Electrostatic chuck with a charge dissipation structure

Patent metadata

Field	Value
Publication number	US-12444636-B2
Application number	US-202318113941-A
Country	US
Kind code	B2
Filing date	Feb 24, 2023
Priority date	Feb 28, 2022
Publication date	Oct 14, 2025
Grant date	Oct 14, 2025

Abstract

Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including a pattern of charge dissipation lines on an insulating layer, the lines having a first conductive layer and a second conductive layer and being arranged to define enclosed fields of the insulating layer between the lines.

First claim

The invention claimed is:

1. An electrostatic chuck comprising:
an insulating layer at an upper surface of the electrostatic chuck,
a charge dissipation structure on the insulating layer, the charge dissipation structure comprising:
a first conductive layer on the insulator layer having a first resistivity, and
a second conductive layer over the first conductive layer, having a second resistivity, wherein the second resistivity is higher than the first resistivity,

the charge dissipation structure comprising interconnecting topographies extending over an upper surface of the insulating layer, the interconnecting topographies including interconnected segments or lines that intersect to enclose and define multiple exposed areas of the insulating layer, and
one or more electrodes beneath the insulating layer, wherein the interconnecting topographies are located directly above the one or more electrodes.

2. The electrostatic chuck of claim 1 , further comprising embossments disposed on the first conductive layer, wherein the second conductive layer is disposed over the embossments.

3. The electrostatic chuck of claim 1 , further comprising one or more seal rings disposed on the first conductive layer, wherein the second conductive layer is disposed over the one or more seal rings.

4. The electrostatic chuck of claim 1 , wherein the second resistivity is below 1×10 −2 ohm meter.

5. The electrostatic chuck of claim 1 , wherein the exposed fields of the insulating layer comprise geometric shapes and wherein a maximum distance between any location of the exposed fields to the nearest charge dissipation structure is less than 20 millimeters.

6. The electrostatic chuck of claim 1 , wherein the first resistivity is less than 1×10 −5 ohm meter.

7. The electrostatic chuck of claim 1 , wherein the charge dissipation structure has a total resistance below 1×10 7 ohms measured across a longest length of the charge dissipation structure.

8. The electrostatic chuck of claim 1 , wherein a maximum distance between any location of the exposed field of the insulating layer and the nearest charge dissipation structure is less than 20 millimeters.

9. The electrostatic chuck of claim 1 , wherein a maximum distance between any location of an exposed field and a charge dissipation structure is in a range of 2 to 15 millimeters.

10. The electrostatic chuck of claim 1 , wherein the interconnecting topographies may be lines that have a width in a range from 0.1 to 1.5 millimeters.

11. The electrostatic chuck of claim 1 , wherein the first conductive layer comprises aluminum, nickel, or a combination thereof.

12. The electrostatic chuck of claim 1 , wherein the first conductive layer has a thickness in a range from 200 to 500 nanometers.

13. The electrostatic chuck of claim 1 , wherein the second conductive layer comprises conductive material selected from diamond-like carbon, silicon carbide, doped carbon, and titanium nitride.

14. The electrostatic chuck of claim 1 , wherein the second conductive layer has a thickness in a range from 500 to 1500 nanometers.

15. The electrostatic chuck of claim 1 , wherein:
an area of the interconnecting topographies is less than 10 percent the total area of the upper surface of the chuck, and
an area of the exposed fields is at least 90 percent the total area of the upper surface of the chuck.

16. The electrostatic chuck of claim 1 , further comprising one or more embossments disposed on an upper surface of the insulating layer, spaced from interconnecting topographies.

17. A method of producing an electrostatic chuck, the method comprising:
on an insulating layer,
forming a charge dissipation structure, the charge dissipation structure comprising:
a first conductive layer on the insulating layer, the first conductive layer having a first resistivity, and
a second conductive layer over the first conductive layer, the second conductive layer having a second resistivity, wherein the second resistivity is higher than the resistivity of the first conductive layer, and

the charge dissipation structure comprising interconnecting topographies extending over the insulating layer upper surface, the interconnecting topographies including interconnected segments or lines that intersect to enclose and define multiple exposed areas of the insulating layer.

18. The method of claim 17 , wherein the charge dissipation structure comprises:
the first conductive layer,
embossments disposed on the first conductive layer, and
the second conductive layer over the first conductive layer and the embossments.

19. The method of claim 18 , wherein the charge dissipation structure comprises:
the first conductive layer,
a seal ring or a portion of a seal ring disposed on the first conductive layer, and
the second conductive layer over the first conductive layer and the seal ring or portion of the seal ring.

Assignees

• Entegris Inc

Inventors

• Rybczynski Jakub
• Donnell Steven
• Liu Yan
• Minsky Caleb
• Venkatraman Chandra
• Waldfried Carlo

Classifications

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title

• H10P72/7616

  characterised by a coating, a hardness or a material · CPC title

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/72

  using electrostatic chucks · CPC title

• H10P72/0434

  mainly by convection · CPC title