Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9594308-B2
Application number	US-201514941320-A
Country	US
Kind code	B2
Filing date	Nov 13, 2015
Priority date	Jul 24, 2003
Publication date	Mar 14, 2017
Grant date	Mar 14, 2017

Abstract

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

First claim

The invention claimed is:

1. A lithographic projection apparatus comprising:
a projection system configured to project a beam of radiation from a patterning device onto a substrate;
a liquid supply system configured to provide a liquid to a space between the projection system and a surface facing the projection system; and
a movable table comprising:
a sensor system component, the sensor system component configured to be exposed to electromagnetic radiation, the sensor system component located or locatable under the projection system and comprising a radiation-receiving surface above which the liquid from the liquid supply system is to be provided, and
a solid transparent structure through which the electromagnetic radiation passes, spaced apart from the radiation-receiving surface, and arranged to at least in part isolate the radiation-receiving surface from liquid contacting the structure.

2. The lithographic projection apparatus according to claim 1 , comprising an absorption element with areas of different absorption characteristics and the structure overlies at least part of the absorption element.

3. The lithographic projection apparatus of claim 1 , further comprising a layer of metal having an aperture to pass the electromagnetic radiation to the radiation-receiving surface, wherein at least part of the structure is within the aperture.

4. The lithographic projection apparatus of claim 1 , further comprising a layer of metal having an aperture to pass the electromagnetic radiation to the radiation-receiving surface, the structure overlying at least part of the layer of metal.

5. The lithographic projection apparatus of claim 4 , wherein the layer of metal is in contact with the structure.

6. The lithographic projection apparatus of claim 1 , further comprising a layer of metal having an aperture to pass the electromagnetic radiation to the radiation-receiving surface, wherein the structure blocks passage of the liquid through the aperture to the radiation-receiving surface.

7. The lithographic projection apparatus of claim 1 , comprising a grating and the structure overlies at least part of the grating.

8. The lithographic projection apparatus of claim 1 , wherein the radiation-receiving surface comprises a detection surface of a detector.

9. A device manufacturing method, comprising:
projecting a beam of radiation onto a radiation-sensitive substrate through liquid in a space between a projection system of a lithographic apparatus and the substrate;
providing a liquid between the projection system and a sensor system component in or on a movable table, the sensor system component comprising a radiation-receiving surface above which the liquid is provided and the movable table comprising a solid transparent structure spaced apart from the radiation-receiving surface; and
passing electromagnetic radiation through the structure to the radiation-receiving surface below the structure, the structure at least in part isolating the detector surface from liquid contacting the structure.

10. The method according to claim 9 , comprising passing the electromagnetic radiation to a grating, the structure overlying at least part of the grating.

11. The method according to claim 9 , comprising passing the electromagnetic radiation through an aperture of a layer of metal onto the radiation-receiving surface.

12. The method according to claim 11 , wherein the structure at least partially overlies the layer of metal.

13. The method according to claim 9 , wherein the radiation-receiving surface comprises a detection surface of a detector and comprising detecting the electromagnetic radiation using the detector.

14. A lithographic projection apparatus comprising:
a projection system configured to project a beam of radiation from a patterning device onto a substrate;
a liquid supply system configured to provide a liquid to a space between the projection system and a surface facing the projection system; and
a movable table comprising:
a sensor system component, the sensor system component configured to be exposed to electromagnetic radiation, the sensor system component located or locatable under the projection system and comprising a radiation-receiving surface above which the liquid from the liquid supply system is to be provided,
an essentially opaque surface comprising an aperture through which the electromagnetic radiation passes to the radiation-receiving surface below the aperture, and
a liquid impermeable layer covering the aperture through which the electromagnetic radiation passes to the radiation-receiving surface below the liquid impermeable layer, the liquid impermeable layer at least in part isolating the radiation-receiving surface from liquid contacting the liquid impermeable layer.

15. The lithographic projection apparatus of claim 14 , wherein the opaque surface comprises a layer of metal with the aperture.

16. The lithographic projection apparatus of claim 15 , wherein at least part of the liquid impermeable layer is within the aperture.

17. The lithographic projection apparatus of claim 15 , wherein the liquid impermeable layer overlies at least part of the layer of metal.

18. The lithographic projection apparatus of claim 14 , wherein the opaque surface is in direct contact with the liquid impermeable layer.

19. The lithographic projection apparatus of claim 14 , comprising a grating and the liquid impermeable layer overlies at least part of the grating.

20. The lithographic projection apparatus of claim 14 , wherein the radiation-receiving surface comprises a detection surface of a detector.

Assignees

• Asml Netherlands Bv

Inventors

• Sengers Timotheus Franciscus
• Donders Sjoerd Nicolaas Lambertus
• Jansen Hans
• Boogaard Arjen

Classifications

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70866 Primary

  of mask or workpiece · CPC title

• G03F7/7095

  Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient · CPC title

• G03F7/70591

  Testing optical components · CPC title

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title