Substrate processing apparatus and substrate processing method

Patent metadata

Field	Value
Publication number	US-12564868-B2
Application number	US-202218261578-A
Country	US
Kind code	B2
Filing date	Jan 5, 2022
Priority date	Jan 19, 2021
Publication date	Mar 3, 2026
Grant date	Mar 3, 2026

Abstract

A substrate processing apparatus includes a substrate holder, a rotational driving unit, a cover body, a transfer mechanism, a cleaning liquid supply and a controller. The substrate holder is configured to hold a substrate. The rotational driving unit is configured to rotate the substrate holder. The cover body is configured to cover a top surface of the substrate held by the substrate holder. The transfer mechanism is configured to transfer a cleaning jig to the substrate holder. The cleaning liquid supply is configured to supply a cleaning liquid toward a bottom surface of the cleaning jig held by the substrate holder. The controller is configured to control the rotational driving unit to rotate the substrate holder. The cleaning jig is provided with at least one hole through which the cleaning liquid discharged from the cleaning liquid supply passes toward the cover body.

First claim

I claim:

1 . A cleaning method, comprising:
transferring a cleaning jig to a substrate holder allowed to hold a substrate; rotating the substrate holder holding the cleaning jig thereon; discharging a cleaning liquid toward a bottom surface of the cleaning jig held by the substrate holder; and cleaning a cover body covering a top surface of the cleaning jig with the cleaning liquid, wherein the cleaning jig comprises a plate member and the cleaning jig is provided with multiple holes through which the cleaning liquid discharged from a cleaning liquid supply passes toward the cover body, and wherein the cleaning jig further comprises a plurality of blade members, each disposed between two adjacent ones of the multiple holes and extending in a radial direction of the plate member.

Assignees

• Tokyo Electron Ltd

Inventors

• Inatomi Yuichiro

Classifications

• H10P72/0406

  for cleaning followed by drying, rinsing, stripping, blasting or the like · CPC title

• C23C18/1875

  only one step pretreatment · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• C23C18/31

  Coating with metals · CPC title