Projection exposure apparatus for semiconductor lithography

Patent metadata

Field	Value
Publication number	US-12372877-B2
Application number	US-202318339592-A
Country	US
Kind code	B2
Filing date	Jun 22, 2023
Priority date	Jul 5, 2022
Publication date	Jul 29, 2025
Grant date	Jul 29, 2025

Abstract

A projection exposure apparatus comprises an optical element. The optical element comprises a main body and an actuator for deforming an optically effective surface formed on the main body. The actuator is in a recess in the rear side of the main body.

First claim

What is claimed is:

1. An apparatus, comprising:
an optical element, comprising:
a main body; and
an actuator configured to deform an optically effective surface supported by the main body,

wherein:
the actuator is in a recess in a rear side of the main body;
the actuator is mechanically connected to the main body and configured to exerts its force over lateral boundary surfaces of the recess;
relative to the optically effective surface, an effective direction of the actuator runs at least in part in a normal direction to the optically effective surface; and
the apparatus is a projection exposure apparatus.

2. The apparatus of claim 1 , wherein the actuator comprises a shear actuator.

3. The apparatus of claim 1 , further comprising a kinematic system on the rear side of the main body, wherein the kinematic system connects the actuator to the main body.

4. The apparatus of claim 3 , wherein the kinematic system is one piece with the main body.

5. The apparatus of claim 3 , wherein the kinematic system comprises a lever.

6. The apparatus of claim 5 , comprising at least two actuators configured to act on the lever from different sides.

7. The apparatus of claim 5 , comprising four actuators configured to act on the lever from four different sides, in each case with an offset of 90°.

8. The apparatus of claim 5 , wherein the lever comprises a notch between a point of application of the force of the actuator and the main body.

9. The apparatus of claim 5 , wherein the actuator comprises a shear actuator.

10. The apparatus of claim 3 , wherein the actuator comprises a shear actuator.

11. The apparatus of claim 1 , comprising an illumination system and a projection optical unit.

12. The apparatus of claim 1 , wherein the optical element comprises a reflection surface.

13. An apparatus, comprising:
an optical element, comprising:
a main body; and
a shear actuator configured to deform an optically effective surface supported by the main body,

wherein:
the shear actuator is in a recess in a rear side of the main body;
the shear actuator is mechanically connected to the main body and configured to exerts its force over lateral boundary surfaces of the recess;
the apparatus is a projection exposure apparatus.

14. The apparatus of claim 13 , wherein an effective direction of the shear actuator runs at least in part parallel to the optically effective surface.

15. The apparatus of claim 13 , further comprising a kinematic system on the rear side of the main body, wherein kinematic system connects the shear actuator to the main body.

16. The apparatus of claim 15 , wherein the kinematic system is one piece with the main body.

17. The apparatus of claim 15 , wherein the kinematic system comprises a lever.

18. The apparatus of claim 17 , comprising at least two actuators configured to act on the lever from different sides.

19. The apparatus of claim 17 , comprising four actuators configured to act on the lever from four different sides, in each case with an offset of 90°.

20. The apparatus of claim 17 , wherein the lever comprises a notch between a point of application of the force of the actuator and the main body.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Raab Markus
• Raba Andreas
• Buechsenschuetz Mirko
• Manger Matthias

Classifications

• G03F7/70225

  Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements · CPC title

• G02B7/185

  with means for adjusting the shape of the mirror surface · CPC title

• G03F7/70266

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title

• G02B7/198

  with means for adjusting the mirror relative to its support {(G02B7/1822 takes precedence)} · CPC title

• G02B26/0825

  the reflecting element being a flexible sheet or membrane, e.g. for varying the focus (flexible mirrors for cosmetic use A45D42/24) · CPC title