent a bond, —O—, —S—, —NHR— or —CRR′—;
A 1 , A 2 , A 3 and A 4 may be independently hydrogen, aliphatic groups (e.g. C 1 -C 12 alkyl), or substituted or unsubstituted C 1 -C 12 heteroalkyl (e.g. C 1 -C 12 alkyl alcohol); and
R and R′ are independently hydrogen, C 1 -C 4 alkyl, or C 1 -C 4 alkyl alcohol.

17 . The coated substrate of claim 16 wherein n1 and n2 are independently 0 to 5.

18 . The coated substrate of claim 1 wherein the one or more dicarboxylic acid groups are selected from:

19 . The antireflective composition of claim 9 wherein one or more dicarboxylic acid groups correspond to a formula (III)

wherein in Formula (III):
n1 and n2 may independently be an integer from 0 to 100;
Q 1 may be independent a bond, —O—, —S—, —NHR— or —CRR′—;
A 1 , A 2 , A 3 and A 4 may be independently hydrogen, aliphatic groups (e.g. C 1 -C 12 alkyl), or substituted or unsubstituted C 1 -C 12 heteroalkyl (e.g. C 1 -C 12 alkyl alcohol); and
R and R′ are independently hydrogen, C 1 -C 4 alkyl, or C 1 -C 4 alkyl alcohol.

20 . The antireflective composition of claim 9 wherein the one or more dicarboxylic acid groups are selected from:

Assignees

• Rohm & Haas Elect Materials Korea Ltd

Inventors

• Lee Hye-Won
• Sim Jae Hwan
• Leem Soo Jung
• Park Jin Hong
• Shin You Rim

Classifications

• G03F7/091 Primary

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• G03F7/162

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title

• G03F7/26

  Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) · CPC title

• C09D5/006

  Anti-reflective coatings · CPC title

• C09D175/04

  Polyurethanes · CPC title