Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-2016274473-A1
Application number	US-201615167357-A
Country	US
Kind code	A1
Filing date	May 27, 2016
Priority date	Nov 12, 2002
Publication date	Sep 22, 2016
Grant date	—

Abstract

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

First claim

1 .- 20 . (canceled)

21 . A device manufacturing method comprising:
providing a liquid to a space between a projection system and a substrate with a liquid supply system; projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate, and isolating the space from the substrate with a shutter, the shutter being located between the projection system and the substrate when the shutter isolates the space from the substrate.

22 . The method according to claim 21 , wherein the shutter is positionable on a side of the liquid supply system opposite the projection system such that liquid can be confined in the liquid supply system and between the projection system and the shutter.

23 . The method according to claim 21 , wherein the liquid supply system comprises at least one inlet to supply the liquid onto the substrate and at least one outlet to remove the liquid after the liquid has passed under the projection system.

24 . The method according to claim 21 , wherein the liquid supply system is configured to provide the liquid to a space between a final lens of the projection system and the substrate.

25 . The method according to claim 21 , wherein the shutter is positioned within the liquid supply system.

26 . The method according to claim 21 , further comprising moving the shutter through a channel arranged in the liquid supply system.

27 . The method according to claim 21 , wherein the shutter includes a plurality of moveable parts.

28 . The method according to claim 21 , further comprising restricting a position of the shutter relative to the liquid supply system with one or more projections of the liquid supply system.

29 . A device manufacturing method comprising:
providing a liquid to a space between a projection system and a substrate with a liquid supply system; projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate, and isolating the space from the substrate or from a space to be occupied by a substrate with a shutter, wherein the shutter is releasably attachable to the liquid supply system and wherein the shutter is spaced away from the liquid supply system when attached to the liquid supply system.

30 . The method according to claim 29 , further comprising connecting the shutter to the liquid supply system with a magnet, a vacuum outlet, or both.

31 . The method according to claim 29 , further comprising forming a seal between the liquid supply system and the shutter with a gas inlet and a vacuum outlet of the liquid supply system.

32 . A device manufacturing method comprising:
providing a liquid to a space between a projection system and a substrate with a liquid supply system; projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate, and isolating the space from the substrate or from a space to be occupied by a substrate with a shutter, wherein the shutter comprises a channel in a surface of the shutter facing the projection system.

33 . The method according to claim 32 , wherein the channel is less than or equal to 10 micrometers deep.

34 . The method according to claim 32 , wherein the shutter comprises a plurality of concentric channels.

35 . The method according to claim 32 , wherein the shutter comprises a plurality of radial channels.

36 . The method according to claim 32 , further comprising providing mechanical connection of the shutter to the liquid supply system or reducing a bending of the shutter, or both, with one or more projections of the channel.

37 . The method according to claim 32 , wherein the shutter is located between the projection system and the substrate when the shutter isolates the space from the substrate.

Assignees

• Hoogendam Christiaan Alexander
• Maria Derksen Antonius Theodorus Anna
• Donders Sjoerd Nicolaas Lambertus
• Lof Joeri
• Loopstra Erik Roelof
• Mulkens Johannes Catharinus Hubertus
• Jansen Hans
• Verspay Jacobus Johannus Leonardus Hendricus
• Straaijer Alexander
• Streefkerk Bob
• Asml Netherlands Bv

Inventors

• Hoogendam Christiaan Alexander
• Maria Derksen Antonius Theodorus Anna
• Donders Sjoerd Nicolaas Lambertus
• Lof Joeri
• Loopstra Erik Roelof
• Mulkens Johannes Catharinus Hubertus
• Jansen Hans
• Verspay Jacobus Johannus Leonardus Hendricus
• Straaijer Alexander
• Streefkerk Bob

Classifications

• G03F7/70341

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/70716 Primary

  Stages · CPC title

• G03F7/70916

  Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps · CPC title

• G03F9/7088

  Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection · CPC title

• G03F7/707 Primary

  Chucks, e.g. chucking or un-chucking operations or structural details · CPC title