Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product
US-2023167381-A1 · Jun 1, 2023 · US
Surface-active compounds containing F
Surface-active compounds containing F · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C11D1/004 |
| Official title | {Surface-active compounds containing F} |
| Display label | Surface-active compounds containing F |
| Total patents | 67 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 6 |
| 2016 | 8 |
| 2017 | 11 |
| 2018 | 11 |
| 2019 | 7 |
| 2020 | 3 |
| 2021 | 4 |
| 2022 | 7 |
| 2023 | 3 |
| 2024 | 5 |
| 2025 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Compositions and method for floor cleaning or restoration
US-2023080941-A1 · Mar 16, 2023 · US
Rinsing Composition and Method for Treating Surface of Photoresist Material Using Same
US-2023028942-A1 · Jan 26, 2023 · US
Fluorinated tensides
US-11535589-B2 · Dec 27, 2022 · US
Compositions and method for floor cleaning or restoration
US-11453844-B2 · Sep 27, 2022 · US
Cleaning composition, cleaning method, and method for manufacturing semiconductor
US-11441101-B2 · Sep 13, 2022 · US
Photoresist stripper
US-11353794-B2 · Jun 7, 2022 · US
Composition for dissolving abrasive particles and cleaning method using the same
US-2022145216-A1 · May 12, 2022 · US
Methods for detecting end-points for cleaning processes of aerospace components
US-2022050051-A1 · Feb 17, 2022 · US
Fluorinated amine oxide surfactants
US-2022040655-A1 · Feb 10, 2022 · US
Lithography composition, a method for forming resist patterns and a method for making semiconductor devices
US-11156920-B2 · Oct 26, 2021 · US
Cleaning composition, cleaning method, and method for manufacturing semiconductor
US-2021284930-A1 · Sep 16, 2021 · US
New surfactant mixture, new composition comprising same, and use thereof in foam liquids for fighting fires
US-2021146183-A1 · May 20, 2021 · US
Compositions and method for floor cleaning or restoration
US-2021024854-A1 · Jan 28, 2021 · US
Compositions and method for floor cleaning or restoration
US-10774292-B2 · Sep 15, 2020 · US
Anti-fogging agent comprising a fluorinated surfactant mixture and alcohol
US-10683467-B2 · Jun 16, 2020 · US
Anti-fogging agent comprising a fluorosurfactant mixture
US-10611940-B2 · Apr 7, 2020 · US
Reverse emulsion-based slick water concentration system with drag reduction, flow back enhancement and clay stabilization functions
US-10513649-B2 · Dec 24, 2019 · US
Fibrous support comprising particles containing a partially water-soluble active agent, particles, and methods for producing said particles
US-10449128-B2 · Oct 22, 2019 · US
Novel surfactant mixture, novel composition comprising same and use thereof in foam liquids for fighting fires
US-2019314660-A1 · Oct 17, 2019 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C11D1/004?
- CPC C11D1/004 is the Cooperative Patent Classification code for “Surface-active compounds containing F.”
- How many patents are filed under CPC C11D1/004 (Surface-active compounds containing F)?
- Our database includes 67 publications tagged with this CPC code.
- Is patent activity under CPC C11D1/004 growing?
- Publication counts under this code: 5 in 2024 vs 2 in 2025 (latest complete years).