Plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-2017330772-A1
Application number	US-201715590356-A
Country	US
Kind code	A1
Filing date	May 9, 2017
Priority date	May 12, 2016
Publication date	Nov 16, 2017
Grant date	—

Abstract

A capacitively-coupled plasma processing apparatus includes: at least one chamber body providing chambers separated from each other; upper electrodes respectively installed in upper spaces within the chambers; lower electrodes respectively installed in lower spaces within the chambers; a high frequency power supply; a transformer including a primary coil electrically connected to the high frequency power supply, and secondary coils each of which coils having a first end and a second end; first condensers respectively connected between each of the first ends of the secondary coils and the upper electrodes; and second condensers respectively connected between each of the second ends of the secondary coils and the lower electrodes. The primary coil extends around a central axis. The secondary coils are configured to be coaxially disposed with respect to the primary coil. A self-inductance of each of the secondary coils is smaller than that of the primary coil.

First claim

What is claimed is:

1 . A capacitively-coupled plasma processing apparatus, comprising:
at least one chamber body providing a plurality of chambers separated from each other, the at least one chamber body being grounded; a plurality of upper electrodes respectively installed in upper spaces within the plurality of chambers; a plurality of lower electrodes respectively installed in lower spaces within the plurality of chambers; a high frequency power supply; a transformer including a primary coil electrically connected to the high frequency power supply, and a plurality of secondary coils, each of the plurality of secondary coils having a first end and a second end; a plurality of first condensers respectively connected between each of the first ends of the plurality of secondary coils and the plurality of upper electrodes; and a plurality of second condensers respectively connected between each of the second ends of the plurality of secondary coils and the plurality of lower electrodes, wherein the primary coil extends around a central axis, the plurality of secondary coils is configured to be coaxially disposed with respect to the primary coil, and a self-inductance of each of the plurality of secondary coils is smaller than that of the primary coil.

2 . The apparatus of claim 1 , wherein a first end of each of the plurality of second condensers is respectively connected to each of the plurality of lower electrodes, and
a second end of each of the plurality of second condensers is grounded, the plurality of first condensers and the plurality of second condensers are fixed condensers, and only the plurality of second condensers is installed as condensers between each of the second ends of the plurality of secondary coils and the plurality of lower electrodes, respectively.

3 . The apparatus of claim 1 , wherein the plurality of first condensers and the plurality of second condensers are fixed condensers,
a first end of each of the plurality of second condensers is respectively connected to each of the plurality of lower electrodes, and a second end of each of the plurality of second condensers floats from a ground electric potential.

4 . A capacitively-coupled plasma processing apparatus, comprising:
at least one chamber body providing two chambers separated from each other, the at least one chamber body being grounded; two upper electrodes respectively installed in upper spaces within the two chambers; two lower electrodes respectively installed in lower spaces within the two chambers; a high frequency power supply; a transformer including a primary coil electrically connected to the high frequency power supply and a plurality of secondary coils composed of two secondary coils; two first condensers respectively connected between a first end of one of the two secondary coils and one of the two upper electrodes, and between a second end of one of the two secondary coils and the other of the two upper electrodes; and two second condensers respectively connected between a first end of the other of the two secondary coils and one of the two lower electrodes, and between the second end of the other of the two secondary coils and the other of the two lower electrodes, wherein the primary coil extends around a central axis, the plurality of secondary coils is configured to be coaxially disposed with respect to the primary coil, each of the first ends of the two second condensers is respectively connected to one of the two lower electrodes, each of the second ends of the two second condensers floats from a ground electric potential, and a self-inductance of each of the two secondary coils is smaller than that of the primary coil.

5 . The apparatus of claim 4 , wherein the two first condensers and the two second condensers are fixed condensers.

6 . The apparatus of claim 1 , wherein the plurality of secondary coils includes a pair of secondary coils, and
the pair of secondary coils are formed by a single coil grounded in the middle thereof.

7 . The apparatus of claim 1 , wherein the plurality of secondary coils includes a pair of secondary coils,
the pair of secondary coils are formed by a single coil having a plurality of taps selectively connected to a ground.

8 . The apparatus of claim 1 , wherein a winding of each of the plurality of secondary coils is wound in an alternate relationship with a winding of the primary coil.

9 . The apparatus of claim 1 , further comprising: one or more third condensers,
wherein the primary coil extends around the central axis, and includes a plurality of coils arranged along a direction in which the central axis extends, the plurality of coils and the one or more third condensers are alternately connected in a series relationship with each other, and the windings of the plurality of secondary coils are wound in an alternate relationship with each of the windings of the plurality of coils.

10 . The apparatus of claim 1 , further comprising: one or more third condensers,
wherein the primary coil extends around the central axis, and includes a plurality of coils arranged along a direction in which the central axis extends, the plurality of coils and the one or more third condensers are alternately connected in a series relationship with each other, and the plurality of secondary coils are arranged in an alternate relationship with the plurality of coils in the direction in which the central axis extends.

11 . The apparatus of claim 1 , wherein the primary coil is a single coil,
the plurality of secondary coils includes only two secondary coils, and one of the two secondary coils is disposed at a first side with respect to the center of the primary coil in the direction which the central axis extends, and the other of the two secondary coils is disposed at a second side with respect to the center of the primary coil in the direction which the central axis extends.

12 . The apparatus of claim 1 , wherein the primary coil and the plurality of secondary coils are rectangular coils.

13 . The apparatus of claim 12 , wherein each of the plurality of secondary coils is configured to be rotatable around the central axis.

14 . The apparatus of claim 1 , wherein each of the plurality of secondary coils is configured to be movable in a direction perpendicular to a direction parallel to the central axis.

15 . The apparatus of claim 1 , wherein each of the plurality of secondary coils is configured to fluctuate around an axis extending in a direction parallel to the central axis outside a region surrounded by the primary coil.

16 . The apparatus of claim 14 , wherein the plurality of secondary coils is disposed such that they do not overlap each other outside the region surrounded by the primary coil when viewed in the direction parallel to the central axis.

17 . The apparatus of claim 14 , further comprising: one or more magnetic shield plates installed between the plurality of secondary coils outside the region surrounded by the primary coil.

18 . The apparatus of claim 1 , wherein the primary coil and the plurality of secondary coils have substantially the same sectional areas.

Assignees

• Tokyo Electron Ltd

Inventors

• Yamazawa Yohei

Classifications

• H10P50/242

  of Group IV materials · CPC title

• H10P72/0418 Primary

  for etching · CPC title

• H05K9/0007

  Casings (standardised racks H05K9/0062) · CPC title

• H01F30/04

  having two or more secondary windings, each supplying a separate load, e.g. for radio set power supplies · CPC title

• H01F21/04

  by relative movement of turns or parts of windings · CPC title