Film structure for electric field guided photoresist patterning process
US-11880137-B2 · Jan 23, 2024 · US
Electricity
Electricity · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H10P76/204 |
| Official title | — |
| Display label | Electricity (mapped technology topic) |
| Total patents | 3,541 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 321 |
| 2016 | 391 |
| 2017 | 441 |
| 2018 | 361 |
| 2019 | 462 |
| 2020 | 416 |
| 2021 | 292 |
| 2022 | 215 |
| 2023 | 222 |
| 2024 | 194 |
| 2025 | 193 |
| 2026 | 33 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Sub-second annealing lithography techniques
US-9224602-B2 · Dec 29, 2015 · US
Method for reducing intermixing between films of a patterning process, patterning process, and device manufactured by the patterning process
US-9218969-B2 · Dec 22, 2015 · US
Patterning process, resist composition, polymer, and monomer
US-9213235-B2 · Dec 15, 2015 · US
Fluid processing systems and methods
US-2015321897-A1 · Nov 12, 2015 · US
Exposure apparatus, exposure method, and method for producing device
US-9182684-B2 · Nov 10, 2015 · US
Structure and method for defect passivation to reduce junction leakage for finFET device
US-9184233-B2 · Nov 10, 2015 · US
Amorphous oxide thin film transistor, method for manufacturing the same, and display panel
US-2015318383-A1 · Nov 5, 2015 · US
Methods of forming nanostructures including metal oxides
US-9177795-B2 · Nov 3, 2015 · US
Planar motor and lithographic apparatus comprising such planar motor
US-9172294-B2 · Oct 27, 2015 · US
Substrate processing apparatus and substrate processing method
US-9142433-B2 · Sep 22, 2015 · US
Processing machine system and method of positioning processing machines
US-9132458-B2 · Sep 15, 2015 · US
Method of forming a fine pattern by using block copolymers
US-2015243525-A1 · Aug 27, 2015 · US
Method for Producing Fin Structures of a Semiconductor Device in a Substrate
US-2015243509-A1 · Aug 27, 2015 · US
Method for directed self-assembly (dsa) of a block copolymer (bcp) using a blend of a bcp with functional homopolymers
US-2015243514-A1 · Aug 27, 2015 · US
Solution processing apparatus, solution processing method, and non-transitory computer-readable recording medium
US-9109934-B2 · Aug 18, 2015 · US
Gate structures with various widths and method for forming the same
US-2015228646-A1 · Aug 13, 2015 · US
Methods of fabricating a pattern using the block co-polymer materials
US-2015228475-A1 · Aug 13, 2015 · US
Semiconductor structure and manufacturing method thereof
US-2015228720-A1 · Aug 13, 2015 · US
Method for system for manufacturing tft, tft, and array substrate
US-2015228760-A1 · Aug 13, 2015 · US
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Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H10P76/204?
- CPC H10P76/204 is the Cooperative Patent Classification code for “Electricity.”
- How many patents are filed under CPC H10P76/204 (Electricity)?
- Our database includes 3,541 publications tagged with this CPC code.
- Is patent activity under CPC H10P76/204 growing?
- Publication counts under this code: 194 in 2024 vs 193 in 2025 (latest complete years).