Cu Column, Cu Core Column, Solder Joint, and Through-Silicon Via

US2017287862A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2017287862-A1
Application numberUS-201415509333-A
CountryUS
Kind codeA1
Filing dateSep 9, 2014
Priority dateSep 9, 2014
Publication dateOct 5, 2017
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a Cu column, a Cu core column, a solder joint, and a through-silicon via, which have the low Vickers hardness and the small arithmetic mean roughness. For the Cu column 1 according to the present invention, its purity is equal to or higher than 99.9% and equal to or lower than 99.995%, its arithmetic mean roughness is equal to or less than 0.3 μm, and its Vickers hardness is equal to or higher than 20 HV and equal to or less than 60 HV. Since the Cu column 1 is not melted at a melting temperature in the soldering and a definite stand-off height (a space between the substrates) can be maintained, it is preferably applied to the three dimensional mounting or the pitch narrowing mounting.

First claim

Opening claim text (preview).

1 . A Cu column containing: purity which is equal to or higher than 99.9% and equal to or lower than 99.995%, arithmetic mean roughness which is equal to or less than 0.3 μm, and Vickers hardness which is equal to or higher than 20 HV and equal to or less than 60 HV. 2 . The Cu column according to claim 1 , wherein an alpha dose is equal to or less than 0.0200 cph/cm 2 . 3 . The Cu column according to claim 1 , wherein said Cu column is composed of a column which has a diameter of the top surface of 1-1000 m, a diameter of the bottom surface of 1-1000 μm, and a height of 1-3000 μm. 4 . The Cu column according to claim 1 , wherein the Cu column is coated with a flux layer. 5 . The Cu column according to claim 1 , wherein the Cu column is coated with an organic film containing an imidazole compound. 6 . A Cu core column, containing: the Cu column according to claim 1 ; and a solder layer which coats the Cu column. 7 . A Cu core column containing: the Cu column according to claim 1 ; and a plating layer which includes at least one element selected from a group of Ni, Fe and Co, the plating layer coating the Cu column. 8 . The Cu core column according to claim 7 , further comprising: a solder layer which coats the plating layer. 9 . The Cu core column according to claim 6 , wherein an alpha dose is equal to or less than 0.0200 cph/cm 2 . 10 . The Cu core column according to claim 6 , wherein the Cu core column is coated with a flux layer. 11 . A solder joint using the Cu column according to claim 1 . 12 . A through-silicon via using the Cu column according to claim 1 . 13 . A solder joint using the Cu core column according to claim 6 . 14 . A through-silicon via using the Cu core column according to claim 6 . 15 . The Cu column according to claim 2 , wherein said Cu column is composed of a column which has a diameter of the top surface of 1-1000 μm, a diameter of the bottom surface of 1-1000 μm, and a height of 1-3000 μm. 16 . The Cu column according to claim 2 , wherein the Cu column is coated with a flux layer. 17 . The Cu column according to claim 3 , wherein the Cu column is coated with a flux layer. 18 . The Cu column according to claim 2 , wherein the Cu column is coated with an organic film containing an imidazole compound. 19 . The Cu column according to claim 3 , wherein the Cu column is coated with an organic film containing an imidazole compound. 20 . A Cu core column, containing: the Cu column according to claim 2 ; and a solder layer which coats the Cu column.

Assignees

Inventors

Classifications

  • characterised by the filling method or the material of the conductive fill · CPC title

  • using auxiliary conductive elements, e.g. pieces of metal foil, metallic spheres · CPC title

  • Alloys based on tin · CPC title

  • all layers being exclusively metallic {(making layered metal workpieces by pressure cladding B23K20/22; making coatings with a metallic material characterised by its composition C23C30/00)} · CPC title

  • Cu as the principal constituent · CPC title

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What does patent US2017287862A1 cover?
Provided are a Cu column, a Cu core column, a solder joint, and a through-silicon via, which have the low Vickers hardness and the small arithmetic mean roughness. For the Cu column 1 according to the present invention, its purity is equal to or higher than 99.9% and equal to or lower than 99.995%, its arithmetic mean roughness is equal to or less than 0.3 μm, and its Vickers hardness is equal …
Who is the assignee on this patent?
Senju Metal Industry Co
What technology area does this patent fall under?
Primary CPC classification H01L24/13. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Oct 05 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).