Integration of dry development and etch processes for EUV patterning in a single process chamber

Patent metadata

Field	Value
Publication number	US-12474640-B2
Application number	US-202418850990-A
Country	US
Kind code	B2
Filing date	Mar 12, 2024
Priority date	Mar 17, 2023
Publication date	Nov 18, 2025
Grant date	Nov 18, 2025

Abstract

Process condition management facilitates the combination of dry development and etching into a single process chamber; eliminating the necessity for a post-dry development bake step during semiconductor manufacturing. Methods and apparatuses for rapidly instituting a large drop in process chamber pressure allow thermal dry development and an O 2 flash treatment or thermal dry development and plasma hardmask open operations to take place without wafer transfer.

First claim

What is claimed is:

1 . A method for processing a semiconductor substrate, the method comprising:
providing a photopatterned photoresist on a semiconductor substrate in a process chamber; thermally dry developing the photopatterned photoresist with a process gas at a first pressure to form a thermally dry developed patterned resist; and plasma dry developing the thermally dry developed patterned resist with an etchant at a second pressure, wherein thermally dry developing and plasma dry developing occur in the same process chamber, wherein the photopatterned photoresist comprises a metal-containing photoresist.

2 . The method of claim 1 , wherein the process chamber is transitioned from the first pressure to the second pressure in ten seconds or less.

3 . The method of claim 1 , wherein the first pressure is from about 200 to 500 mTorr and the second pressure is from about 20 to 50 mTorr.

4 . The method of claim 1 , wherein the metal-containing photoresist comprises a photopatterned EUV-sensitive organo-metal oxide, a photopatterned EUV-sensitive metal oxide, or an organo-metal-containing thin film EUV resist.

5 . The method of claim 4 , wherein the photopatterned EUV-sensitive metal oxide comprises tin oxide.

6 . The method of claim 1 , further comprising:
etching the thermally dry developed patterned resist after plasma dry developing the thermally dry developed patterned resist to form a patterned substrate, wherein the etching is performed in the same process chamber as thermally dry developing and plasma dry developing.

7 . The method of claim 6 , wherein the process chamber is returned to the first pressure after etching in twenty seconds or less.

8 . The method of claim 1 , further comprising:
modulating from the first pressure to the second pressure in the process chamber using a throttle valve and/or pump.

9 . The method of claim 1 , wherein the process gas comprises a halide and the etchant comprises oxygen.

10 . The method of claim 1 , wherein each of the process gas and the etchant comprises a halide.

11 . An apparatus for integrating thermal dry development and plasma dry development, the apparatus comprising:
a process chamber; one or more pressure-regulating devices; one or more pumps fluidly coupled with the one or more pressure-regulating devices; a controller having at least one processor and a memory, wherein the controller is configured with instructions to perform the following operations: perform thermal dry development at a first pressure in the process chamber; transition pressure in the same process chamber from the first pressure to the second pressure; and perform plasma dry development at a second pressure in the same process chamber.

12 . The apparatus of claim 11 , wherein the controller configured with instructions to transition the pressure in the same process chamber from the first pressure to the second pressure is configured with instructions to transition the pressure in the same process chamber from the first pressure to the second pressure in ten seconds or less.

13 . The apparatus of claim 11 , wherein the one or more pressure-regulating devices comprise a pressure control valve assembly.

14 . The apparatus of claim 11 , wherein the one or more pumps comprise a roughing pump and a turbomolecular pump.

15 . The apparatus of claim 11 , wherein the first pressure is from five to fifty times higher than the second pressure.

16 . The apparatus of claim 11 , wherein the process chamber comprises a substrate support configured to support a semiconductor substrate in the process chamber, wherein the semiconductor substrate comprises a patterned photoresist, wherein the patterned photoresist is a metal-containing photoresist.

17 . The apparatus of claim 11 , wherein the controller is further configured with instructions to perform the following operations:
maintain one or more process parameters uniformly in the process chamber.

18 . The apparatus of claim 17 , wherein the one or more process parameters comprise pumping, gas delivery, or pumping and gas delivery.

19 . The apparatus of claim 11 , wherein the controller is further configured with instructions to perform the following operations:
return pressure in the same process chamber from the second pressure back to the first pressure in twenty seconds or less.

20 . The apparatus of claim 11 , wherein the first pressure is from about 200 to 500 mTorr and the second pressure is from about 20 to 50 mTorr.

Assignees

• Lam Res Corp

Inventors

• Lee Younghee
• Li Da
• Zhao Hongxiang
• Kim Ji Yeon
• Tan Samantha S H
• Peter Daniel
• Shamma Nader
• Flores Espinosa Michelle Margarita
• Xue Jun
• Van Cleemput Patrick A

Classifications

• H10P50/73

  using masks for insulating materials · CPC title

• H10P72/0466

  characterised by the construction of the load-lock chamber · CPC title

• H10P76/204

  of organic photoresist masks · CPC title

• H10P72/0454 Primary

  surrounding a central transfer chamber · CPC title

• H01J2237/334

  Etching · CPC title