Film structure for electric field guided photoresist patterning process
US-11880137-B2 · Jan 23, 2024 · US
Mask frame assembly for thin film deposition and manufacturing method thereof
US2015114287A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2015114287-A1 |
| Application number | US-201414522542-A |
| Country | US |
| Kind code | A1 |
| Filing date | Oct 23, 2014 |
| Priority date | Oct 25, 2013 |
| Publication date | Apr 30, 2015 |
| Grant date | — |
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Abstract
Official abstract text for this publication.
A mask frame assembly for thin film deposition and manufacturing method thereof are disclosed. One inventive aspect includes a mask frame, a plurality of first masks and a plurality of second masks. The first and second masks are alternately formed in a first direction. Two overlapped portions of each of the first and second masks are connected to both sides of the non-overlapped portion of each of the first and second mask, respectively. In addition, one overlapped portion of each first mask and one overlapped portion of each second mask overlap each other at a connection area.
First claim
Opening claim text (preview).
What is claimed is: 1 . A mask frame assembly for thin film deposition, comprising: a mask frame; and a plurality of first masks and a plurality of second masks alternately formed in a first direction and connected to each other, wherein each first mask includes: a first non-overlapped portion, a first overlapped portion, and a second overlapped portion, the first and second overlapped portions connected to both sides of the first non-overlapped portion, wherein eac…
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Classifications
- H10P76/204Primary
Electricity · mapped topic
- C23C14/042Primary
Chemistry & Metallurgy · mapped topic
- B05C21/005Primary
Operations & Transport · mapped topic
Electricity · mapped topic
Cross-Sectional Technologies · mapped topic
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- What does patent US2015114287A1 cover?
- A mask frame assembly for thin film deposition and manufacturing method thereof are disclosed. One inventive aspect includes a mask frame, a plurality of first masks and a plurality of second masks. The first and second masks are alternately formed in a first direction. Two overlapped portions of each of the first and second masks are connected to both sides of the non-overlapped portion of eac…
- Who is the assignee on this patent?
- Samsung Display Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10P76/204. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Thu Apr 30 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).