Multi-zone gas distribution plate (gdp) and a method for designing the multi-zone gdp

Patent metadata

Field	Value
Publication number	US-2018286634-A1
Application number	US-201815997914-A
Country	US
Kind code	A1
Filing date	Jun 5, 2018
Priority date	Apr 26, 2016
Publication date	Oct 4, 2018
Grant date	—

Abstract

A multi-zone gas distribution plate (GDP) for high uniformity in plasma-based etching is provided. A housing defines a process chamber and comprises a gas inlet configured to receive a process gas. A GDP is arranged in the process chamber and is configured to distribute the process gas within the process chamber. The GDP comprises a plurality of holes extending through the GDP, and further comprises a plurality of zones into which the holes are grouped. The zones comprise a first zone and a second zone. Holes of the first zone share a first cross-sectional profile and holes of the second zone share a second cross-sectional profile different than the first cross-sectional profile. A method for designing the multi-zone GDP is also provided.

First claim

What is claimed is:

1 . A plasma-based process tool comprising:
a housing defining a process chamber and comprising a gas inlet configured to receive a process gas; and a gas distribution plate (GDP) arranged in the process chamber and configured to distribute the process gas within the process chamber, wherein the GDP defines a plurality of zones of holes, wherein each zone of the plurality of zones is associated with a different cross-sectional hole profile and comprises a plurality of holes extending through the GDP, and wherein each hole in a first zone of the plurality of zones individually has the different cross-sectional hole profile associated with the first zone.

2 . The plasma-based process tool according to claim 1 , wherein the holes increase in width from top to bottom.

3 . The plasma-based process tool according to claim 1 , wherein at least one of the holes comprises a first region and a second region, wherein the first region extends from an upper surface of the GDP to a transition region between the first and second regions, wherein the second region extends from the transition region to a lower surface of the GDP, and wherein a width of the first region is less than a width of the second region.

4 . The plasma-based process tool according to claim 3 , wherein the first region has a height about 10-20 times larger than a height of the second region.

5 . The plasma-based process tool according to claim 1 , wherein each hole in a second zone of the plurality of zones individually has the different cross-sectional hole profile associated with the second zone, and wherein the first and second zones are continuous.

6 . The plasma-based process tool according to claim 1 , wherein the GDP is ring shaped.

7 . The plasma-based process tool according to claim 1 , wherein the plurality of zones further comprises a second zone and a third zone, and wherein the first zone is discontinuous and the second and third zones are continuous.

8 . The plasma-based process tool according to claim 1 , further comprising:
a workpiece support arranged in the process chamber, under the GDP; and a showerhead configured to receive the process gas and to direct the process gas into the process chamber through the holes of the GDP.

9 . The plasma-based process tool according to claim 8 , further comprising:
a spiral inductor spiraling around an upper region of the process chamber and configured to generate plasma using the process gas.

10 . A process tool comprising:
a multi-zone gas distribution plate (GDP) defining a plurality of holes, wherein the holes are grouped into a plurality of zones, wherein the zones are laterally arranged around a periphery of the GDP and each has at least two of the holes, wherein the plurality of zones comprises a first zone and a second zone, wherein holes of the first zone each individually have a first cross-sectional profile, wherein holes of the second zone each individually have a second cross-sectional profile, and wherein the first and second cross-sectional profiles are different.

11 . The process tool according to claim 10 , wherein the first cross-sectional profile discretely increases in width from top to bottom.

12 . The process tool according to claim 10 , wherein the first and second zones are continuous.

13 . The process tool according to claim 10 , wherein the plurality of zones comprises a third zone, wherein holes of the third zone each individually have a third cross-sectional profile, and wherein the first and second cross-sectional profiles are different than the third cross-sectional profile.

14 . The process tool according to claim 13 , wherein the first and second zones are continuous, and wherein the third zone is discontinuous.

15 . The process tool according to claim 10 , wherein the multi-zone GDP is cylindrical.

16 . The process tool according to claim 10 , further comprising:
a housing defining a process chamber and comprising a gas inlet configured to receive a process gas, wherein the multi-zone GDP is in the process chamber; a workpiece support in the process chamber, under the multi-zone GDP; and a showerhead configured to receive the process gas and to direct the process gas into the process chamber through the holes defined by the multi-zone GDP.

17 . A process tool comprising:
a housing defining a process chamber and comprising a gas inlet configured to receive a process gas; and a gas distribution plate (GDP) in the process chamber and defining a plurality of holes, wherein the holes are grouped into a plurality of zones, wherein each of the zones comprises at least two of the holes, and wherein the GDP is configured to pass the process gas from an upper side of the GDP to a lower side of the GDP at a different rate at each of the zones.

18 . The process tool according to claim 17 , wherein the plurality of zones comprises a first zone associated with a first cross-sectional hole profile, and wherein each hole of the first zone individually has the first cross-sectional hole profile.

19 . The process tool according to claim 17 , wherein the plurality of zones comprises a first zone and a second zone, wherein the first zone is continuous, and wherein the second zone is discontinuous.

20 . The process tool according to claim 17 , wherein the holes are in a ring-shaped pattern along a periphery of the GDP.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Meng Chin-Han
• Chen Jr-Sheng
• Chou Yin-Tun
• Chan Chih-Hua
• Huang Lin-Ching
• Chiang Yu-Pei

Classifications

• H10P76/204

  of organic photoresist masks · CPC title

• H10P74/203

  Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects · CPC title

• H10P50/692

  characterised by their composition, e.g. multilayer masks or materials · CPC title

• H10P50/242

  of Group IV materials · CPC title

• H01J37/32009

  Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources (plasma generation in general H05H1/24) · CPC title