Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-2017176876-A1
Application number	US-201715452403-A
Country	US
Kind code	A1
Filing date	Mar 7, 2017
Priority date	Jul 24, 2003
Publication date	Jun 22, 2017
Grant date	—

Abstract

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

First claim

1 .- 20 . (canceled)

21 . A lithographic projection apparatus comprising:
a projection system configured to project a beam of radiation from a patterning device onto a substrate; a liquid supply system configured to provide a liquid to a space between the projection system and a surface facing the projection system; and a movable table comprising:
a sensor system component configured to be exposed to electromagnetic radiation, the sensor system component located or locatable below the projection system and the sensor system comprising an essentially opaque surface comprising an aperture through which the electromagnetic radiation passes to a surface located below the aperture and above which the liquid from the liquid supply system is to be provided, and
a liquid impermeable layer spanning at least the aperture through which the electromagnetic radiation passes to the surface below the liquid impermeable layer, the liquid impermeable layer preventing the surface from contact with liquid contacting the liquid impermeable layer.

22 . The lithographic projection apparatus of claim 21 , wherein the opaque surface comprises a layer of metal with the aperture.

23 . The lithographic projection apparatus of claim 22 , wherein at least part of the liquid impermeable layer is within the aperture.

24 . The lithographic projection apparatus of claim 22 , wherein the liquid impermeable layer overlies at least part of the layer of metal.

25 . The lithographic projection apparatus of claim 21 , wherein the liquid impermeable layer is spaced apart from the surface.

26 . The lithographic projection apparatus of claim 21 , wherein the opaque surface is in direct contact with the liquid impermeable layer.

27 . The lithographic projection apparatus of claim 21 , comprising a grating and the liquid impermeable layer overlies at least part of the grating.

28 . The lithographic projection apparatus of claim 21 , wherein the surface comprises a detection surface of a detector.

29 . A device manufacturing method, comprising:
projecting a beam of radiation onto a radiation-sensitive substrate through liquid in a space between a projection system of a lithographic apparatus and the substrate; providing a liquid between the projection system and a sensor system component in or on a movable table located below the projection system, the sensor system component comprising an essentially opaque surface comprising an aperture through which electromagnetic radiation can pass to a surface located below the aperture and above which the liquid from the liquid supply system is provided, and a liquid impermeable layer spanning at least the aperture; and passing electromagnetic radiation through the liquid impermeable layer to the surface below the liquid impermeable layer, the liquid impermeable layer preventing the surface from contact with liquid contacting the liquid impermeable layer.

30 . The method according to claim 29 , comprising passing the electromagnetic radiation to a grating, the liquid impermeable layer overlying at least part of the grating.

31 . The method according to claim 29 , comprising passing the electromagnetic radiation through an aperture of a layer of metal onto the surface.

32 . The method according to claim 31 , wherein the liquid impermeable layer at least partially overlies the layer of metal.

33 . The method according to claim 29 , wherein the surface comprises a detection surface of a detector and comprising detecting the electromagnetic radiation using the detector.

34 . A lithographic projection apparatus comprising:
a projection system configured to project a beam of radiation from a patterning device onto a substrate; a liquid supply system configured to provide a liquid to a space between the projection system and a surface facing the projection system; and a movable table comprising:
a sensor system component configured to be exposed to electromagnetic radiation, the sensor system component located or locatable below the projection system and comprising a grating structure above which the liquid from the liquid supply system is to be provided, and
a liquid impermeable layer through which the electromagnetic radiation passes to the grating structure below the liquid impermeable layer, the liquid impermeable layer at least in part preventing at least part of the grating structure from contact with liquid on the liquid impermeable layer.

35 . The lithographic projection apparatus of claim 34 , wherein the grating structure comprises a layer of metal having an aperture to receive the electromagnetic radiation, wherein at least part of the liquid impermeable layer spans the aperture.

36 . The lithographic projection apparatus of claim 34 , wherein the grating structure comprises a layer of metal having an aperture to receive the electromagnetic radiation, wherein at least part of the liquid impermeable layer overlies at least part of layer of metal.

37 . The lithographic projection apparatus of claim 36 , wherein the layer of metal is in contact with the liquid impermeable layer.

38 . The lithographic projection apparatus of claim 34 , wherein the grating structure comprises an aperture to pass the electromagnetic radiation to a surface, wherein the structure blocks passage of the liquid through the aperture to the surface.

39 . The lithographic projection apparatus of claim 38 , wherein the surface comprises a detection surface of a detector.

40 . The lithographic projection apparatus of claim 39 , wherein the liquid impermeable layer is spaced apart from the surface.

Assignees

• Asml Netherlands Bv

Inventors

• Sengers Timotheus Franciscus
• Donders Sjoerd Nicolaas Lambertus
• Jansen Hans
• Boogaard Arjen

Classifications

• G03F7/7095

  Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient · CPC title

• G03F7/70591

  Testing optical components · CPC title

• G03F7/70866 Primary

  of mask or workpiece · CPC title

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title