Surfactants and methods of making and using same

Patent metadata

Field	Value
Publication number	US-9725683-B2
Application number	US-201715398804-A
Country	US
Kind code	B2
Filing date	Jan 5, 2017
Priority date	Jan 29, 2013
Publication date	Aug 8, 2017
Grant date	Aug 8, 2017

Abstract

Anionic surfactants have a formula:

R f SO 2 N(H)—CH 2 CH(CH 3 )OH; or

R f SO 2 N(H)—(CH 2 CH 2 O) x H, where x is an integer from 2-6. R f is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula:

R f SO 2 N[CH 2 CH(CH 3 )OH] 2 ;  (a)

R f SO 2 N[CH 2 CH(CH 3 )OH][(CH 2 CH 2 O) n H], where n is an integer from 1-6;  (b)

R f SO 2 N(R)[(CH 2 CH 2 O) p H], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or  (c)

R f SO 2 N[(CH 2 CH 2 O) q H][(CH 2 CH 2 O) m H], where q is an integer from 1-6 and m is an integer from 3-6. R f is a fluoroalkyl group having 3 to 8 carbon atoms.  (d)

First claim

The invention claimed is:

1. A fluorinated sulfonamide surfactant composition comprising:
a neutral surfactant according to the formula:
R f SO 2 N[CH 2 CH(CH 3 )OH] 2 ;
R f SO 2 N[CH 2 CH(CH 3 )OH][(CH 2 CH 2 O) n H], where n is an integer from 1-6; or
R f SO 2 N[(CH 2 CH 2 O) q H][(CH 2 CH 2 O) m H], where q is 1 or 2 and m is 2; and

a solvent comprising water;
wherein R f is a fluoroalkyl group having 3 to 8 carbon atoms.

2. A composition according to claim 1 , wherein the fluoroalkyl group is saturated.

3. A composition according to claim 1 , wherein the fluoroalkyl group is straight chain.

4. A composition according to claim 1 , wherein the fluoroalkyl group is a perfluoroalkyl group.

5. A composition according to claim 1 , wherein the fluoroalkyl group has 4 to 6 carbon atoms.

6. A composition according to claim 1 , wherein the fluoroalkyl group is a saturated perfluoroalkyl group having 4 to 6 carbon atoms.

7. A composition according to claim 1 , wherein the fluoroalkyl group is a saturated perfluoroalkyl group having 4 carbon atoms.

8. A method of treating a surface of a photoresist material, the method comprising:
exposing the photoresist material to a composition according to claim 1 .

Assignees

• 3M Innovative Properties Co

Inventors

• Lamanna William M
• Savu Patricia M
• Kehren Jason M

Classifications

• C08F290/062

  Polyethers · CPC title

• C07C303/36

  of amides of sulfonic acids · CPC title

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title

• C08F14/18

  Monomers containing fluorine · CPC title

• G03F7/426

  containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides · CPC title