Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-2017183771-A1
Application number	US-201615289899-A
Country	US
Kind code	A1
Filing date	Oct 10, 2016
Priority date	Dec 28, 2015
Publication date	Jun 29, 2017
Grant date	—

Abstract

The present disclosure relates to a substrate processing apparatus, and more particularly, a substrate processing apparatus that is capable of improving process uniformity on an entire surface of a substrate. The substrate processing apparatus includes a substrate boat in which a substrate is loaded, a reaction tube in which a processing process for the substrate loaded in the substrate boat is performed, a gas supply unit configured to supply a process gas into the reaction tube through an injection nozzle disposed on one side of the reaction tube, a heating unit including a plurality of vertical heating parts, which are disposed along a circumference of the reaction tube outside the reaction tube and configured to divide the circumference to the reaction tube into a plurality of portions so as to independently heat each of the divided portions of the reaction tube, and a control unit configured to control the heating unit.

First claim

What is claimed is:

1 . A substrate processing apparatus comprising:
a substrate boat in which a substrate is loaded; a reaction tube in which a processing process for the substrate loaded in the substrate boat is performed; a gas supply unit configured to supply a process gas into the reaction tube through an injection nozzle disposed on one side of the reaction tube; a heating unit comprising a plurality of vertical heating parts, which are disposed along a circumference of the reaction tube outside the reaction tube and configured to divide the circumference to the reaction tube into a plurality of portions so as to independently heat each of the divided portions of the reaction tube; and a control unit configured to control the heating unit.

2 . The substrate processing apparatus of claim 1 , wherein the plurality of vertical hating parts comprise:
a first vertical heating part disposed at a position corresponding to the injection nozzle; and a second vertical heating part extending along the circumference of the reaction tube from the first vertical heating part and disposed on at least a portion of the circumference of the reaction tube.

3 . The substrate processing apparatus of claim 2 , wherein the first vertical heating part has a horizontal cross-sectional area less than that of the second vertical heating part.

4 . The substrate processing apparatus of claim 2 , wherein the first vertical heating part has a heating temperature corresponding to a range from 90% to 110% of a heating temperature of the second vertical heating part.

5 . The substrate processing apparatus of claim 2 , wherein the control unit comprises:
a first control part connected to the first vertical heating part; and a second control part connected to the second vertical heating part, wherein the first vertical heating part and the second vertical heating part are independently controlled.

6 . The substrate processing apparatus of claim 5 , wherein the first control part comprises a first temperature measuring member configured to measure a temperature of the first vertical heating part, and
the second control part comprises a second temperature measuring member configured to measure a temperature of the second vertical heating part and a third temperature measuring member configured to measure an inner temperature of the reaction tube.

7 . The substrate processing apparatus of claim 6 , wherein the first control part controls the first vertical heating part by using a measured value of the first temperature measuring member, and
the second control part controls the second vertical heating part by using a value calculated by a measured value of the second temperature measuring member and a measured value of the third temperature measuring member.

8 . The substrate processing apparatus of claim 1 , wherein the plurality of vertical heating parts are formed by stacking a plurality of horizontal heating elements that are independently controlled.

9 . The substrate processing apparatus of claim 1 , further comprising a rotation driving unit configured to rotate the substrate boat.

10 . The substrate processing apparatus of claim 2 , further comprising an exhaust unit exhausting residual gases within the reaction tube by being disposed on the other side of the reaction tube, which is symmetrical to the injection nozzle,
wherein the plurality of vertical heating part further comprises a third vertical heating part disposed symmetrical to the first vertical heating part at a position corresponding to the exhaust unit.

Assignees

• Eugene Technology Co Ltd

Inventors

• Yoo Cha Young
• Je Sung Tae
• Choi Kyu Jin
• Ku Ja Dae
• Kim Jun
• Jung Bong Ju
• Park Kyung Seok
• Kim Yong Ki
• Kim Jae Woo

Classifications

• H10P72/0434

  mainly by convection · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0604 Primary

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title

• C30B29/06

  Silicon · CPC title